Notes
Organometallics, Vol. 23, No. 5, 2004 1155
Figu r e 5. Interaction of the Cp(PMe3)2Ru fragment HOMO
and HOMO-1 with linear combinations of Si-X σ* orbitals.
Changing the phosphine from PMe3 to PMe2Ph had
structurally very little effect. The bond distances and
angles around ruthenium and silicon in 1 and 2 were
essentially the same; the only exception was a slight
lengthening of the Ru-Si distance from 2.27 Å in 1 to
2.28 Å in 2. This similarity in structural parameters
for 1 and 2 was consistent with the little to no phosphine
dependence observed in the spectroscopic properties of
these complexes (Figure 1).
F igu r e 4. Perspective view of the molecular structure of
Cp(PMe3)2RuSiPhCl2 (4) with atom labels provided for all
unique non-hydrogen atoms.
On the other hand, changes in the substituents on
silicon had more of an effect on the bond distances and
angles around ruthenium and silicon. A lengthening of
the Ru-Si distance was observed when an electrone-
gative Cl (Ru-Si 2.265 Å in 1) was replaced with less
electronegative Me (Ru-Si 2.294 Å in 3) and Ph
(Ru-Si 2.310 Å in 4) groups. This lengthening of the
free polychlorosilanes (2.02 Å)17 and other group 8
trichlorosilyl complexes (2.03-2.09 Å).18-25
Complexes 1-4 adopted a staggered conformation
about the Ru-Si bond with the cyclopentadienyl and a
chloride in an anti relationship (average cyclopentadi-
enyl centroid-Ru-Si-Cl dihedral angle ) 166.1 ( 9.1°).
The silyl groups had a distorted tetrahedral geometry
with an average Cl-Si-Z (Z ) Cl, C) angle of 98.6 (
0.6° and an average Ru-Si-Z angle of 118.9 ( 2.4°. The
Ru-Si-Cl angles (123.7 ( 1.4° average) anti to the Cp
group were significantly larger than the non-anti
Ru-Si-Z angles (116.5 ( 1.7° average). In related
three-legged piano-stool ruthenium silyl complexes, the
Ru-Si-Z angle for substituents anti to a Cp or benzene
group have also been observed to be larger (generally
g 10°) than the Ru-Si-Z angles of the other substit-
uents on silicon: Cp(PMe3)2RuSiCl2Cp* [Ru-Si-Cl-
(anti) 119.9° vs Ru-Si-Cl 109.2°],14 Cp*(PMe3)2-
RuSiPh2H [Ru-Si-H(anti) 112.9° vs Ru-Si-Ph 98.8°
(av)],26 Cp*(PMe3)2RuSiPh2OTf [Ru-Si-OTf(anti) 118.2°
vs Ru-Si-Ph 96.9° (av)],16 (C6H6)(PPh3)Ru(SiX3)2 (SiX3
) SiCl3, SiMeCl2, SiMe3) [Ru-Si-X(anti, X ) Cl, C)
125.2° (av) vs Ru-Si-X 113.4° (av)].27
2
Ru-Si distances correlated with a decrease in J SiP for
1, 3, and 4 (Figure 1, top). The Ru-Si distance in 4 was
longer than expected probably due to the larger steric
demand of SiPhCl2 compared to SiMeCl2.
The long Si-Cl distances in 1-4 (range 2.11-2.15 Å)
were attributable to d(Ru)-σ*(Si-X) π-back-bonding
between the Cp(PMe3)2Ru and SiX3 groups. Linear
combinations of the Si-X (X ) Cl, Ph, Me) σ* orbitals
of the silyl group gave rise to an a1 and e set, assuming
localized C3v symmetry at silicon. The HOMO and
HOMO-1 of the Cp(PMe3)2Ru moiety28-30 had the cor-
rect symmetry to interact with the doubly degenerate e
set of Si-X σ* orbitals,31,32 as shown in Figure 5. The
magnitude of the d(Ru)-σ*(Si-X) π-back-bonding in-
teraction depended on the silicon substituents and
followed the order Cl . Ph ≈ Me.25 A ramification of
this d(Ru)-σ*(Si-Cl) π-back-bonding interaction was
a substantial lengthening of the Si-Cl distances com-
pared to other group 8 trichlorosilyl complexes (range
2.04-2.09 Å).18-25
The Si-Cl distances also exhibited a significant
dependence with respect to the other substituents on
silicon. The average Si-Cl distance in 1 and 2 (2.119 (
0.004 Å) was shorter than the average Si-Cl distance
in 3 and 4 (2.147 ( 0.009 Å). This difference in Si-Cl
distances can be attributed to more electron density in
the σ*(Si-Cl) orbitals of 3 and 4 compared to the
amount of electron density in the σ*(Si-Cl) orbitals of
1 and 2. If the amount of electron density transferred
from ruthenium to silicon by the d(Ru)-σ*(Si-X) π-back-
bonding interaction was constant in 1-4, then the
(14) Lemke, F. R.; Simons, R. S.; Youngs, W. J . Organometallics
1996, 15, 216-221.
(15) Straus, D. A.; Tilley, T. D.; Rheingold, A. J .; Geib, S. J . J . Am.
Chem. Soc. 1987, 109, 5872-5873.
(16) Grumbine, S. K.; Straus, D. A.; Tilley, T. D. Polyhedron 1995,
14, 127-148.
(17) Kaftory, M.; Kapon, M.; Botoshansky, M. In The Chemistry of
Organic Silicon Compounds; Rappoport, Z., Apeloig, Y., Eds.; J ohn
Wiley & Sons: New York, 1998; Vol. 2, pp 181-265.
(18) Einstein, F. W. B.; J ones, T. Inorg. Chem. 1982, 21, 987-990.
(19) Schubert, U.; Kraft, G.; Walther, E. Z. Anorg. Allg. Chem. 1984,
519, 96-106.
(20) Asirvatham, V. S.; Yao, Z.; Klabunde, K. J . J . Am. Chem. Soc.
1994, 116, 5493-5494.
(21) Yao, Z.; Klabunde, K. J .; Asirvatham, A. S. Inorg. Chem. 1995,
34, 5289-5294.
(22) Connolly, J . W.; Cowley, A. H.; Nunn, C. M. Polyhedron 1990,
9, 1337-1340.
(23) Manojlovic-Muir, L.; Muir, K. W.; Ibers, J . A. Inorg. Chem. 1970,
9, 447-452.
(27) Burgio, J .; Yardy, N. M.; Petersen, J . L.; Lemke, F. R. Orga-
nometallics 2003, 22, 4928-4932.
(24) Vancea, L.; Benneett, M. J .; J ones, C. E.; Smith, R. A.; Graham,
W. A. G. Inorg. Chem. 1977, 16, 897-902.
(28) Kost´ıc, N. M.; Fenske, R. F. Organometallics 1982, 1, 974-982.
(29) Grumbine, S. K.; Tilley, T. D.; Arnold, F. P.; Rheingold, A. L.
J . Am. Chem. Soc. 1994, 116, 5495-5496.
(25) Hu¨bler, K.; Hunt, P. A.; Maddock, S. M.; Rickard, C. E. F.;
Roper, W. R.; Salter, D. M.; Schwerdtfeger, P.; Wright, L. J . Organo-
metallics 1997, 16, 5076-5083.
(30) Arnold, F. P., J r. Organometallics 1999, 18, 4800-4809.
(31) Orpen, A. G.; Connelly, N. G. J . Chem. Soc., Chem. Commun.
1985, 1310-1311.
(26) Straus, D. A.; Zhang, C.; Quimbita, G. E.; Grumbine, S. D.;
Heyn, R. H.; Tilley, T. D.; Rheingold, A. L.; Geib, S. J . J . Am. Chem.
Soc. 1990, 112, 2673-2681.
(32) Orpen, A. G.; Connelly, N. G. Organometallics 1990, 9, 1206-
1210.