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7783-29-1

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7783-29-1 Usage

Physical Properties

Colorless liquid; density 0.79 g/mL at 0°C; freezes at –108°C; boils at 84.3°C; vapor density 5.48 g/L at STP; decomposes in water.

Chemical Properties

colorless liquid; enthalpy of vaporization 35.56 kJ/mol; vapor pressure at 0°C 9.1mm Hg; critical temp 249°C [CIC73] [CRC10]

Check Digit Verification of cas no

The CAS Registry Mumber 7783-29-1 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 7,7,8 and 3 respectively; the second part has 2 digits, 2 and 9 respectively.
Calculate Digit Verification of CAS Registry Number 7783-29:
(6*7)+(5*7)+(4*8)+(3*3)+(2*2)+(1*9)=131
131 % 10 = 1
So 7783-29-1 is a valid CAS Registry Number.
InChI:InChI=1/H10Si4/c1-3-4-2/h3-4H2,1-2H3

7783-29-1Downstream Products

7783-29-1Relevant articles and documents

Synthesis of polysilanes by tunneling reactions of H atoms with solid Si2H6 at 10K

Sogoshi, Norihito,Sato, Shoji,Takashima, Hideaki,Sato, Tetsuya,Hiraoka, Kenzo

, p. 986 - 987 (2012/09/22)

Tunneling reactions of H atoms with solid Si2H6 at 10K were investigated. The in situ and real-time reactions H + Si 2H6 to form silane and polysilanes were monitored using FT-IR. Quantitative analysis of gaseou

Decomposition channels of chemically activated disilane. The π bond energy of disilene and its derivatives

Olbrich,Potzinger,Reimann,Walsh

, p. 1267 - 1272 (2008/10/08)

The Hg (3P1) sensitized photolysis of an H2/SiH4 mixture not only yields Si2H6 but also Si3H8 and Si4H10. The formation of the latter two products as well as parts of the Si2H6 yield is explained by the decomposition of chemically activated disilane, formed by the combination of two silyl radicals. The activated disilane decomposes mainly into SiH2 + SiH4 which finally reacts to Si2H6 and to a lesser extent into H2 + H3SiSiH: and H2 + H2SiSiH2. The silykilylene inserts into SiH4 yielding Si3H8, while disilene is thought to be scavenged successively by two SiH3 radicals, the main reactive species under the given conditions. From the relative rate constants of the three decomposition channels, ΔHf(H3SiSiH:) = 273 ± 11 kJ/mol can be calculated. Also a lower bound to the π bond energy of disilene Bπ(H2SiSiH2) ≥ 69 ± 11 kJ/mol is obtained. Ab initio CI calculations give Bπ(H2SiSiH2) = 93 ± 8 kJ/mol. A substituted disilene is shown to have a probable π bond energy of 108 ± 20 kJ/mol from a thermochemical analysis of literature data.

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