X. Cai et al. / Chemical Physics Letters 407 (2005) 402–406
405
the Tn state are effected by the phenyl and methyl
substituents.
Tn
kdis
4. Conclusions
hν2
S1
T1
The C–Si bond cleavage from 1(Tn) with
U = 0.046 0.008 has been observed by using the two-
color two-laser flash photolysis techniques for the first
time. The disappeared 1(T1) changes mainly to p-ace-
tylbenzyl and trimethylsilyl radicals through the C–Si
bond cleavage. The occurrence of the C–Si bond cleav-
age depends on both excitation energy and crossing be-
tween potential surfaces of the Tn and the C–Si bond
dissociation of 1. On the other hand, C–Si bond cleav-
age does not occur from 2(Tn). These results indicate
that the photochemical properties of the Tn state are
quite different from those of the T1 state, and strongly
depend on the molecules. The present study shows pos-
sibilities that new reactions may be found in the Sn and
Tn states of various molecules by using the two-color
two-laser flash photolysis technique.
∆E
C • + • SiMe3
hν1
S0
ISC
D(C-Si) = 262 kJ mol-1
0
Reaction coordinate
Scheme 2. An energy diagram of photoexcited 1 by two-color two-
laser photolysis techniques. hm1: the first 266-nm laser excitation; hm2:
the second 355-nm laser excitation; ISC: intersystem crossing; kdis: rate
constant of the C–Si bond dissociation; DE: energy barrier between the
potential surfaces; CÅ: p-acetylbenzyl radical; ÅSiMe3: trimethylsilyl
radical.
When the S1 state of 1 is produced upon the first 266-
s
À1) intersystem
nm laser irradiation, a very fast (ꢀ1011
crossing (ISC) from the S1 to the T1 state proceeds [1].
No C–Si bond cleavage occurred from the S1 and T1
states although E1(S1) and E1(T1) are higher than
D(C–Si), suggesting that DE is too large for a bond cleav-
age crossing to proceed from the potential surfaces of
the S1 or T1 states to that of the C–Si bond dissociation.
On the other hand, the C–Si bond dissociated from
1(Tn) generated upon excitation of 1(T1) by the second
355-nm laser photolysis. It seems that E1(Tn) is much
higher than D(C–Si), and that DE is small for the crossing
between potential surfaces of the Tn state and the C–Si
bond dissociation of 1. Although U of the C–Si bond
cleavage from 1(Tn) was 0.046 0.008 and the non-reac-
tive process is the major route for relaxation of 1(Tn),
the disappeared 1(T1) changes mainly to p-acetylbenzyl
and trimethylsilyl radicals through the C–Si bond cleav-
age. Because 1(T1) can be selectively excited to give
1(Tn), one can control the occurrence of the C–Si bond
cleavage from 1(Tn) to give p-acetylbenzyl and trimeth-
ylsilyl radicals using the two-color two-laser flash pho-
tolysis technique. The occurrence of the chemical
reactions can be initiated from the Tn state, even when
such chemical reactions can not proceed in the T1 state.
The similar mechanism can be considered for 2(T1) and
2(Tn) where the C–Si bond cleavage is absent. DE is still
high for the crossing between potential surfaces of the
Tn state and the C–Si bond dissociation of 2. It is sug-
gested that the Tn state energy is still localized on the
benzophenone moiety in 2(Tn). In other words, the exci-
tation energy is not sufficiently dispersed from the ben-
zophenone moiety to the C–Si bond even in 2(Tn). The
difference between 1 and 2 is only phenyl and methyl at-
tached to the carbonyl group. The different experimental
results for 1(Tn) and 2(Tn) indicate that the properties of
Acknowledgments
This work has been partly supported by a Grant-in-
Aid for Scientific Research on Priority Area (417), 21st
Century COE Research, and others from the Ministry
of Education, Culture, Sports, Science and Technology
(MEXT) of Japanese Government. The authors also
thank to JSPS fellowship for X.C.
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