
Phosphorus, Sulfur and Silicon and the Related Elements p. 1445 - 1454 (2010)
Update date:2022-08-02
Topics:
Asadi, Mozaffar
Esmaielzadeh, Sheida
Mohammadi, Khosro
A set of eight unsymmetrical tetradentate Schiff bases (cdPhsalpd = Methyl-2-{[3-(2-hydroxyphenyl)phenylidynenitrilo]propyl}amino-1- cyclopentenedithiocarboxylate; cd3-, 4-, 5-OMesalpd = Methyl-2-{[3-(2-hydroxy 3-, 4-, 5-methoxyphenyl)methylidynenitrilo]propyl} amino-1- cyclopentenedithiocarboxylate; cd5Clsalen = Methyl-2-{[3-(2-hydroxy-5-chloro phenyl)methylidynenitrilo]propyl}amino-1-cyclopentenedithiocarboxylate; cd5Brsalen = Methyl-2-{[3-(2-hydroxy-5-bromophenyl)methylidynenitrilo]propyl} amino- 1-cyclopente- nedithiocarboxylate; cd5NO2salen = Methyl-2-{[3-(2-hydroxy- 5-nitrophenyl)methylidyne- nitrilo]propyl}amino-1-cyclopentenedithiocarboxylate; and cd5SO3Na = Methyl-2-{[3- (2-hydroxy-5-sodiumsulfitephenyl) methylidynenitrilo]propyl} amino-1-cyclopentenedithi- ocarboxylate, have been obtained by condensation of methyl-2-(3-aminopropylamino) cyclopentenedithiocarboxylate (Hcdpd) with some substituted salicylaldehydes, 2-hydroxy acetophenone, and 2-hydroxy benzophenone, which present a NNOS coordination spheres. Also, the metal complexes (M = Cu, Ni) of these ligands were prepared and characterized by elemental analysis, IR, 1H NMR, UV-Vis, and mass spectrometry.The formation constants and the thermodynamic free energies were measured using UV-Vis spectrophotometry titration for 1:1 complex formation at constant ionic strength 0.1 M (NaClO4) at 25°C in DMF. The trend of the complex formation of the nickel and copper complexes is as follows: [M(cdMesalpd)] > [(Mcdsalpd)] > [M(cdPhsalpd)] and [M(cd5OMesalpd)] > [M(cd3OMesalpd)] > [M(cd4OMesalpd)] and [M(cd5OMesalpd)] > [M(cdsalpd)] > [M(cd5Brsalpd)] > [M(cd5Clsalpd)] > [M(cd5SO3Nasalpd)] [M(cd5NO2salpd)]. Our results revealed the thermodynamic formation constant, Kf, and the free energy values for Cu(II) complexes are higher than the Ni(II) complexes. Supplemental materials are available for this article. Go to the publisher's online edition of Phosphorus, Sulfur, and Silicon and the Related Elements to view the free supplemental file. Copyright Taylor & Francis Group, LLC.
Huaihua Baohua Biotechnology Co.,Ltd
website:http://www.baochengchem.com
Contact:86-519-82698291
Address:HouYang chemical development zone,Jintan,Jiangsu,China (213200)
Suzhou Wedo Chemicals Co., Ltd.
Contact:86 512 58100425
Address:Zonger Road, DongSha Industry Park , Zhangjiagang, Jiangsu, China
shanghai meicheng chemical co .,ltd(expird)
Contact:+86-21-50677091
Address:Room 302, Building 7, No.1000, Jinhai Road
Tianjin Realet Chemical Technology Co.,Ltd.
website:http://www.realetchem.com
Contact:+86-022-58788819
Address:shuanggang industrial park
Shijiazhuang Sdyano Fine Chemical Co., Ltd
Contact:+86-311-89830448
Address:NO.48 Ta Nan Road,Yuhua District,Shijiazhuang,Hebei,China
Doi:10.1016/j.mencom.2021.01.039
(2021)Doi:10.1021/jo00292a045
(1990)Doi:10.1016/j.bmcl.2015.01.055
(2015)Doi:10.1002/cbic.200900572
(2010)Doi:10.1002/pola.24700
(2011)Doi:10.1007/s11172-010-0075-6
(2010)