C O M M U N I C A T I O N S
Figure 3. I-V characteristics of an illustrative as-prepared TFT device
using 1a semiconductor (channel length ) 90 µm; channel width ) 1000
µm): (a) transfer curve in saturated regime at a constant source-drain voltage
of -60 V and square root of absolute value of drain current as a function
of gate voltage; and (b) output curves at different gate voltages.
after standing over an extended period of time in an ambient
environment at 20% relative humidity. In sharp contrast, the devices
fabricated with 2a under similar conditions displayed poorer
performance and failed within a few days.4a,d The mobility of the
test device decreased slightly from 0.20 to about 0.16 cm2 V-1 s-1
over a period of 30 days under these conditions.
Figure 1. Schematic illustrations of 2-D GIXRD measurement (incident
X-ray angle at 2.5°) of a thin film of 1a (a) and 2-D transmission XRD
measurement of a stack of thin films of 1a (b); 2-D GIXRD images of a
thin film of 1a (c); 2-D transmission XRD images obtained with the incident
X-ray normal (d) and parallel (e) to the film stack of 1a; (f), (g), and (h)
are respective XRD diffractograms of pattern intensities of (c), (d), and (e)
[obtained by integration of Chi (0-360°) with GADDS software].
In summary, we have designed a new solution-processable, high-
mobility polythiophene semiconductor with enhanced stability for
fabrication of low-cost TFTs. Of particular significance is that this
semiconductor exhibited high FET mobility even without the usual
time-consuming postdeposition thermal annealing step, thus po-
tentially enabling high-throughput, roll-to-roll mass manufacturing
processes for TFT circuits. In addition, recent progress in structural
optimization has led to greatly improved mobility of ∼0.4 cm2 V-1
s-1
.
Acknowledgment. Partial financial supports of this work were
provided by Natural Science and Engineering Research Council of
Canada (NSERC) and Xerox Foundation.
Figure 2. AFM images of an illustrative thin film of 1a: (a) topography
image; (b) phase image showing large domains of 1 µm in width and >1
µm in length.
Supporting Information Available: Instrumentation, details of
experimental procedures, and additional figures. This material is
and a weak interlayer (100) diffraction. Strong (100), (200), (300),
and (010) diffraction patterns were detected when the incident X-ray
was parallel to the film stack (Figure 1e), showing the π-π stacking
and interlayer diffraction patterns which were normal to each other.
Accordingly, the molecular organization of 1a in thin films was
essentially similar to that of 2a. The highly organized nature of 1a
in a solution-processed thin film was manifested by the formation
of extraordinarily large domains of ∼1 µm in width and >1 µm in
length, in comparison to those of other polythiophenes,4c,5b as
visualized in the AFM images (Figure 2).
The FET properties of 1a as a solution-processed thin-film
semiconductor were evaluated using a bottom-gate, top-contact TFT
configuration built on an n-doped silicon wafer with evaporated
gold source/drain electrodes and OTS-8-modified SiO2 gate di-
electric (see Supporting Information). Figure 3 shows the typical
output and transfer curves of a representative as-prepared TFT
device without postdeposition thermal annealing. The output
behaviors followed closely the metal oxide-semiconductor FET
gradual channel model with very good saturation and no observable
contact resistance. The transfer characteristics showed near-zero
turn-on voltage, a small threshold voltage of -5.9 V, and a sub-
threshold slope of ∼2 V/decade. The device gave a saturation
mobility of 0.15-0.25 cm2 V-1 s-1 with a current on/off ratio of
105-106 when measured in ambient conditions. Annealing at 100-
150 °C in vacuum did not lead to improved FET performance, in
sharp contrast to the behaviors of most polymer thin-film semi-
conductors such as PQT and its analogues. The TFT devices using
1a as the semiconductor also exhibited relatively stable performance
over time as no significant degradation in mobility was observed
References
(1) Organic Electronics: Materials, Manufacturing, and Applications; Klauk,
H., Ed.; Wiley-VCH: Weinheim, Germany, 2006.
(2) (a) Sirringhaus, H.; Tessler, N.; Friend, R. H. Science 1998, 281, 1741-
1744. (b) Sirringhaus, H.; Kawase, T.; Friend, R. H.; Shimoda, T.;
Inbasekaran, M.; Wu, W.; Woo, E. P. Science 2000, 290, 2123-2126.
(c) Bao, Z. AdV. Mater. 2000, 12, 227-230. (d) Forrest, S. R. Nature
2004, 428, 911-918. (e) Sirringhaus, H. AdV. Mater. 2005, 17, 2411.
(3) (a) Bao, Z.; Dodabalapur, A.; Lovinger, A. J. Appl. Phys. Lett. 1996, 69,
4108-4110. (b) Sirringhaus, H.; Brown, P. J.; Friend, R. H.; Nielsen, M.
M.; Bechgaard, K.; Langeveld-Voss, B. M. W.; Spiering, A. J. H.; Janssen,
R. A. J.; Meijer, E. W.; Herwig, P.; de Leeuw, D. M. Nature 1999, 401,
685-688. (c) Prosa, T. J.; Winokur, M. J.; Moulton, J.; Smith, P.; Heeger,
A. J. Macromolecules 1992, 25, 4364-4372. (d) Yamamoto, T.; Ko-
marudin, D.; Arai, M.; Lee, B. L.; Suganuma, H.; Asakawa, N.; Inoue,
Y.; Kubota, K.; Sasaki, S.; Fukuda, T.; Matsuda, H. J. Am. Chem. Soc.
1998, 120, 2047-2058.
(4) (a) Ong, B. S.; Wu, Y.; Liu, P.; Gardner, S. J. Am. Chem. Soc. 2004,
126, 3378-3379. (b) Wu, Y.; Liu, P.; Gardner, S.; Ong, B. S. Chem.
Mater. 2005, 17, 221-223. (c) Ong, B. S.; Wu, Y.; Liu, P.; Gardner, S.
AdV. Mater. 2005, 17, 1141-1144. (d) Ong, B. S.; Wu, Y.; Jiang, L.;
Liu, P.; Murti, K. Synth. Met. 2004, 142, 49-52. (e) Liu, P.; Wu, Y.; Li,
Y.; Ong, B. S.; Zhu, S. J. Am. Chem. Soc. 2006, 128, 4554-4555. (f) Li,
Y.; Wu, Y.; Liu, P.; Birau, M.; Pan, H.; Ong, B. S. AdV. Mater. 2006, 18,
3029-3032.
(5) (a) Heeney, M.; Bailey, C.; Genevicius, K.; Shkunov, M.; Sparrowe, D.;
Tierney, S.; McCulloch, I. J. Am. Chem. Soc. 2005, 127, 1078-1079. (b)
Mcculloch, I.; Heeney, M.; Bailey, C.; Genevicius, K.; Macdonald, I.;
Shkunov, M.; Sparrowe, D.; Tierney, S.; Wagner, R.; Zhang, W. M.;
Chabinyc, M. L.; Kline, R. J.; Mcgehee, M. D.; Toney, M. F. Nat. Mater.
2006, 5, 328-333.
(6) Kim, Y.; Cook, S.; Tuladhar, S. M.; Choulis, S. A.; Nelson, J.; Durrant,
J. R.; Bradley, D. D. C.; Giles, M.; Mcculloch, I.; Ha, C. S.; Ree, M.
Nat. Mater. 2006, 5, 197-203.
JA067879O
9
J. AM. CHEM. SOC. VOL. 129, NO. 14, 2007 4113