Full text of DOI:10.1063/1.106707

Lowtemperature chemical vapor deposition of boronnitride films using hydrogen azide
Ryoichi Ishihara, Osamu Sugiura, and Masakiyo Matsumura
Citation: Applied Physics Letters 60, 3244 (1992); doi: 10.1063/1.106707
View online: http://dx.doi.org/10.1063/1.106707
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/60/26?ver=pdfcov
Published by the AIP Publishing
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
128.193.164.203 On: Tue, 23 Dec 2014 09:42:08

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
128.193.164.203 On: Tue, 23 Dec 2014 09:42:08

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
128.193.164.203 On: Tue, 23 Dec 2014 09:42:08