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Silicon nitride, with the chemical formula Si3N4, is a non-oxide ceramic material composed of silicon and nitrogen atoms. It is renowned for its exceptional mechanical and thermal properties, including a high melting point, high strength, hardness, and resistance to wear and corrosion. These attributes allow silicon nitride to retain its properties even at elevated temperatures, making it an ideal material for a variety of applications across different industries.

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  • 12033-60-2 Structure
  • Basic information

    1. Product Name: silicon nitride
    2. Synonyms:
    3. CAS NO:12033-60-2
    4. Molecular Formula: NSi
    5. Molecular Weight: 42.0922
    6. EINECS: 234-787-9
    7. Product Categories: N/A
    8. Mol File: 12033-60-2.mol
  • Chemical Properties

    1. Melting Point: N/A
    2. Boiling Point: N/A
    3. Flash Point: N/A
    4. Appearance: N/A
    5. Density: N/A
    6. Refractive Index: N/A
    7. Storage Temp.: N/A
    8. Solubility: N/A
    9. CAS DataBase Reference: silicon nitride(CAS DataBase Reference)
    10. NIST Chemistry Reference: silicon nitride(12033-60-2)
    11. EPA Substance Registry System: silicon nitride(12033-60-2)
  • Safety Data

    1. Hazard Codes: N/A
    2. Statements: N/A
    3. Safety Statements: N/A
    4. WGK Germany:
    5. RTECS:
    6. HazardClass: N/A
    7. PackingGroup: N/A
    8. Hazardous Substances Data: 12033-60-2(Hazardous Substances Data)

12033-60-2 Usage

Uses

Used in Advanced Manufacturing:
Silicon nitride is utilized as a high-performance material in the production of cutting tools due to its hardness and wear resistance, enhancing tool longevity and performance in various machining processes.
Used in Automotive Industry:
In the automotive sector, silicon nitride is employed as a material for high-temperature components and bearings, capitalizing on its thermal stability and mechanical strength to improve engine efficiency and reliability.
Used in Aerospace Industry:
The aerospace field leverages silicon nitride for its lightweight and high-temperature resistance properties, using it in the manufacturing of components that require exceptional strength and durability under extreme conditions.
Used in Biomedical Applications:
Silicon nitride is used as a biocompatible material in dental and orthopedic implants, taking advantage of its resistance to biological degradation and its ability to integrate well with living tissue without adverse reactions.
Each of these applications takes full advantage of silicon nitride's unique combination of properties, highlighting its versatility and importance in modern engineering and medical fields.

Check Digit Verification of cas no

The CAS Registry Mumber 12033-60-2 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,2,0,3 and 3 respectively; the second part has 2 digits, 6 and 0 respectively.
Calculate Digit Verification of CAS Registry Number 12033-60:
(7*1)+(6*2)+(5*0)+(4*3)+(3*3)+(2*6)+(1*0)=52
52 % 10 = 2
So 12033-60-2 is a valid CAS Registry Number.

12033-60-2SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 17, 2017

Revision Date: Aug 17, 2017

1.Identification

1.1 GHS Product identifier

Product name silicon nitride

1.2 Other means of identification

Product number -
Other names -

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:12033-60-2 SDS

12033-60-2Downstream Products

12033-60-2Relevant articles and documents

HNSi; ν1 emission band by high resolution Fourier transform spectroscopy

Elhanine, M.,Farrenq, R.,Guelachvili, G.

, p. 2529 - 2531 (1991)

The emission spectrum of the fundamental vibration-rotation ν1 band (NH stretch) of iminosilicon HNSi has been observed near 2.7μm by high resolution Fourier transform spectroscopy from a mixture of N2 + SiH4 excited in a radio frequency discharge.This is the first spectroscopic observation of this molecule in the gas phase.Molecular constants ?, B, D, H are reported.Calculated microwave transitions which should be helpful for the investigation and the possible identification of HNSi in astrophysical sources are also given.

Reactions of atomic silicon and germanium with ammonia: A matrix-isolation FTIR and theoretical study

Chen, Mohua,Zheng, Aihua,Lu, Hao,Zhou, Mingfei

, p. 3077 - 3083 (2002)

The reactions of Si atoms with NH3 molecules have been studied using matrix-isolation FTIR spectroscopy and density functional theoretical calculations. Silicon atoms reacted with NH3 to form the SiNH3 complex spontaneousl

Gas-Phase Reactions of Si+ with Ammonia and the Amines (CH3)xNH3-x (x-1-3): Possible Ion-Molecule Reaction Pathways toward SiH, SiCH, SiNH, SiCH3, SiNCH3, and H2SiNH

Wlodek, S.,Bohme, D.K.

, p. 2396 - 2399 (1988)

Rate constants and product distributions have been determined for gas-phase Si+(2P) ions with ammonia and the amines (CH3)xNH3-x (x=1-3) at 296+/-2 K with the selected-ion flow tube technique.All reactions were observed to be fast and can be understood in terms of Si+ insertion into N-H and C-N bonds to form ions of the type SiNR1R2+ (R1, R2 = H, CH3) proceeding in competition (in the case of the amines) with hydride ion transfer to form immonium ions of the type CH2NR1R2+ (R1, R2 =H, CH3).C-N bond insert ion appears more efficient than N-H bond insertion.The contribution if hydride ion transfer increases with increasing stability of the immonium ion.The latter reaction leads directly to SiH as a neutral product.Other minor reaction channels were seen which lead directly or indirectly to SiCH and SiCH3.Rapid secondary proton transfer reactions were observed for SiNH2+ and SiNHCH3+ to produce gas-phase SiNH and SiNCH3 molecules.With methylamine SiNH2+ also appears to produce H2SiNH2+ which may deprotonate to form the simplest silanimine, H2SiNH, or aminosilylene, HSiNH2.Reactions of this type are of interest in molecular synthesis and here are proposed to contribute to the formation of SiH, SiCH, SiNH, SiCH3, SiNCH3, and H2SiNH or HSiNH2 in partially ionized interstellar gas clouds containing silicon, ammonia, and methylamines.

The microwave spectrum of the SiN(2Σ+) radical

Saito, Shuji,Endo, Yasuki,Hirota, Eizi

, p. 6447 - 6450 (1983)

The microwave absorption spectrum of the SiN radical has been detected in a dc glow discharge in a SiCl4 or SiH4/N2 mixture.The three rotational transitions N = 2a source-frequency modulation microwave spectrometer.The rotational constant, the centrifugal distortion constant, the spin-rotation coupling constant, and the magnetic hyperfine coupling constants b and c and the electric quadrupole coupling constant of the nitrogen nucleus have been precisely determined.The electronic structure of the SiN molecule has been briefly discussed using the magnetic hyperfine coupling constants and also the quadrupole coupling constant of 14N.

Theoretical and experimental studies of the flash pyrolysis of trimethylsilyl azide and trimethylgermyl azide: Generation and He I photoelectron spectra of iminosilylene and iminogermylene

Guimon, Claude,Pfister-Guillouzo, Geneviève

, p. 1387 - 1392 (1987)

The generation and the detection of iminosilylene and its germanium analogue from trimethylsilyl (and germyl) azide by gas-phase flash pyrolysis (1100 K, 10-2 mbar) are described. The ab initio study of molecular rearrangements of the (CH3

Gas-Phase Chemistry of HSiS- and HSiNH-: Ions Related to Silathioformaldehyde and the Silaazomethine of Formaldehyde

Damrauer, Robert,Krempp, Michele,O'Hair, Richard A. J.

, p. 1998 - 2005 (2007/10/02)

Anions related to silathioformaldehyde (H2Si=Si) and the silaazomethine of formaldehyde (H2Si=NH) have been prepared and studied using flowing afterglow selected ion flow tube techniques.The connectivities of these anions are shown in experimental studies to be - and -.In addition, ab initio computational studies demonstrate that these are the most stable anion isomers.These anions are prepared by both collisionally-induced dissociation and direct source reactions.The anions resulting from the later preparations have been submitted to reaction chemistry studies with CO2, COS, CS2, SO2, O2, and C6F6.Comparisons with earlier studies of HSiO- are made in terms of a simple mechanistic picture.

Hetero ?-Systems, 17. - Aminosilylene (Aminosilanediyl)

Maier, Guenter,Glatthaar, Joerg,Reisenauer, Hans Peter

, p. 2403 - 2406 (2007/10/02)

Aminosilylene can be prepared by 254-nm photolysis of silyl azide isolated in an argon matrix at 12 K.Subsequent irradiation with wavelenghts > 300 nm yields silaisonitrile (3) and molecular hydrogen.This reaction may be reversed with 254-nm light. - Key Words: Hydrogen capture / Matrix isolation / Photochemistry / Aminosilylene

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