3 (a) K. Dedeian, J. Shi, N. Shepherd, E. Forsythe and D. C. Morton,
Inorg. Chem., 2005, 44, 4445; (b) A. B. Tamayo, B. D. Alleyne,
P. I. Djurovich, S. Lamansky, I. Tsyba, N. N. Ho, R. Bau and
M. E. Thompson, J. Am. Chem. Soc., 2003, 125, 7377; (c)
C.-H. Yang, S.-W. Li, Y. Chi, Y.-M. Cheng, Y.-S. Yeh, P.-T. Chou,
G.-H. Lee, C.-H. Wang and C.-F. Su, Inorg. Chem., 2005, 44, 7770;
(d) C.-H. Yang, Y.-M. Cheng, Y. Chi, C.-J. Hsu, F.-C. Fang,
K.-T. Wong, P.-T. Chou, C.-H. Chang, M.-H. Tsai and C.-C. Wu,
Angew. Chem., Int. Ed., 2007, 46, 2418; (e) C.-J. Chang, C.-H. Yang,
K. Chen, Y. Chi, C.-F. Shu, M.-L. Ho, Y.-S. Yeh and P.-T. Chou,
Dalton Trans., 2007, 1881; (f) X. Yu, H.-S. Kwok, W.-Y. Wong and
G.-J. Zhou, Chem. Mater., 2006, 18, 5097.
7.07–7.04 (m, 9 H, Ar), 6.98–6.95 (m, 4 H, Ar), 6.92–6.88 (m,
4 H, Ar), 5.51 (s, 1 H, acac), 2.09 (s, 3 H, acac), 2.02 (s, 3 H,
acac). 13C NMR (100 MHz, CDCl3): 185.78, 184.15 (acac),
167.94, 152.38, 147.68, 147.33, 147.16, 145.95, 143.98, 141.26,
140.22, 140.14, 138.24, 137.91, 129.11, 128.91, 127.69, 127.25,
125.96, 124.24, 123.02, 122.59, 121.78, 120.84, 118.66 (Ar),
102.60 (acac), 64.17 (quat. C), 28.30, 27.24 (acac). FAB-MS
(m/z): 1023 [M]+. Anal. Calcd for C59H45N3O2Pt: C, 69.26; H,
4.43; N, 4.11. Found: C, 69.11; H, 4.27; N, 4.34%.
4 (a) M. Ikai, S. Tokito, Y. Sakamoto, T. Suzuki and Y. Taga, Appl.
Phys. Lett., 2001, 79, 156; (b) C. Adachi, M. A. Baldo,
S. R. Forrest and M. E. Thompson, Appl. Phys. Lett., 2000, 77,
904; (c) W.-Y. Wong, G.-J. Zhou, X.-M. Yu, H.-S. Kwok and
B.-Z. Tang, Adv. Funct. Mater., 2006, 16, 838; (d) W.-Y. Wong,
C.-L. Ho, Z.-Q. Gao, B.-X. Mi, C.-H. Chen, K.-W. Cheah and
Z. Lin, Angew. Chem., Int. Ed., 2006, 45, 7800; (e) S. Tokito,
T. Iijima, Y. Suzuri, H. Kita, T. Tsuzuki and F. Sato, Appl. Phys.
Lett., 2003, 83, 569; (f) H. Kanno, Y. Sun and S. R. Forrest, Appl.
Phys. Lett., 2005, 86, 263502; (g) G.-J. Zhou, X.-Z. Wang,
W.-Y. Wong, X.-M. Yu, H.-S. Kwok and Z.-Y. Lin, J. Organomet.
Chem., 2007, 692, 3461; (h) X.-M. Yu, G.-J. Zhou, C.-S. Lam,
W.-Y. Wong, X.-L. Zhu, J.-X. Sun, M. Wong and H.-S. Kwok,
J. Organomet. Chem., 2008, DOI: 10.1016/j.jorganchem.
2007.04.013; (i) G.-J. Zhou, C.-L. Ho, W.-Y. Wong, Q. Wang,
D.-G. Ma, L.-X. Wang, Z.-Y. Lin, T. B. Marder and A. Beeby,
Adv. Funct. Mater., 2008, 18, 499.
5 (a) X. Gong, J. C. Ostrowski, D. Moses, G. C. Bazan and
A. J. Heeger, Adv. Funct. Mater., 2003, 13, 439; (b) Y.-L. Tung,
L.-S. Chen, Y. Chi, P.-T. Chou, Y.-M. Cheng, E. Y. Li, G.-H. Lee,
C.-F. Shu, F.-I. Wu and A. J. Carty, Adv. Funct. Mater., 2006, 16,
1615; (c) J. Kavitha, S.-Y. Chang, Y. Chi, J.-K. Yu, Y.-H. Hu,
P.-T. Chou, S.-M. Peng, G.-H. Lee, Y.-T. Tao, C.-H. Chien and
A. J. Carty, Adv. Funct. Mater., 2005, 15, 223; (d) Y.-H. Niu,
Y.-L. Tung, Y. Chi, C.-F. Shu, J. H. Kim, B. Chen, J. Luo,
A. J. Carty and A. K.-Y. Jen, Chem. Mater., 2005, 17, 3532.
6 (a) S. Bettington, M. Tavasli, M. R. Bryce, A. Beeby, H. Al-Attar and
A. P. Monkman, Chem. Eur. J., 2007, 13, 1423; (b) S. Tokito,
M. Suzuki, F. Sato, M. Kamachi and K. Shirane, Org. Electron.,
2003, 4, 105; (c) X. Chen, J.-L. Liao, Y. Liang, M. O. Ahmed,
H.-E. Tseng and S.-A. Chen, J. Am. Chem. Soc., 2003, 125, 636; (d)
F.-I. Wu, H.-J. Su, C.-F. Shu, L. Luo, W.-G. Diau, C.-H. Cheng,
J.-P. Duan and G.-H. Lee, J. Mater. Chem., 2005, 15, 1035; (e)
Y.-H. Sun, X.-H. Zhu, Z. Chen, Y. Zhang and Y. Cao, J. Org.
Chem., 2006, 71, 6281; (f) C.-L. Ho, W.-Y. Wong, G.-J. Zhou,
B. Yao, Z. Xie and L. Wang, Adv. Funct. Mater., 2007, 17, 2925;
(g) C.-L. Ho, W.-Y. Wong, Z.-Q. Gao, C.-H. Chen, K.-W. Cheah,
B. Yao, Z. Xie, Q. Wang, D. Ma, L. Wang, X.-M. Yu, H.-S. Kwok
and Z. Lin, Adv. Funct. Mater., 2008, 18, 319.
7 (a) S.-C. Lo, N. A. H. Male, J. P. J. Markham, S. W. Magennis,
P. L. Burn, O. V. Salata and I. D. W. Samuel, Adv. Mater., 2002,
14, 975; (b) S.-C. Lo, G. J. Richards, J. P. J. Markham,
E. B. Namdas, S. Sharma, P. L. Burn and I. D. W. Samuel, Adv.
Funct. Mater., 2005, 15, 1451; (c) J. Q. Ding, J. Gao, Y. X. Cheng,
Z. Y. Xie, L. X. Wang, D. G. Ma, X. B. Jing and F. S. Wang, Adv.
Funct. Mater., 2006, 16, 575; (d) P. L. Burn, S.-C. Lo and
I. D. W. Samuel, Adv. Mater., 2007, 19, 1675; (e) G.-J. Zhou,
W.-Y. Wong, B. Yao, Z.-Y. Xie and L.-X. Wang, Angew. Chem.,
Int. Ed., 2007, 46, 1149.
8 (a) P. J. Low, M. A. J. Paterson, H. Puschmann, A. E. Goeta,
A. K. Howard, C. Lambert, J. C. Cherryman, D. R. Tackley,
S. Leeming and B. Brown, Chem. Eur. J., 2004, 10, 83; (b)
P. J. Low, M. A. J. Paterson, A. E. Goeta, D. S. Yufit,
J. A. K. Howard, J. C. Cherryman, D. R. Tackley and B. Brown,
J. Mater. Chem., 2004, 14, 2516; (c) R. D. Hreha, C. P. George,
OLED fabrication and measurements
Commercial indium tin oxide (ITO) coated glass with sheet resis-
tance of 20–30 U ,ꢀ1 was used as the starting substrates. Before
device fabrication, the ITO glass substrates (anode) were cleaned
by ultrasonic baths in organic solvents followed by ozone treat-
ment for 20 min. Then 40 nm thick PEDOT : PSS film was first
deposited on the ITO glass substrates, and cured at 120 ꢁC for 30
min in air. The emitting layer (70 nm) was obtained by spin-
coating a chloroform solution of each phosphorescent dopant
(x%) in CBP at various concentrations. Then, the sample was
dried in a vacuum oven at 50 ꢁC for 15 min and it was transferred
to the deposition system for organic and metal deposition. BCP
(15 nm), Alq3 (40 nm), LiF (1 nm) and Al cathode (100 nm) were
successively evaporated at a base pressure less than 10ꢀ6 Torr.
The EL spectra and CIE coordinates were measured with
a PR650 spectra colorimeter. The J–V–L curves of the devices
were recorded by a Keithley 2400/2000 source meter and the
luminance was measured using a PR650 SpectraScan spectro-
meter. All the experiments and measurements were carried out
under ambient conditions.
Acknowledgements
Financial support from a CERG grant from the Research
Grants Council of the Hong Kong SAR, People’s Republic of
China (Project No. HKBU202106) and the Hong Kong Baptist
University is gratefully acknowledged for this work.
References
1 (a) M. A. Baldo, D. F. O’Brien, Y. You, A. Shoustikov, S. Sibley,
M. E. Thompson and S. R. Forrest, Nature, 1998, 395, 151; (b)
S.-J. Yeh, M.-F. Wu, C.-T. Chen, Y.-H. Song, Y. Chi, M.-H. Ho,
S.-F. Hsu and C. H. Chen, Adv. Mater., 2005, 17, 285; (c)
M. K. Nazeeruddin, R. Humphry-Baker, D. Berner, S. Rivier,
L. Zuppiroli and M. Graetzel, J. Am. Chem. Soc., 2003, 125, 8790;
(d) B. W. D’Andrade, J. Brooks, V. Adamovich, M. E. Thompson
and S. R. Forrest, Adv. Mater., 2002, 14, 1032; (e) C.-L. Li, Y.-J.
Su, Y.-T. Tao, P.-T. Chou, C.-H. Chien, C.-C. Cheng and R.-S.
Liu, Adv. Funct. Mater., 2005, 15, 387; (f) Y.-H. Song, S.-J. Yeh,
C.-T. Chen, Y. Chi, C.-S. Liu, J.-K. Yu, Y.-H. Hu, P.-T. Chou,
S.-M. Peng and G.-H. Lee, Adv. Funct. Mater., 2004, 14, 1221; (g)
E. Holder, B. M. W. Langeveld and U. S. Schubert, Adv. Mater.,
2005, 17, 1109; (h) P.-T. Chou and Y. Chi, Chem. Eur. J., 2007, 13,
380; (i) H. Yersin, Top. Curr. Chem., 2004, 241, 1; (j) R. C. Evans,
P. Douglas and C. J. Winscom, Coord. Chem. Rev., 2006, 250,
2093; (k) M. A. Baldo, M. E. Thompson and S. R. Forrest, Pure
Appl. Chem., 1999, 71, 2095.
´
A. Haldi, B. Domercq, M. Malagoli, S. Barlow, J.-L. Bredas,
B. Kippelen and S. R. Marder, Adv. Funct. Mater., 2003, 13, 967;
(d) K. R. Justin Thomas, J. T. Lin, Y.-T. Tao and C.-W. Ko,
J. Am. Chem. Soc., 2001, 123, 9404; (e) N. Tamoto, C. Adachi and
K. Nagai, Chem. Mater., 1997, 9, 1077; (f) P. Strohriegl and
J. V. Grazulevicius, Adv. Mater., 2002, 14, 1439.
2 (a) X. Gong, M. R. Robinson, J. C. Ostrowski, D. Moses,
G. C. Bazan and A. J. Heeger, Adv. Mater., 2002, 14, 581; (b)
C. Adachi, M. A. Baldo, M. E. Thompson and S. R. Forrest,
J. Appl. Phys., 2001, 90, 5048; (c) A. Ko¨hler, J. S. Wilson and
R. H. Friend, Adv. Mater., 2002, 14, 701.
9 J. Pei, J. Ni, X.-H. Zhou, X.-Y. Cao and Y.-H. Lai, J. Org. Chem.,
2002, 67, 4924.
1808 | J. Mater. Chem., 2008, 18, 1799–1809
This journal is ª The Royal Society of Chemistry 2008