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of a diode laser as the excitation wavelength. Typical laser
power was a few mW on the sample.
OFET Fabrication: The devices were fabricated using a
top-contact bottom gate structure with gold source and
drain electrodes. A heavily p-doped silicon (1 0 0) wafer
was used as the gate electrode with 200 nm bare SiO2 layer
as the gate dielectric insulator. Thin films (100 nm) of com-
pound (a) were deposited on SiO2 by vacuum sublimation
at a rate of 0.2 Å/s under a pressure of 10ꢀ6 mbar. The sub-
strate was kept at room temperature. Patterned Au layers
of thickness 60 nm were deposited for the source (S)–drain
(D) contacts. Typical S–D channel length (L) and width (W)
for OFETs were 500 lm and 5 mm, respectively. The device
characteristics were measured at room temperature with
two source meters, Keithley 2400 and Keithley 236, config-
ured together using a program written in LabView. The
source–drain current and the source-gate leakage currents
were measured with Keithley 236, which has a resolution
of 10 fA.
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Acknowledgement
We thank department of science and technology (DST)
for financial support and G.K. Dutta thanks UGC for Junior
Research Fellowship. SG acknowledges the IREE award
from the National Science Foundation (NSF) ECCS-
0523656 and NSF ECCS-0823563 for partial support of this
work.
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