Oshida et al.
P r ep a r a tion of 1,2,4-Tr ith iola n e tr a n s-4. A mixture of
5 (1.99 g, 11.2 mmol) and elemental sulfur (358 mg, 11.2 mmol)
in toluene (15 mL) under argon was heated at reflux for 4 d.
The solvent was removed under reduced pressure, and the
residue was subjected to column chromatography (hexane) and
then HPLC (SiO2, hexane/CH2Cl2 97/3) to give tr a n s-4 (985
mg, 43%) and cis-4 (409 mg, 19%).
Oxid a tion of cis-4 w ith DMD (1.2 m ol equ iv). To a
solution of cis-4 (52.4 mg, 0.135 mmol) in CH2Cl2 (7 mL) was
added DMD14 (0.10 M, 1.6 mL, 0.16 mmol) at -20 °C under
argon, and the mixture was stirred for 1 h. The resulting
mixture was evaporated to dryness, and the residue was
subjected to HPLC (hexane/Et2O 95/5) to give 611 (29.4 mg,
54%) and 711 (21.3 mg, 39%).
subjected to HPLC (hexane/Et2O 96/4) to give 16 (19.1 mg,
33%) and 17 (31.2 mg, 54%).
Oxid a tion of tr a n s-4 w ith DMD. To a solution of tr a n s-4
(103 mg, 0.265 mmol) in CH2Cl2 (15 mL) was added DMD (0.10
M, 3.2 mL, 0.32 mmol) at -20 °C under argon, and the mixture
was stirred for 1 h. The mixture was evaporated to dryness,
and the residue was subjected to HPLC (hexane/Et2O 96/4) to
give 16 (4.3 mg, 4%) and 17 (94.3 mg, 88%).
Oxid a tion of 16 w ith DMD. To a solution of 16 (61.7 mg,
0.152 mmol) in CH2Cl2 (10 mL) was added DMD (0.096 M,
6.3 mL, 0.61 mmol) at -20 °C under argon, and the mixture
was stirred for 7 h. The solvent was removed in vacuo below
-20 °C, and the residue was subjected to HPLC (hexane/Et2O
90/10, 10-12 °C) to give 18 (12.8 mg, 20%) and 19 (45.1 mg,
71%). The fraction containing 18 was evaporated below -20
°C to prevent 18 from isomerization.
Oxid a tion of 16 w ith CF 3CO3H. To a mixture of 16 (51.1
mg, 0.126 mmol) and H2O2 (30%, 57.7 mg, 0.509 mmol) in
CH2Cl2 (10 mL) under argon was added (CF3CO)2O (0.21 mL,
1.5 mmol) at -20 °C, and the mixture was stirred for 7 h at
this temperature. The solvent was removed in vacuo below -20
°C, and the residue was subjected to HPLC (hexane/Et2O 90/
10, 10-12 °C) to give 18 (31.6 mg, 60%) and 19 (2.7 mg, 5%).
Oxid a tion of 17 w ith DMD. To a solution of 17 (50.5 mg,
0.125 mmol) in CH2Cl2 (10 mL) under argon was added DMD
(0.11 M, 2.3 mL, 0.25 mmol) at -20 °C, and the mixture was
stirred for 2 h. The solvent was removed in vacuo below -20
°C, and the residue was subjected to HPLC (hexane/Et2O 90/
10, 10-12 °C) to give 20 (36.8 mg, 70%), 19 (11.0 mg, 21%),
and 18 (2.1 mg, 4%).
Th er m a l Decom p osition of 16. A solution of 16 (10.7 mg,
0.0264 mmol) in xylene (6 mL) was heated at reflux for 16 h.
Yields of the products were calculated to be 8% cis-episulfide
21, 2% trans-episulfide 13, 3% (Z)-sulfine 22,32 1% (E)-sulfine
23,32 1% thioketone 5, and 85% 16, on the basis of the integral
ratio of the 1H NMR spectrum of the mixture.
Oxid a tion of 6 w ith DMD. To a solution of 6 (51.8 mg,
0.128 mmol) in CH2Cl2 (8 mL) was added DMD (0.058 M, 4.4
mL, 0.26 mmol) at -20 °C under argon, and the mixture was
stirred for 1.5 h. The solvent was removed in vacuo below -20
1
°C. The H NMR spectrum of the residue showed the quantita-
tive formation of 1,2-dioxide 8.11
Oxid a tion of 7 w ith DMD. To a solution of 7 (25.2 mg,
0.0623 mmol) in CH2Cl2 (7 mL) was added DMD (0.080 M,
3.1 mL, 0.25 mmol) at -20 °C under argon, and the mixture
was stirred for 2.5 h. The solvent was removed in vacuo below
-20 °C. The 1H NMR spectrum of the residue measured at
-20 °C showed the exclusive formation of 1,1-dioxide 9.11
The crude 9, thus obtained, rearranged to give 5 (20.9 mg,
94%), when it was dissolved in CHCl3 (5 mL) and the solution
was stirred for 0.5 h at room temperature. After removal of
the solvent, the residue was purified by HPLC (hexane) to give
5.
Oxid a tion of cis-4 w ith DMD (4 m ol equ iv). To a
solution of cis-4 (32.9 mg, 0.0846 mmol) in CH2Cl2 (7 mL) was
added DMD (0.10 M, 3.2 mL, 0.32 mmol) at -20 °C under
argon. The mixture was stirred for 1.5 h, and then the solvent
was removed under reduced pressure. The residue was sub-
jected to column chromatography (CH2Cl2) to give crude 1,2-
dioxide 8, which was recrystallized from CHCl3 to give pure 8
(14.8 mg, 42%).
Oxid a tion of 10 w ith DMD (4 m ol equ iv). In a manner
similar to the one above, 1012 (29.9 mg, 0.0549 mmol) was
oxidized with DMD (0.058 M, 3.8 mL, 0.22 mmol) at -20 °C
for 1.5 h. The mixture obtained after removal of the solvent
under reduced pressure was subjected to HPLC (hexane/Et2O
90/10) to give 1,2-dioxide 1111 (18.9 mg, 60%).
Th er m a l Decom p osition of 8. A solution of 8 (5.1 mg,
0.012 mmol) in CDCl3 (5 mL) was heated at reflux for 7 h.
The mixture obtained after removal of the solvent under
reduced pressure was subjected to HPLC (hexane) to give 5
(4.0 mg, 93%).
Th er m a l Decom p osition of 17. A solution of 17 (17.7 mg,
0.0437 mmol) in xylene (6 mL) was heated at reflux for 12 h.
Yields of products were calculated to be 42% thioketone 5, 16%
(Z)-sulfine 22, 17% (E)-sulfine 23, 11% ketone 24, 2% episulfide
13, and 2% unidentified compounds, on the basis of the integral
1
ratio of the tert-butyl groups in the H NMR spectrum of the
mixture.
Th er m a l Decom p osition of 19. A solution of 19 (16.0 mg,
0.0380 mmol) in CDCl3 (3 mL) was heated at reflux for 2.5 h.
The 1H NMR spectrum of the reaction mixture showed the
quantitative formation of thioketone 5.
Th er m a l Decom p osition of 20. A solution of 20 (6.2 mg,
0.015 mmol) in CDCl3 (1.5 mL) was heated at reflux for 30 h.
Yields of products were calculated to be 43% thioketone 5, 20%
(Z)-sulfine 22, 7% (E)-sulfine 23, 14% dithiirane 1-oxide 25,33
5% 1,2,4-trithiolane cis-4, 3% ketone 24, and 8% unidentified
compounds, on the basis of the integral ratio of the tert-butyl
groups in the 1H NMR spectrum of the mixture.
Th er m a l Decom p osition of 6. A solution of 6 (21.0 mg,
0.0519 mmol) in xylene (7 mL) was heated at reflux for 1 d.
The residue obtained after removal of the solvent under
reduced pressure was subjected to HPLC (hexane) to give
episulfide 1311 (16.6 mg, 99%).
Th er m a l Decom p osition of 7. A solution of 7 (17.2 mg,
0.0425 mmol) in xylene (5 mL) was heated at reflux for 3 d.
The residue obtained after removal of the solvent under
reduced pressure was subjected to HPLC (hexane) to give 13
(11.7 mg, 85%).
Isom er iza tion of 18 a n d 20. The isomerizations were
carried out in a 14 mM solution of 18 under argon. Progress
1
of the reaction was monitored by H NMR spectroscopy. The
yields were estimated by integral ratios.
Rea ction of 1-Oxid e 6 w ith Me3O+BF 4-. 1-Oxide 6 (24.7
mg, 0.0610 mmol) and Me3O+BF4 (97%, 11.0 mg, 0.0721
-
mmol) were dissolved in CH2Cl2 (5 mL) under argon, and the
mixture was stirred for 1 d at room temperature. The solvent
was removed under reduced pressure, and the residue was
subjected to HPLC (hexane/Et2O 95/5) to give 6 (5.1 mg, 21%),
Oxid a tion of 13. To a solution of 13 (10.4 mg, 0.0320 mmol)
in CH2Cl2 (7 mL) was added DMD (0.080 M, 0.45 mL, 0.036
mmol) at 0 °C under argon. The mixture was stirred for 10
1
min and evaporated to dryness. The H NMR spectrum of the
1
7 (1.5 mg, 6%), and 16 (5.9 mg, 24%). The H NMR spectrum
residue showed the quantitative formation of 15.
of the reaction mixture indicated the formation of ketone 24
(33%), thioketone 5 (6%), and sulfine 22 (5%) along with 6, 7,
and 16.
Oxid a tion of tr a n s-4 w ith MCP BA. To a solution of
tr a n s-4 (55.6 mg, 0.143 mmol) in CH2Cl2 (7 mL) was added a
solution of MCPBA (purity of 91%, 32.6 mg, 0.172 mmol) in
CH2Cl2 (3 mL) at 0 °C under argon. The mixture was stirred
for 1 h, and then aq Na2SO3 was added. The mixture was
neutralized with aq NaHCO3. The organic layer was washed
with water, dried, and evaporated to dryness. The residue was
(32) Nakamura, K.; Shizume, Y.; Sugiyama, T.; Ohno, A.; Oka, S.
Phosphorus Sulfur Relat. Elem. 1983, 16, 153-155.
(33) Ishii, A.; Kawai, T.; Tekura, K.; Oshida, H.; Nakayama, J .
Angew. Chem., Int. Ed. 2001, 40, 1924-1926.
1702 J . Org. Chem., Vol. 69, No. 5, 2004