Chemistry of Materials
Article
attack (by H atom abstraction) the alkyl groups of the protecting
groups.
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ACKNOWLEDGMENTS
■
This work was supported in part by the Agence Nationale de la
Recherche. Contract ANR10-BLAN-714, Cavity-zyme(Cu)
project). Prof A.J. Downard (University of Canterbury,
Christchurch, NZ) is warmly thanked for providing us the
sample of PPF substrates. Dr. Fei Hui is thanked for his help in
the AFM scratching measurements.
(22) Chen, P.; McCreery, R. L. Anal. Chem. 1996, 68, 3958.
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(19) For TMS-Eth-Ar and TIPS-Eth-Ar layers, AFM scratching
measurements are consistent with monolayer formation. For the TES-
Eth-Ar layer, the measured thickness is larger than that expected for a
monolayer. This is more likely ascribed to the difficulty of removing all
adsorbed and loosely attached species during the rinsing process.
Another possible explanation could be that the aryl radicals slowly
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dx.doi.org/10.1021/cm303844v | Chem. Mater. 2013, 25, 489−495