C-C bond cleavage steps. The orifices in these compounds
are suitable for the formation of water-encapsulated com-
plexes.
hemiketal fullerene carbon is slightly shifted to lower field
at 110.2 ppm compared with its precursor 5.
We have previously investigated the reaction between
fullerene diketones and anilines. The resulting fullerene
hemiketal amino-ketal derivatives were proved to be useful
precursors for cage-opened fullerene derivatives.6a However,
to our surprise, the reaction of 6 and aniline directly led to
the formation of two orifice-enlarged compounds 1a and 2a
(Scheme 2). In the formation of 1a, all three t-butoxyl groups
The oxahomofullerene 3 was prepared in three steps as
we reported previously.12 Treatment of 3 with AgClO4 and
water converted the chlorine atom into a hydroxyl group and
resulted in the formation of 4. The hemiketal hydroxyl group
in 4 could be selectively acylated with acetic anhydride to
form the diol 5, which was oxidized with diacetoxyliodo-
benzene (DIB) to give the corresponding diketone derivative
6 (Scheme 1). Protection of the hemiketal moiety was
Scheme 2. Cage-Opening by Cascade Process
Scheme 1. Preparation of Cage-Opened Precursor
in 6 were removed. The remaining t-butylperoxo group in
compound 2a could be reduced to the hydroxyl group in 1a
with CuBr in excellent yield. Further optimization showed
that isolation of 6 was not necessary before the addition of
aniline. The DIB oxidation and the amination could be
carried out in one pot with improved overall yield (54% for
2a). Other aniline derivatives such as the 4-bromo and
4-isopropyl anilines gave similar results with slightly dif-
ferent yields. The more electron rich 4-isopropyl aniline gave
relatively higher yield of the dihydroxyl derivative 1.
A possible mechanism for the amine-initiated cage-opening
process is shown in Scheme 3. The first step is the aminolysis
of the hemiketal ester to form the allyl anion intermediate
A with four carbonyl groups. Loss of t-butoxide ion from A
results in the formation of B with an epoxy moiety. Addition
of another amine molecule to B opens the epoxide through
the SN2′ mechanism. The resulting intermediate C undergoes
a formal 3,3-σ rearrangement process to cleave another
fullerene C-C bond to form intermediate D. This step is
probably driven mainly by ring strain. Cleavage of the
fullerene C-C bond in this step allows the central pentagon
to be lifted up from the spherical surface and become
completely planar (see crystal structure of 1a below). In the
final step, a third amine molecule reacts with the less
hindered carbonyl group on the lifted pentagon to form
compound 2. Activation of this carbonyl group by H-bond
from the adjacent OH group must play a key role for the
observed selective imination besides steric preference.
necessary for oxidation with DIB. Direct oxidation of 4 gave
complicated mixture of products.
The structure of compound 3 was previously confirmed
by single crystal X-ray analysis.12 Compounds 4 and 5 are
analogous to 3. Their NMR spectra show similar pattern.
The unique hemiketal fullerene carbon appears at 108.0,
107.8, and 107.7 ppm on the 13C NMR spectrum for
compounds 3, 4, and 5, respectively. The diketone derivative
6 showed two carbonyl groups at 194.6 and 192.0 ppm. Its
(6) (a) Xiao, Z.; Yao, J. Y.; Yang, D. Z.; Wang, F. D.; Huang, S. H.;
Gan, L. B.; Jia, Z. S.; Jiang, Z. P.; Yang, X. B.; Zheng, B.; Yuan, G.;
Zhang, S. W.; Wang, Z. M. J. Am. Chem. Soc. 2007, 129, 16149. (b)
Pankewitz, T.; Klopper, W. Chem. Phys. Lett. 2008, 465, 48.
(7) Whitener, K. E., Jr.; Frunzi, M.; Iwamatsu, S. -i.; Murata, S.; Cross,
R. J.; Saunders, M. J. Am. Chem. Soc. 2008, 130, 13996.
(8) Stanisky, C. M.; Cross, R. J.; Saunders, M. J. Am. Chem. Soc. 2009,
131, 3392.
(9) Wang, G. W.; Wu, P.; Tian, Z. G. Eur. J. Org. Chem. 2009, 7, 1032.
(10) Whitener; Jr, K. E.; Cross, R. J.; Saunders, M; Iwamatsu, S. -i;
Murata, S.; Mizorogi, N.; Nagase, S. J. Am. Chem. Soc. 2009, 131, 6338.
(11) (a) Komatsu, K.; Murata, M.; Murata, Y. Science 2005, 307, 238.
(b) Murata, M.; Murata, Y.; Komatsu, K. J. Am. Chem. Soc. 2006, 128,
8024. (c) Matsuo, Y.; Isobe, H.; Tanaka, T.; Murata, Y.; Murata, M.;
Komatsu, K.; Nakamura, E. J. Am. Chem. Soc. 2005, 127, 17148. (d) Murata,
Y.; Maeda, S.; Murata, M.; Komatsu, K. J. Am. Chem. Soc. 2008, 130,
6702.
(12) Huang, S. H.; Xiao, Z.; Wang, F. D.; Zhou, J.; Yuan, G.; Zhang,
S. W.; Chen, Z. F.; Thiel, W.; Schleyer, P. R.; Zhang, X.; Hu, X. Q.; Chen,
B. C.; Gan, L. B. Chem.sEur. J. 2005, 11, 5449.
Org. Lett., Vol. 11, No. 13, 2009
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