381-98-6

Basic information

• Product Name: 2-(Trifluoromethyl)acrylic acid
• Synonyms: 2-(TRIFLUOROMETHYL)PROPENOIC ACID;2-(TRIFLUOROMETHYL)ACRYLIC ACID;2-(Trifluoromethyl)propenoicacid,min.98%;2-(Trifluoromethyl)propenoic acid 98%;2-(Trifluoromethyl)propenoicacid98%;TRIFLUOROMETHYLACRYLIC ACID;2-(TRIFLUOROMETHYL)ACRYLIC ACID 98%;2-(Trifluoromethyl)acrylic acid(98%)
• CAS NO: 381-98-6
• Molecular Formula: C₄H₃F₃O₂
• Molecular Weight: 140.06
• EINECS: 226-094-5
• Product Categories: pharmacetical;Fluorochemicals;Fluorinated Building Blocks;Fluorinating Reagents & Building Blocks for Fluorinated Biochemical Compounds;Synthetic Organic Chemistry;Acrylic Acids and SaltsSelf Assembly&Contact Printing;Acrylic Monomers;Fluorine-Containing Monomers for 157 nm UV Lithography Resist Polymers;Lithography Monomers;Monomers
• Mol File: 381-98-6.mol
• Article Data: 9

Chemical Properties

• Melting Point: 51-52 °C(lit.)
• Boiling Point: 86 °C
• Flash Point: 179 °F
• Appearance: Light yellow transparent/Chunks
• Density: 1.3949 (estimate)
• Vapor Pressure: 0.212mmHg at 25°C
• Storage Temp.: 2-8°C
• PKA: 2.07±0.11(Predicted)
• Water Solubility: Soluble in water.
• CAS DataBase Reference: 2-(Trifluoromethyl)acrylic acid(CAS DataBase Reference)
• NIST Chemistry Reference: 2-(Trifluoromethyl)acrylic acid(381-98-6)
• EPA Substance Registry System: 2-(Trifluoromethyl)acrylic acid(381-98-6)

Safety Data

• Hazard Codes: C,Xi
• Statements: 34-36/37/38
• Safety Statements: 26-36/37/39-45-37/39
• RIDADR: UN 3261 8/PG 2
• WGK Germany: 3
• HazardClass: 8
• PackingGroup: III
• Hazardous Substances Data: 381-98-6(Hazardous Substances Data)

Usage

Chemical Properties

LIGHT YELLOW TRANSPARENT CHUNKS

Uses

Different sources of media describe the Uses of 381-98-6 differently. You can refer to the following data:
1. 2-(Trifluoromethyl)acrylic acid is used as an acidic functional monomer for molecular imprinting of nicotine. And also used in the conventional functional monomer methacrylic acid.
2. 2-(Trifluoromethyl)acrylic acid (TFMAA) is a strong acid functional monomer, which shows a good performance in the solid-phase extraction of domoic acid. It can also be used in the preparation of molecularly imprinted polymers that show diastereoselectivity for cinchona alkaloids.

InChI:InChI=1/C4H3F3O2/c1-2(3(8)9)4(5,6)7/h1H2,(H,8,9)/p-1

Upstream product

• 382-43-4 3-hydroxy-2-(trifluoromethyl)propenoic acid 
• 1514-82-5 2-bromo-3,3,3-trifluoropropene 
• 124-38-9 carbon dioxide 
• 201230-82-2 carbon monoxide 

Downstream Products

• 93075-08-2 3-Phenyl-5-trifluoromethyl-dihydro-pyrimidine-2,4-dione 
• 90715-82-5 1-phenyl-3-(2-hydroxycarbonyl-3,3,3-trifluoropropyl)urea 
• 90715-83-6 1-benzyl-3-(2-hydroxycarbonyl-3,3,3-trifluoropropyl)urea 
• 99764-29-1 2-benzyl-3,3-difluoroacrylic acid 
• 382-43-4 3-hydroxy-2-(trifluoromethyl)propenoic acid 
• 104939-18-6 α-(trifluoromethyl)-β-alanine 
• 174744-18-4 α-trifluoromethyl-γ-butyrolactone 
• 111339-17-4 benzyl 2-(trifluoromethyl)prop-2-enoate 
• 1006364-85-7 methyl 2-(N-(benzyloxy)-2-(trifluoromethyl)acrylamido)pent-4-enoate 
• 1346232-99-2 C₁₉H₁₀ClF₃N₂O 
• 80959-78-0 (E)-1-methyl-4-(3,3,3-trifluoroprop-1-en-1-yl)benzene 
• 78622-55-6 (E)-1-(3,3,3-trifluoroprop-1-enyl)-4-methoxybenzene 
• 659-21-2 (E)-1-fluoro-4-(3,3,3-trifluoroprop-1-en-1-yl)benzene 

Relevant articles and documents

ACETAL COMPOUNDS AND THEIR PREPARATION, POLYMERS, RESIST COMPOSITIONS AND PATTERNING PROCESS

An acetal compound of formula (1) is provided wherein R1 is H, methyl or trifluoromethyl, R2 is a monovalent C1-C10 hydrocarbon group, R3 and R4 are H or a monovalent C1-C10 hydrocarbon group, R2 and R3 may together form an aliphatic hydrocarbon ring, and X1 is a single bond or a divalent C1-C4 hydrocarbon group. A polymer comprising recurring units derived from the acetal compound is used as a base resin to formulate a resist composition which exhibits a high resolution when processed by micropatterning technology, especially ArF lithography.

Ether monomers and polymers having multi-ring structures, and photosensitive polymers and resist compositions obtained from the same

Provided are a variety of monomers suitable of producing photosensitive polymers, that are in turn, useful in photoresist compositions, through radical (cationic) polymerization including at least one multi-ring alkenyl ethers and one α-fluorinated acryla

Preparation of (R)- and (S)-3-Hydroxy-2-(trifluoromethyl)propionic Acid by Resolution with (R,R)- and (S,S)-2-Amino-1-phenylpropane-1,3-diol

Racemic 2-trifluoromethyl-3-hydroxypropionic acid (rac-1) is prepared on a 50 g scale from 3,3,3-trifluoropropene in four steps, the overall yield being 40percent.A procedure for the resolution of rac-1 with 2-amino-1-phenylpropane-1,3-diol is described (25 g scale).The acids (R)-1 and (S)-1 are isolated, their enantiomer purities determined by GC analysis of the corresponding methyl esters on a chiral column and their chirality senses assigned from an X-ray crystal structure of the salt formed with phenylethylamine.The non-fluorinated analog of 1 is frequently employed as a chiral synthetic building block ("Roche acid").