2847-57-6Relevant articles and documents
Evidence of single electron transfer in the diastereoselective synthesis of β-stannylketones
Chopa,Murray,Lockhart
, p. 35 - 42 (1999)
The reaction of trimethyl- and triphenylstannylpotassium with mono and disubstituted enones (1-5) in acetonitrile as solvent was studied. In a few seconds and under mild conditions these reactions lead in nearly quantitative yields either to a mixture of diastereomers or to a pure diastereomer of β-stannylketones 6-16. The reactions with triphenylstannylpotassium gave higher yields than trimethylstannylpotassium. The partial or total inhibition of the reactions by addition of a free radical scavenger (galvinoxyl) or a radical-anion scavenger (p-dinitrobenzene) leads us to believe that these reactions could follow a two-stage reaction mechanism involving an initial electron transfer step. Our results indicate that these reactions are stereoselective but certainly not stereospecific. Full 1H- and 13C-NMR data of the new β-stannylketones are given.
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
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Paragraph 0150, (2021/10/11)
A semiconductor photoresist composition includes an organometallic compound represented by Chemical Formula 1, a photoacid generator (PAG), and a solvent: In Chemical Formula 1, R is a substituted or unsubstituted C1 to C20 alkyl group, a substituted or unsubstituted C3 to C20 cycloalkyl group, a substituted or unsubstituted C2 to C20 aliphatic unsaturated organic group including at least one double bond or triple bond, a substituted or unsubstituted C6 to C30 aryl group, an ethoxy group, a propoxy group, or a combination thereof; and X, Y, and Z are each independently —OR1 or —OC(═O)R2.
SEMICONDUCTOR PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERNS USING THE COMPOSITION
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Paragraph 0129, (2020/12/01)
A semiconductor photoresist composition includes an organometallic compound represented by Chemical Formula 1, an organometallic compound represented by Chemical Formula 2, and a solvent, and a method of forming patterns using the same. When the semiconductor photoresist composition is irradiated with e.g., extreme ultraviolet light, radical crosslinking between Sn-containing units may occur via Sn—O—Sn bond formation, and a photoresist polymer providing excellent sensitivity, small or reduced line edge roughness, and/or excellent resolution may be formed.
Aminostannanes and aminostannylenes containing a C,N-chelated ligand
Padělková, Zdeňka,Havlík, Ale?,?vec, Petr,Nechaev, Mikhail S.,R??i?ka, Ale?
, p. 2651 - 2657 (2010/11/18)
Aminotin(II and IV) compounds {[(2,6-i-Pr-C6H 3)(H)N]-μ-(Sn)-Cl}2, {2-[(CH3) 2NCH2]C6H4}2Sn[N(H)(2,6- i-Pr-C6H3)]2 and {2-[(CH3) 2NCH2]C6H4}Sn[N(2,6-i-Pr-C 6H3)(SiMe3)] were prepared by lithium halide elimination from tin halides and corresponding lithium complexes. [(2,6-i-Pr-C6H3)(H)N]Li (1) reacts with one half of molar equivalent of SnCl2 to give {[(2,6-i-Pr-C6H 3)(H)N]-μ-(Sn)-Cl}2. The same lithium amide (1) gave with R3SnCl corresponding aminostannanes. Further reactions of these compounds with n-butyllithium gave the starting 1 and tetraorganostannanes. {2-[(CH3)2NCH2]C6H4} 2SnBr2 reacts with two equivalents of 1 to {2-[(CH 3)2NCH2]C6H4} 2Sn[N(H)(2,6-i-Pr-C6H3)]2. The dimeric heteroleptic stannylene {[(2,6-i-Pr-C6H3) (SiMe3)N](μ2-Cl)Sn}2 reacts with 2-[(CH 3)2NCH2]C6H4Li to the monomeric {2-[(CH3)2NCH2]C6H 4}Sn[N(2,6-i-Pr-C6H3)(SiMe3)]. The structure in the solid state and in solution and reactivity of products is also discussed. The unique decatin cluster has been isolated by hydrolysis of {[(2,6-i-Pr-C6H3)(H)N]-μ-(Sn)-Cl}2. The structure of some compounds was also evaluated by theoretical DFT methods.
