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2-(Trifluoromethyl)acrylic acid, also known as TFMAA, is a light yellow transparent chunk with strong acidic properties. It is a functional monomer that is widely used in various applications due to its unique chemical characteristics.

381-98-6

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381-98-6 Usage

Uses

Used in Molecular Imprinting:
2-(Trifluoromethyl)acrylic acid is used as an acidic functional monomer for molecular imprinting of nicotine. Its strong acidic properties make it suitable for creating highly selective molecularly imprinted polymers.
Used in Solid-Phase Extraction:
In the field of solid-phase extraction, 2-(Trifluoromethyl)acrylic acid (TFMAA) is used as a strong acid functional monomer, showing good performance in the extraction of domoic acid.
Used in Preparation of Molecularly Imprinted Polymers:
2-(Trifluoromethyl)acrylic acid is also utilized in the preparation of molecularly imprinted polymers that exhibit diastereoselectivity for cinchona alkaloids, making it a valuable component in the development of selective recognition materials.
Used in the Polymer Industry:
2-(Trifluoromethyl)acrylic acid is used as a conventional functional monomer, similar to methacrylic acid, in the polymer industry for the synthesis of various polymers with specific properties.

Check Digit Verification of cas no

The CAS Registry Mumber 381-98-6 includes 6 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 3 digits, 3,8 and 1 respectively; the second part has 2 digits, 9 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 381-98:
(5*3)+(4*8)+(3*1)+(2*9)+(1*8)=76
76 % 10 = 6
So 381-98-6 is a valid CAS Registry Number.
InChI:InChI=1/C4H3F3O2/c1-2(3(8)9)4(5,6)7/h1H2,(H,8,9)/p-1

381-98-6 Well-known Company Product Price

  • Brand
  • (Code)Product description
  • CAS number
  • Packaging
  • Price
  • Detail
  • TCI America

  • (T1512)  2-(Trifluoromethyl)acrylic Acid  >98.0%(T)

  • 381-98-6

  • 5g

  • 1,150.00CNY

  • Detail
  • TCI America

  • (T1512)  2-(Trifluoromethyl)acrylic Acid  >98.0%(T)

  • 381-98-6

  • 25g

  • 3,650.00CNY

  • Detail
  • Alfa Aesar

  • (B22443)  2-(Trifluoromethyl)acrylic acid, 98%   

  • 381-98-6

  • 1g

  • 648.0CNY

  • Detail
  • Alfa Aesar

  • (B22443)  2-(Trifluoromethyl)acrylic acid, 98%   

  • 381-98-6

  • 5g

  • 2103.0CNY

  • Detail
  • Alfa Aesar

  • (B22443)  2-(Trifluoromethyl)acrylic acid, 98%   

  • 381-98-6

  • 25g

  • 8071.0CNY

  • Detail
  • Aldrich

  • (369144)  2-(Trifluoromethyl)acrylicacid  98%

  • 381-98-6

  • 369144-1G

  • 711.36CNY

  • Detail
  • Aldrich

  • (369144)  2-(Trifluoromethyl)acrylicacid  98%

  • 381-98-6

  • 369144-5G

  • 2,272.14CNY

  • Detail

381-98-6SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 11, 2017

Revision Date: Aug 11, 2017

1.Identification

1.1 GHS Product identifier

Product name 2-(Trifluoromethyl)Acrylic Acid

1.2 Other means of identification

Product number -
Other names 2-(Trifluoromethyl)propenoic acid

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:381-98-6 SDS

381-98-6Relevant academic research and scientific papers

ACETAL COMPOUNDS AND THEIR PREPARATION, POLYMERS, RESIST COMPOSITIONS AND PATTERNING PROCESS

-

, (2010/06/16)

An acetal compound of formula (1) is provided wherein R1 is H, methyl or trifluoromethyl, R2 is a monovalent C1-C10 hydrocarbon group, R3 and R4 are H or a monovalent C1-C10 hydrocarbon group, R2 and R3 may together form an aliphatic hydrocarbon ring, and X1 is a single bond or a divalent C1-C4 hydrocarbon group. A polymer comprising recurring units derived from the acetal compound is used as a base resin to formulate a resist composition which exhibits a high resolution when processed by micropatterning technology, especially ArF lithography.

Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same

-

, (2008/06/13)

Provided are a variety of monomers suitable of producing photosensitive polymers, that are in turn, useful in photoresist compositions, through radical (cationic) polymerization including at least one multi-ring alkenyl ethers and one α-fluorinated acryla

Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same

-

, (2008/06/13)

Provided are a variety of monomers suitable of producing photosensitive polymers, that are in turn, useful in photoresist compositions, through radical (cationic) polymerization including at least one multi-ring alkenyl ethers and one α-fluorinated acryla

Studies on the preparation of 2-(trifluoromethyl)acrylic acid and its esters from 3,3,3-trifluoropropene via hydrocarbonylation reactions

Botteghi, Carlo,Lando, Claudia,Matteoli, Ugo,Paganelli, Stefano,Menchi, Gloria

, p. 67 - 71 (2007/10/03)

The synthesis of methyl α-(trifluoromethyl)acrylate (MTFMA) has been carried out in three steps starting from commercially available 3,3,3,-trifluoropropene; this route involving the cobalt-catalyzed carbonylation of 2-bromo-3,3,3-trifluoropropene (2-Br-TFP) under very mild reaction conditions, gave only about 30% yield of the desired methyl ester. 2-(Trifluoromethyl)propanal, available in 90% yield by rhodium catalyzed hydroformylation of 3,3,3-trifluoropropene, proved to be an interesting starting product for the preparation of MTFMA: while the synthetic route involving the α-halogenation of 2-(trifluoromethyl)propanoic acid (TFMPA) failed to give any results, the reaction scheme based on the α-selenenylation of the above aldehyde followed by H2O2-oxidation afforded 68% yield of 2-(trifluoromethyl)acrylic acid (TFMAA).

Preparation of (R)- and (S)-3-Hydroxy-2-(trifluoromethyl)propionic Acid by Resolution with (R,R)- and (S,S)-2-Amino-1-phenylpropane-1,3-diol

Goetzoe, Stephan P.,Seebach, Dieter

, p. 20 - 23 (2007/10/03)

Racemic 2-trifluoromethyl-3-hydroxypropionic acid (rac-1) is prepared on a 50 g scale from 3,3,3-trifluoropropene in four steps, the overall yield being 40percent.A procedure for the resolution of rac-1 with 2-amino-1-phenylpropane-1,3-diol is described (25 g scale).The acids (R)-1 and (S)-1 are isolated, their enantiomer purities determined by GC analysis of the corresponding methyl esters on a chiral column and their chirality senses assigned from an X-ray crystal structure of the salt formed with phenylethylamine.The non-fluorinated analog of 1 is frequently employed as a chiral synthetic building block ("Roche acid").

Method for preparation of α, β-unsaturated carboxylic acid containing fluorine

-

, (2008/06/13)

A method for preparing α, β-unsaturated carboxylic acids of the formula where R1 to R3 can be hydrogen, fluorine, alkyl, or alkyl containing fluorine, but at least one of R1 to R3 is fluorine or alkyl containing fluorine. The method involves reacting an alkenyl halide containing fluorine having the general formula where R1 to R3 are the same as above, and X is chlorine, bromine, or iodine with carbon dioxide in an aprotic polar organic solvent and in the presence of activated zinc. The activated zinc is activated by pretreatment with a mineral acid or acetic acid. At least one cation is present during the reaction which is an alkali metal ion, alkaline earth metal ion or ammonium ion. The cation is present in an amount of 0.01 to 50 gram atoms per one mol of alkenyl halide containig fluorine. The resulting product is hydrolyzed.

Process for producing fluorine-containing aliphatic carboxylic acids

-

, (2008/06/13)

Process for producing fluorine-containing aliphatic carboxylic acids having the general formula of Y--Rf --Y' as defined herein by reaction of fluorine-containing aliphatic halogen compounds having the general formula of X--R4 --X' as defined herein with carbon dioxide under the presence of zinc in an organic solvent and hydrolysis of the reaction product, wherein the improvement comprises controlling the concentration of carbon dioxide in the organic solvent at a level of 0.3 to 5 mol/l.

Production of 5-perfluoroalkyldihydrouracil derivatives

-

, (2008/06/13)

A process for preparing a 5-perfluoroalkyl-dihydrouracil derivative of the general formula STR1 wherein Rf represents a perfluoroalkyl group, each of R1 and R2 represents a hydrogen atom, or an alkyl, cycloalkyl, aryl, aralkyl or heterocyclic group, and Y is an oxygen or sulfur atom, which comprises (a) reacting a compound of the general formula STR2 wherein X represents a halogen atom or hydroxyl group, with a urea derivative of the general formula STR3 provided that when X is a hydroxyl group and at least one of R1 and R2 is a hydrogen atom, said reaction is carried out in the presence of a condensing agent, or (b) cyclizing a compound of the general formula STR4 and a novel intermediate compound of the above formula (IV).

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