13465-84-4

Usage

Uses

Used in Microelectronics Industry:
Silicon (IV) Iodide is used as a precursor in the synthesis of silicon amides for its unique properties and reactivity.
Silicon (IV) Iodide is used in the manufacture and etching of silicon, which is essential for the production of semiconductor devices and integrated circuits.
In the Microelectronics Industry, Silicon (IV) Iodide is used for selective area regrowth of silicon-doped GaAs through chemical beam epitaxy (CBE) on dry etched trench structures, enabling the creation of advanced semiconductor devices.
Silicon (IV) Iodide is employed in the manipulation of metal-semiconductor field effect transistors (MESFETs) and heterostructure field effect transistors (HFETs), which are vital components in high-speed electronic devices and communication systems.
Additionally, Silicon (IV) Iodide can be reduced to serve as a source for forming pure silicon and hydrogen iodide, further expanding its applications in the microelectronics and related industries.

Reference

Izumi, Shigekazu, et al. Journal of Crystal Growth 175.175(1997): 404-410. http://jes.ecsdl.org/content/104/11/663.short https://en.wikipedia.org/wiki/Silicon_tetraiodide

InChI:InChI=1/I4Si/c1-5(2,3)4

Upstream product

• 7553-56-2 iodine 
• 7440-21-3 monosilane 
• 10026-04-7 tetrachlorosilane 
• 10034-85-2 hydrogen iodide 
• 13465-85-5 iodo trichloro silane 
• 13986-26-0 zirconium(IV) iodide 
• 112926-00-8 silica gel 
• 75-47-8 iodoform 
• 13977-54-3 diiododichlorosilane 
• 13465-72-0 triiodo silane 
• 311-28-4 tetra-(n-butyl)ammonium iodide 
• 66469-45-2 Silantetrayltetrakis(trifluormethansulfonat) 
• 13510-43-5 hexaiododisilane 
• 7789-33-5 iodine(I) bromide 

Downstream Products

• 7553-56-2 iodine 
• 78-10-4 tetraethoxy orthosilicate 
• 7440-21-3 silicon 
• 14693-81-3 tantalum pentaiodide 
• 16961-83-4 fluorosilicic acid 
• 13536-76-0 tribromo iodosilane 
• 7789-66-4 tetrabromosilane 
• 229467-45-2 (2-tert-butyl-6-methylphenyl-O)2TiI₂ 
• 112926-00-8 silica gel 
• 10026-04-7 tetrachlorosilane 
• 13465-85-5 iodo trichloro silane 
• 13977-54-3 diiododichlorosilane 
• 13932-03-1 triiodochlorosilane 
• 13779-92-5 niobium(V) iodide 

Relevant academic research and scientific papers

[2+2+1]cycloadditions of bis(dialkylamino)acetylenes with SiI 2(Idip): Syntheses and reactivity studies of unprecedented 2,3,4,5-tetraamino-1 H-siloles

A novel method for the synthesis of 1H-siloles is presented. It involves a [2+2+1] cycloaddition of the ynediamines R2N-C≡C-NR2 (R=Me, Et) with SiI2(Idip) (Idip=1,3-bis(2,6-diisopropylphenyl) imidazolin-2-ylidene) to affor

Chemical vapour transport of intermetallic phases, II: The system Fe-Si

Five phases exist in the system Fe-Si: Fe3Si, Fe2Si, Fe5Si3, FeSi, α- and β-FeSi2. All phases could be prepared by chemical transport with iodine as transport agent in the temperature range between T1 (700 °C) and T2 (1030 °C). In a attempted systematic clarification of the chemical transport reactions of all phases in the system, the effective transport equilibria were determined. Thermodynamic calculations show satisfactory agreement between calculation and experiment.

Silicon Tetrakis(trifluoromethanesulfonate): A Simple Neutral Silane Acting as a Soft and Hard Lewis Superacid

A facile synthesis and isolation of pristine silicon tetrakis(trifluoromethanesulfonate), Si(OTf)4, is reported, acting as the first neutral silicon-based Lewis superacid suitable towards soft and hard Lewis bases. Its OTf groups have a dual function: they are excellent leaving groups and modulate the degree of reactivity towards soft and hard Lewis bases. Exposed to soft Lewis donors, Si(OTf)4 leads to [L2Si(OTf)4] complexes (L=isocyanide, thioether and carbonyl compounds) with retention of all Si?OTf bonds. In contrast, it can cleave C?X bonds (X=F, Cl) of hard organic Lewis bases with a high tendency to form SiX4 (X=F, Cl) after halide/triflate exchange. Most notable, Si(OTf)4 allows a gentle oxydefluorination of mono- and bis(trifluoromethyl)benzenes, resulting in the formation of the corresponding benzoylium species, which are stabilized by the weakly coordinating [Si(OTf)6] dianion.

Reaction of Silicon Difluoride with Halogens: a Reinvestigation

Reactions of SiF2 with halogens have been reinvestigated by both co-condensation and gas-phase methods.The co-condensation method yields a number of fluorohalogenosilanes including mono-, di-, and higher silane derivatives.These compounds contain SiF, SiF2, and SiF3 units.The reactivity towards SiF2 decreases from chlorine through bromine to iodine.While chlorine and bromine give rise to a number of fluorohalogenosilanes, iodine yields only the monosilane derivatives.In contrast, the gas-phase reaction do not progress to any appreciable extent.The products have been characterized by mass spectrometry and 19F and 29Si n.m.r. spectroscopy.Many have been identified for the first time.