142342-33-4

Basic information

• Product Name: 4,4''-Di-tert-butyldiphenyliodonium p-toluenesulfonate
• Synonyms: 4,4''-Di-tert-butyldiphenyliodonium p-toluenesulfonate;Bis(4-tert-butylphenyl)iodonium tosylate;bis(4-tert-butylphenyl)iodanium:4-methylbenzenesulfonate
• CAS NO: 142342-33-4
• Molecular Formula: C₇H₇O₃S*C₂₀H₂₆I
• Molecular Weight: 564.51859
• Mol File: 142342-33-4.mol

Chemical Properties

• Melting Point: 250-251℃
• Appearance: /
• CAS DataBase Reference: 4,4''-Di-tert-butyldiphenyliodonium p-toluenesulfonate(CAS DataBase Reference)
• NIST Chemistry Reference: 4,4''-Di-tert-butyldiphenyliodonium p-toluenesulfonate(142342-33-4)
• EPA Substance Registry System: 4,4''-Di-tert-butyldiphenyliodonium p-toluenesulfonate(142342-33-4)

Safety Data

• Hazardous Substances Data: 142342-33-4(Hazardous Substances Data)

Upstream product

• 5421-53-4 4,4'-Di-tert-butyldiphenyliodonium chloride 
• 80-48-8 methyl p-toluene sulfonate 
• 185195-27-1 di(4-t-butylphenyl)iodonium acetate 
• 253185-03-4 tert-butylbenzene 
• 104-15-4 toluene-4-sulfonic acid 

Downstream Products

• 521295-49-8 2-(4-(tert-butyl)phenyl)-1H-indole 
• 1293366-68-3 3-(4-(tert-butyl)phenyl)-1H-indole 
• 1293366-69-4 5-bromo-3-(4-t-butylphenyl)indole 
• 906777-63-7 C₁₈H₁₈BrN 
• 1293366-67-2 3-(4-t-butylphenyl)-5-methoxyindole 
• 906780-54-9 C₁₉H₂₁NO 
• 74448-90-1 4-tert-butylphenyl 4-methylphenyl ether 
• 5331-28-2 1-tert-butyl-4-phenoxybenzene 
• 134822-96-1 1-(tert-butyl)-4-(4-methoxyphenoxy)benzene 
• 34859-82-0 l-(tert-butyl)-4-(4-nitrophenoxy)benzene 
• 5421-53-4 4,4'-Di-tert-butyldiphenyliodonium chloride 
• 58377-39-2 bis(4-tert-butylphenyl)iodonium bromide 
• 111329-06-7 bis(4-tert-butylphenyl)iodonium iodide 
• 98-54-4 para-tert-butylphenol 

Relevant articles and documents

Facile preparation of unsymmetrical diaryl ethers from unsymmetrical diaryliodonium tosylates and phenols with high regioselectivity

Unsymmetrical diaryl ethers were efficiently obtained in good yields by the reactions of aryl(4-methoxyphenyl)iodonium tosylates with phenols, and aryl(2,4-dimethoxyphenyl)iodonium tosylates with phenols, in the presence of potassium carbonate in acetonitrile, respectively. The latter iodonium tosylates provided the corresponding unsymmetrical diaryl ethers in good yields with high regioselectivities, together with the quantitative formation of 1-iodo-2,4-dimethoxybenzene. Georg Thieme Verlag Stuttgart New York.

One-pot synthesis of diaryliodonium salts using toluenesulfonic acid: A fast entry to electron-rich diaryliodonium tosylates and triflates

A direct synthesis of symmetric and unsymmetric electron-rich diaryliodonium salts is described. The use of MCPBA and toluenesulfonic acid delivers diaryliodonium tosylates in high yields. An in situ anion exchange has also been developed, giving access to the corresponding triflate salts. Georg Thieme Verlag Stuttgart.

Process for producing onium salt derivative and novel onium salt derivative

The invention provides a high-yield method for producing onium salt derivatives useful as agents, such as acid-generators, employed in chemically amplified resists; and to provide novel onium salt derivatives. Reaction of an onium salt derivative containi

Novel anthracene derivative and radiation-sensitive resin composition

A novel anthracene derivative useful as an additive to a radiation-sensitive resin composition is disclosed. The anthracene derivative has the following formula (1), wherein R1 groups individually represent a hydroxyl group or a monovalent organic group having 1-20 carbon atoms, n is an integer of 0-9, X is a single bond or a divalent organic group having 1-12 carbon atoms, and R2 represents a monovalent acid-dissociable group. The radiation-sensitive resin composition comprises the anthracene derivative of the formula (1), a resin insoluble or scarcely soluble in alkali, but becomes alkali soluble in the presence of an acid, and a photoacid generator. The composition is useful as a chemically-amplified resist for microfabrication utilizing deep ultraviolet rays, typified by a KrF excimer laser and ArF excimer laser.

Novel carbazole derivative and chemically amplified radiation-sensitive resin composition

A carbazole derivative of the following formula (1), wherein R1 and R2 individually represent a hydrogen atom or a monovalent organic group, or R1 and R2 form, together with the carbon atom to which R1 and R2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.