Improvement of Liquid Crystal Alignment Using Novel Photo-Activators
Lee and Shin
Table I. Maximum anchoring energy of photo-activators using TN PI
with UV irradiation time.
meaningful and useful in terms of productivity and effi-
ciency. AAP and HAP respectively showed their maximum
anchoring forces at 3 min and 5 min of irradiation. The
shortest irradiation time was achieved due to the methyl
radicals of AAP that can react faster than the other acti-
vators. Allyl radicals are more stable than methyl radicals
are; this indicates that prolonged irradiation makes the sur-
face of the films more random.
Maximum anchoring
Irradiation
time (min)
Activator
energy (×10−5 J/m2)
AAP
HAP
CAP
3.46
3.68
6.92
3
8
10
Furthermore, all the cells had similar pretilt angles of
8∼9ꢀ, which did not exceed 10ꢀ. When the cells were
treated by the rubbing method before photo-alignment, the
pretilt angles slightly decreased to 7∼9ꢀ.
we measured the contact angle. The contact angles for
each photo-activator and TN PI on silicon wafer were mea-
sured to observe the changes on the surface of the PI film.
The contact angle of DI water droplet on silicon wafer was
6.3104ꢀ and was used as a reference. The HAP demon-
strated the largest angle, of 21.459ꢀ, while AAP had the
smallest, contact angle of 8.765ꢀ. The large contact angle
of HAP resulted from its characteristic hydrophobic hexyl
groups.
When TN-PI-coated silicon wafers were used, after irra-
diation, all the contact angles remarkably increased due
to hydro-phobization of the surface. Carbon dioxide gas,
which generated from the irradiated photo-activators, evap-
orated from the surface of the PI films during photo-
irradiation. As a result, unsaturated C C bonds were
formed on the surface, which rendered the surface more
hydrophobic and rough. We found the possibility that frag-
mented parts were located on the surface of the PI films
and could affect the surface interactions with LC.
4. CONCLUSION
Three novel photo-activators were synthesized to improve
the LC properties and were characterized by FT-IR,
1H-NMR and UV-Vis. All the photo-activators demon-
strated fast degradation and high reactivity. Moreover, the
photo-activators exhibited similar pretilt angles of about
8∼9ꢀ when mixed with TN PI. Further, the contact angle
increased due to surface hydro-phobization through evap-
oration of carbon dioxide by UV irradiation. All the three
activators achieved maximum anchoring energy within
10 min. The CAP-containing PI films showed the high-
est surface anchoring force, of 6ꢅ92 × 10−5 J/m2, which
is around twice of that of the others. Considering the
UV irradiation time, and the average figures of the usual
photo-alignment process and rubbing process, the novel
photo-activators can be efficient photo-alignment additives,
sufficiently applicable to the LCD process.
As shown in Table I and Figure 5, CAP showed the
highest anchoring energy, of 6ꢅ92 × 10−5 J/m2, at 10 min
of irradiation. This is outstanding result as compared to
that obtained in the rubbing method, (1ꢅ11 × 10−5 J/m2ꢆ.
Moreover, shortening the irradiation time to 10 min is very
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Figure 5. Anchoring energy of photo-activators (AAP, HAP, and CAP).
Received: 9 June 2017. Accepted: 1 September 2017.
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J. Nanosci. Nanotechnol. 18, 7207–7210, 2018