Model Compounds for Diphenylsiloxane Polymer
Organometallics, Vol. 18, No. 12, 1999 2329
Ta ble 2. Selected Bon d Len gth s [Å], An gles [d eg],
a n d Tor sion An gles [d eg] for 1 a n d 2
trometer. Ions showed the expected isotopic pattern. The
elemental analyses were performed on an instrument from
Carlo Erba Strumentazione (model 1106). The densities of
single crystals were determined using a Micromeritics Accu
Pyc 1330. The molecular weight measurements were per-
formed on a Knaur osmometer.
1 (X ) H)a
2 (X ) Sn)b
Si(1)-O(3)
Si(1)-O(2)
Si(1)-C(1)
Si(1)-C(11)
Si(2)-O(2)
Si(2)-O(1)
Si(2)-C(21)
Si(2)-C(31)
O(1)-X(1)
1.6064(6)
1.609(2)
1.853(2)
1.853(2)
1.609(2)
1.627(2)
1.854(2)
1.856(2)
0.70(4)
1.602(1)
1.598(3)
1.845(4)
1.835(4)
1.603(3)
1.591(3)
1.851(5)
1.861(5)
1.970(3)
2.129(6)
2.116(6)
2.130(7)
1,1,3,3,5,5,7,7-Oct a p h en yl-1,3,5,7-t et r a siloxa n e-1,7-d i-
ol (1). spiro-Ti[(OSiPh2)4O]2 (10.0 g, 6.0 mmol) was dissolved
in 250 mL of THF, and H2O (1.10 g, 60 mmol) was added. After
stirring for 6 h the layers were separated and the organic layer
was removed in vacuo. The solid residue was recrystallized
from toluene, resulting in 4.2 g (86%) of 1 as colorless
crystalline solid, mp 132 °C. 1H NMR δ: 7.38 (complex pattern,
Ph), 7,26 (complex pattern, Ph), 7.10 (complex pattern, Ph).
13C{1H} NMR δ: 134.5 (Ci), 134.4 (Co), 134.3 (Ci, Co super-
imposed), 130.1 (Cp), 130.08 (Cp), 127.7 (Cm). 29Si{1H} NMR δ:
-36.9 (OSi(OH)Ph2), -45.3 (OSiPh2O). 29Si{1H} MAS NMR
δ: -39.7 (OSi(OH)Ph2), -47.8 (OSiPh2O). MS m/z (%): 791
(25) [M+], 714 (27) [M+ - Ph], 636 (65) [M+ - 2 Ph], 593 (38)
[M+ - OSiPh2], 558 (94) [M+ - 3 Ph]. Anal. Calcd for C48H42O4-
Si4 (795.21): C, 72.50; H, 5.32. Found: C, 70.97; H, 5.34. IR
(KBr): 3591 (m, νOH), 3070 (m), 3020 (m), 1958 (m), 1899 (m),
1827 (m), 1590 (s), 1486 (s), 1428 (s), 1309 (w), 1264 (w).
Sn(1)-C(41)
Sn(1)-C(51)
Sn(1)-C(61)
O(3)-Si(1)-O(2)
O(3)-Si(1)-C(1)
O(2)-Si(1)-C(1)
O(3)-Si(1)-C(11)
O(2)-Si(1)-C(11)
C(1)-Si(1)-C(11)
O(2)-Si(2)-O(1)
O(2)-Si(2)-C(21)
O(1)-Si(2)-C(21)
O(2)-Si(2)-C(31)
O(1)-Si(2)-C(31)
C(21)-Si(2)-C(31)
Si(1)-O(2)-Si(2)
Si(1a)-O(3)-Si(1)
Si(2)-O(1)-X(1)
O(1)-Sn(1)-C(51)
O(1)-Sn(1)-C(41)
C(51)-Sn(1)-C(41)
O(1)-Sn(1)-C(61)
C(51)-Sn(1)-C(61)
C(41)-Sn(1)-C(61)
109.07(7)
108.80(7)
109.96(9)
108.41(7)
109.37(9)
111.18(9)
111.0(1)
108.34(9)
110.5(1)
108.71(9)
106.0(1)
112.35(9)
167.6(1)
180.00(3)
117(3)
108.8(1)
109.9(2)
107.7(2)
109.0(2)
111.3(2)
110.9(2)
112.0(2)
108.7(2)
108.1(2)
105.1(2)
111.7(2)
111.3(2)
166.1(2)
180.00(7)
145.6(2)
103.4(2)
101.6(2)
117.0(4)
106.2(2)
113.9(3)
112.8(4)
1,1,3,3,5,5,7,7-Oct a p h en yl-1,7-t r icycloh exylst a n n yl-
1,3,5,7-tetr a siloxa n e (2). H(OSiPh2)4OH (1) (0.5 g, 0.62
mmol) was dissolved in 60 mL of toluene, and cyclo-Hex3SnOH
(0.47 g, 1.23 mmol) was added. After heating at a Dean and
Stark condenser for 8 h, the solvent was evaporated. Recrys-
tallization of the residue from CH2Cl2/hexane provided 0.62 g
(87%) of 2 as a colorless crystalline solid, mp 156 °C. 1H NMR
δ: 7.33 (complex pattern, Ph), 7.15 (complex pattern, Ph), 6.98
(complex pattern, Ph), 1.30 (complex pattern, cyclo-Hex). 13C-
{1H} NMR δ: 138.5 (Ci), 135.7 (Ci), 134.7 (Co), 134.6 (Co), 129.2
(Cp), 128.7 (Cp), 127.1 (Cm), 127.08 (Cm), 33.0 (1J (13C-119Sn)
342 Hz, Sn-CH), 30.9 (2J (13C-117/119Sn) 14 Hz, CHCH2), 28.8
(3J (13C-117/119Sn) 64 Hz CHCH2CH2), 26.8. 29Si{1H} NMR δ:
-45.8 (2J (29Si-O-119Sn 70 Hz, Si-O-Sn), -47.7 (OSiPh2O).
119Sn{1H} NMR δ: -7.9. 29Si{1H} MAS NMR δ: -46.2
(Si-O-Sn), -46.8 (OSiPh2O).
O(1)-Si(2)-O(2)-Si(1)
O(3)-Si(1)-O(2)-Si(2)
O(2)-Si(1)-O(3)-Si(1a)
O(2)-Si(2)-O(1)-Sn(1)
-7.9(5)
-174.9(5)
63(13)
69.7(10)
107.6(10)
-86(17)
74.5(4)
a
b
a ) -x+1, -y+1, -z (1). a ) -x,-y, -z (2).
715 (s), 698 (s), 523 (s), 508 (s), 384 (m) cm-1. MW (10 mg/mL
in CHCl3): 940 g/mol.
MS m/z (%): 867 (23) [M+ - 4 Ph, -Sn-cyclo-Hex3], 714
(16) [M+ - 6 Ph, -Sn-cyclo-Hex3], 653 (30) [M+ - 4 Ph, -Sn-
cyclo-Hex3, -OSiPh2], 637 (36) [M+ - 4 Ph, -Sn-cyclo-Hex3,
-O2SiPh2], 594 (40) [M+ - 2 Ph, -Sn-cyclo-Hex3, -O2SiPh2,
-OSiPh2]. Anal. Calcd for C84H106O5Si4Sn2 (1545.58): C, 65.28;
H, 6.91. Found: C, 64.98; H, 7.11. IR (KBr): 3067 (m), 3049
(m), 3021 (m), 2916 (s), 2845 (s), 1591 (m), 1487 (w), 1445 (s),
1428 (s), 1262(m), 1127 (s), 1073 (s), 984 (s), 877 (m), 840 (m),
Cr ysta llogr a p h y. Crystals of H(OSiPh2)4OH (1) and (cyclo-
Hex3SnOSiPh2OSiPh2)2O (2) were grown from
a CH2Cl2/
hexane solution. Intensity data for the colorless crystals were
collected on a Nonius Kappa CCD diffractometer with graphite-
monochromated Mo KR radiation at 291 K. The data collec-
tions covered almost the whole sphere of reciprocal space with
360 frames via ω-rotation (∆/ω ) 1°) at two times 20 s (1, 2)
per frame. The crystal-to-detector distance was 2.7 cm (1) and
2.9 cm (2). Crystal decay was monitored by repeating the
initial frames at the end of data collection. Analyzing the
duplicate reflections, there was no indication for any decay
(1, 2). The data were not corrected for absorption effects. The
structures were solved by direct methods SHELXS9716a and
successive difference Fourier syntheses. Refinement applied
full-matrix least-squares methods with SHELXL97.16b
H atoms for 1 were located in the difference Fourier map
and refined isotropically. The H atoms for 2 were placed in
geometrically calculated positions using a riding model. For
the phenyl groups they were refined with a common isotropic
temperature factor (Haryl C-H 0.93 Å, Uiso 0.110(4) Å2), and
for the cyclohexyl groups the atomic displacement parameters
were fixed to 1.5 times those of the C atoms (C-Hsec 0.97 Å).
Disordered cyclohexyl groups were found for 2 (C(42), C(43),
C(44), C(45), C(66), C(42′), C(43′), C(44′), C(45′), C(66′) (sof
0,5)).
803 (m), 740 (s), 716 (s), 698 (s), 519 (s), 485 (s), 418 (m) cm-1
.
1,1-Di-ter t-bu tyl-3,5,7,9-octaph en yl-2,4,6,8,10-pen taoxa-
3,5,7,9-t et r a sila -1-st a n n a cyclod od eca n e, cyclo-t-Bu 2Sn -
(OSiP h 2OSiP h 2)2O (3). H(OSiPh2)4OH (1) (1.25 g, 1.50 mmol)
and (t-Bu2SnO)3 (0.38 g, 1.50 mmol) were dissolved in 100 mL
of CHCl3. The reaction mixture was heated at reflux for 4 h.
Evaporation of the solvent provided 1.19 g (74%) of 3 as a
colorless amorphous solid, mp >250 °C. 1H NMR δ: 0.96
(3J (1H-119Sn) 104 Hz, CCH3), 7.05 (complex pattern, Ph), 7.21
(complex pattern, Ph), 7.34 (complex pattern, Ph), 7.44 (com-
plex pattern, Ph). 13C{1H} NMR δ: -29.2 (CCH3), -39.9
(1J (13C-119Sn) 499 Hz, CCH3), 137.8 (Ci), 135.4 (Ci) 134.6 (Co),
129.5 (Cp), 129.2 (Cp), 127.4 (Cm). 29Si{1H} NMR δ: -44.9 (2J -
(29Si-117/119Sn) 69 Hz, OPh2Si-O-Sn), -47.4 (OPh2Si-O-Si).
119Sn{1H} NMR δ: -158.0 (2J (119Sn-O-29Si) 69 Hz. 29Si{1H}
MAS NMR δ: -44.7, -47.4, -49.1-50.2. 119Sn{1H} MAS NMR
δ: -141.2. MS m/z (%): 850 (55) [M+ - 2 t-Bu, -Ph], 653 (56)
(M+ - 2 t-Bu, -Ph, -OSiPh2], 637 (10) [M+ - 2 t-Bu, -Ph,
-O2SiPh2], 533 (32) [M+ - Snt-Bu2, -OSiPh2, -2 Ph], 455 (72)
[ M+ - 2 t-Bu, -Ph, -2 OSiPh2]. Anal. Calcd for C56H58O5Si4-
Sn (1042.16): C, 64.54; H, 5.61. Found: C,64.08; H, 5.71. IR
(KBr): 3068 (m), 3047 (m), 2921 (w), 2850 (m), 2361 (w), 2338
(w), 1591 (w), 1466 (w), 1429 (s), 1124 (s), 966 (s), 741 (m),
(16) (a) Sheldrick, G. M. Acta Crystallogr. 1990 A46, 467-473. (b)
Sheldrick, G. M. University of Go¨ttingen, 1997. (c) International Tables
for Crystallography, Kluwer Academic Publishers: Dordrecht, 1992;
Vol. C. (d) Sheldrick, G. M. SHELXTL-Plus, Release 4.1; Siemens
Analytical X-ray Instruments Inc.: Madison, WI, 1991.