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10043-11-5 Usage

Description

Boron nitride is a material in which the extra electron of nitrogen (with respect to carbon) enables it to form structures that are isoelectronic with carbon allotropes.Boron nitride is an inorganic compound with a flat, hexagonal crystal similar to graphite, but with the carbon atoms replaced by boron and nitrogen atoms. The alternate boron and nitrogen atoms are linked to form interlocking hexagonal rings with three boron atoms and three nitrogen atoms, and the layers are held together by van der Waals forces. There is no boron-nitrogen bonding between the layers.The bond length is 1.466? and the interlayer spacing is 3.331 ?. A spherical form (with a hexagonal crystal structure) is also available.Boron nitride can also be in cubic form in which alternately linked boron and nitrogen atoms form a tetrahedral bond network, similar to carbon atoms in diamond.

Chemical Properties

white powder(s), 1μm or less 99.5% pure; hexagonal, most common form: a=0.2504 nm, c=0.6661nm; fcc: a=0.3615nm; hardness: hexagonal like graphite,?cub approaches that of diamond; band gap ~7.5 eV at 300K; dielectric 7.1; used in furnace insulation and in crucibles for melting aluminum, boron, iron, and silicon, also as sputtering target for dielectrics, diffusion masks, passivation layers [KIR81] [HAW93] [MER06] [CER91]

Physical properties

White powder, hexagonal graphite-like form or cubic crystal; cubic form similar to diamond in its crystal structure, and reverts to graphite form when heated above 1,700°C; density 2.18 g/cm3; melts at 2,975°C (under nitrogen pressure); sublimes at 2,500°C at atmospheric pressure; insoluble in water and acid; attacked by hot alkalies and fused alkali carbonates; not wetted by most molten metals or glasses.Cubic boron nitride (c-BN) does not exist in nature but it is a novel substance created by human. It is synthesized under high pressure and high temperature just like diamond counterpart and has the wurzite crystal structure. The tables below compare reference hardness and heat conductivity for a couple of abrasive materials. Apparently c-BN is excellent in these properties, second only to diamond, the highest. Substance Hardness VHN (Vickers) Heat Conductivity (W/(m.K)) diamond 8600 1000 - 2000 c-BN 5000 590 alumina 2300 6 tungsten carbide 1800 42 silicon carbide 800 85 titanium nitride 2100 7.4 titanium carbide 3000 5.2 www.tomeidiamond.co.jp

Substance

Hardness VHN (Vickers)

diamond

8600

c-BN

5000

alumina

2300

tungsten carbide

1800

silicon carbide

800

titanium nitride

2100

titanium carbide

3000

Uses

Different sources of media describe the Uses of 10043-11-5 differently. You can refer to the following data:
1. Boron nitride is a material in which the extra electron of nitrogen (with respect to carbon) enables it to form structures that are isoelectronic with carbon allotropes. Also used in manufacture of alloys; in semiconductors, nuclear reactors, lubricants.Hexagonal boron nitride can be used as an electrical insulator; as thermocouple protection sheaths, crucibles and linings for reaction vessels; and as a coating for refractory molds used in glass forming and in superplastic forming of titanium. It can also be incorporated in ceramics, alloys, resins, plastics, and rubber to give them self-lubricating properties. Hexagonal boron nitride is used the formulation of coatings and paints for high temperature applications. It is also used as a substrate for semi-conductors, lens coatings, and transparent windows. https://www.cir-safety.org
2. boron nitride is a synthetically manufactured white, talc-like powder that can reflect light, giving a product a sparkle effect. It is primarily used in color cosmetics to provide subtle shimmer; however, it can also be found in skin care formulations for enhancing product smoothness and slip.
3. Boron nitride used in the manufacture of high-temperature equipment parts due to its excellent thermal and chemical stability. It is used as a lubricant and an additive to cosmetics, paints, dental cements and pencil leads. It is also used to provide self lubricating properties to ceramics, alloys, resins, plastics and rubbers. In addition to this, it has many industrial applications such as xerographic process, laser printers, oxygen sensors and proton conductors. Cubic boron nitride is used as an abrasive material.

Definition

boron nitride: A solid, BN, insolublein cold water and slowly decomposedby hot water; r.d. 2.25 (hexagonal);sublimes above 3000°C. Boronnitride is manufactured by heatingboron oxide to 800°C on an acid-solublecarrier, such as calcium phosphate,in the presence of nitrogen orammonia. It is isoelectronic with carbonand, like carbon, it has a veryhard cubic form (borazon) and asofter hexagonal form; unlikegraphite this is a nonconductor. It isused in the electrical industrieswhere its high thermal conductivityand high resistance are of especialvalue.

Preparation

Boron nitride is prepared by heating boric oxide with ammonia: B2O3 + 2NH3 → 2BN + 3H2O Alternatively, the compound can be prepared by heating boric oxide or boric acid with ammonium chloride or an alkali metal cyanide. Purified product can be obtained by high temperature reaction of boron halide with ammonia: BCl3 + NH3 → BN + 3HCl Boron nitride can also be made from the elements by heating boron and nitrogen at red heat.

Production Methods

In tonnage production, acetaldehyde may be manufactured by: 1. The direct oxidation of ethylene, requiring a catalytic solution of copper chloride plus small quantities of palladium chloride Cl2Pd. 2. The oxidation of ethyl alcohol C2H6O with sodium dichromate Cr2Na2O7, and 3. The dry distillation of calcium acetate C4H6CaO4 with calcium formate C2H2CaO4.

General Description

Hexagonal boron nitride (hBN) has a layered structure similar to graphite and can be exfoliated as singlelayered BN sheets. hBN has applications in catalysts, optoelectronics and semiconductor devices. Boron nitride posseses high thermal conductivity of approximately 400W/mK at 300K.

Industrial uses

Boron nitride (BN) has many potential commercial applications. It is a white, fluffy powder with a greasy feel. It is used for heat-resistant parts by molding and pressing the powder without a binder to a specific gravity of 2.1 to 2.25. BN may be prepared in a variety of ways, for example, by the reaction of boron oxide with ammonia, alkali cyanides, and ammonium chloride, or of boron halides and ammonia. The usually high chemical and thermal stability, combined with the high electrical resistance of BN, suggests numerous uses for this compound in the field of high-temperature technology. BN can be hot-pressed into molds and worked into desired shapes. BN powders can be used as mold-release agents, high-temperature lubricants, and additives in oils, rubbers, and epoxies to improve thermal conductance of dielectric compounds. Powders also are used in metal- and ceramicmatrix composites (MMC and CMC) to improve thermal shock and to modify wetting characteristics.The platy habit of the particles and the fact that boron nitride is not wet by glass favors use of the powder as a mold wash, e.g., in the fabrication of high-tension insulators. It is also useful as thermal insulation in induction heating. A cubic form of boron nitride (Borazon) similar to diamond in hardness and structure has been synthesized by the high-temperature, high-pressure process for making synthetic diamonds. Any uses it may find as a substitute for diamonds will depend on its greatly superior oxidation resistance.

Check Digit Verification of cas no

The CAS Registry Mumber 10043-11-5 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,0,0,4 and 3 respectively; the second part has 2 digits, 1 and 1 respectively.
Calculate Digit Verification of CAS Registry Number 10043-11:
(7*1)+(6*0)+(5*0)+(4*4)+(3*3)+(2*1)+(1*1)=35
35 % 10 = 5
So 10043-11-5 is a valid CAS Registry Number.
InChI:InChI=1/BN/c1-2

10043-11-5 Well-known Company Product Price

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  • Alfa Aesar

  • (45912)  Boron Nitride Rod;Diameter (mm), 12.7;Length (mm), 300   

  • 10043-11-5

  • 1each

  • 3084.0CNY

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  • (45912)  Boron Nitride Rod;Diameter (mm), 12.7;Length (mm), 300   

  • 10043-11-5

  • 1each

  • 3780.0CNY

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  • (45850)  Boron Nitride Rod;Diameter (mm), 6.4;Length (mm), 300   

  • 10043-11-5

  • 1each

  • 2503.0CNY

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  • (45850)  Boron Nitride Rod;Diameter (mm), 6.4;Length (mm), 300   

  • 10043-11-5

  • 1each

  • 2897.0CNY

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  • Alfa Aesar

  • (45721)  Boron Nitride Bar;Length (mm), 300;Width (mm), 12.7;Height (mm), 12.7   

  • 10043-11-5

  • 1pc

  • 3920.0CNY

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  • Alfa Aesar

  • (40608)  Boron nitride   

  • 10043-11-5

  • 2g

  • 1213.0CNY

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  • Alfa Aesar

  • (40608)  Boron nitride   

  • 10043-11-5

  • 10g

  • 3612.0CNY

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  • Alfa Aesar

  • (40607)  Boron nitride   

  • 10043-11-5

  • 2g

  • 1343.0CNY

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  • (40607)  Boron nitride   

  • 10043-11-5

  • 10g

  • 5925.0CNY

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  • Alfa Aesar

  • (11078)  Boron nitride, 99.5% (metals basis)   

  • 10043-11-5

  • 50g

  • 848.0CNY

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  • Alfa Aesar

  • (11078)  Boron nitride, 99.5% (metals basis)   

  • 10043-11-5

  • 250g

  • 1979.0CNY

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  • Alfa Aesar

  • (44839)  Boron nitride, 99.5% (metals basis)   

  • 10043-11-5

  • 1pc

  • 3258.0CNY

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10043-11-5SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 12, 2017

Revision Date: Aug 12, 2017

1.Identification

1.1 GHS Product identifier

Product name boron nitride

1.2 Other means of identification

Product number -
Other names wurzin

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only. Fillers,Processing aids, not otherwise listed
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:10043-11-5 SDS

10043-11-5Synthetic route

ammonia
7664-41-7

ammonia

boric acid
11113-50-1

boric acid

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
With multi-walled carbon nanotubes In solid byproducts: CO, H2, H2O; mixt. of multi-walled carbon nanotubes and H3BO3 taken in quartz tube, NH3 gas passed through with 10 sccm flow rate at 200 °C 2 h, temp.slowly raised to 1000 °C for 3 h;99%
With pyrographite; iron In neat (no solvent) byproducts: CO, H2, H2O; mixt. of activated carbon, H3BO3 and ferric nitrate (mole ratio of 3:1:0.1) taken in quartz tube, dried in oven at 60 °C 6 h, NH3 gas passed through with 10 sccm flow rate, heating at 1300 °C for 4 h;
byproducts: H2O; synthesis of BN coating on the surfaces of carbon nanotubes and nanofibers around 1150°C using infiltration of nanotubes with boric acid and nitridation in ammonia;
2,4,6-triamino-s-triazine
108-78-1

2,4,6-triamino-s-triazine

boric acid
11113-50-1

boric acid

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
over 600°C in N2 atmosphere;90%
Ca3N2, hexagonal High Pressure; over 100kg/cm2, in N2 stream, 1700-2000°C, 5-9 min; washing with water;80%
magnesium nitride High Pressure; over 100kg/cm2, in N2 stream, 1700-2000°C, 5-9 min; washing with water;80%
calcium hexaboride

calcium hexaboride

ammonia
7664-41-7

ammonia

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
With Fe2O3 In neat (no solvent, solid phase) mixt. CaB6 and Fe2O3 was heated to 750°C for 10 min under Ar atm., heated to 1150°C at 6°C/min keeping for 6 h in NH3 atm.; react. mixt. was cooled to room temp., product was washe with HCl, filtered, washed with water and dried in vacuo at 80°C for 12 h;81.4%
diborane
19287-45-7

diborane

A

boron nitride
10043-11-5

boron nitride

B

ammonia borane

ammonia borane

C

boron imide

boron imide

Conditions
ConditionsYield
With NH3 byproducts: H2; at 190°C, NH3:B2H6=9:1;A 9%
B n/a
C 80%
boric acid
11113-50-1

boric acid

urea
57-13-6

urea

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
Ca3N2, hexagonal High Pressure; over 100kg/cm2, in N2 stream, 1700-2000°C, 5-9 min; washing with water;80%
magnesium nitride High Pressure; over 100kg/cm2, in N2 stream, 1700-2000°C, 5-9 min; washing with water;80%
With ammonia heating at 900°C for 2-6 h under NH3 flow;
boric acid
11113-50-1

boric acid

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
Ca3N2, hexagonal High Pressure; over 100kg/cm2, in N2 stream, 1700-2000°C, 5-9 min; washing with water;80%
magnesium nitride High Pressure; over 100kg/cm2, in N2 stream, 1700-2000°C, 5-9 min; washing with water;80%
500-900°C in NH3 stream, at 1650°C in N2 or NH3 stream;
ammonia
7664-41-7

ammonia

boron trichloride
10294-34-5

boron trichloride

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
excess of NH3 at ambient temp. in N2 or H2 atmosphere; heating in H2 at 1200°C; 1000°C in H2 stream or in vac.; or at 2000°C in N2;80%
With hydrogen In gaseous matrix r. f. thermal plasma chemical vapour deposition (Ar carrier gas, Mo or Si substrate, substrate temp. 430-1100°C, deposition time 5 -10 min); secondary electron microscopy, X-ray diffraction;
BCl3 + NH3 flow (P(BCl3)/P(NH3) = 0.5) passed on support heated at 1323 K (3.5-4.5 min); BCl3 flow stopped; kept in Ar + 7% H2 atm (NH3 flow reduced by 1/2) for 30 min; total flow rate reduced; cooled to room temp.; XRD;
poly(2-vinylpentaborane)
78837-91-9

poly(2-vinylpentaborane)

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
With ammonia In not given byproducts: CH4, H2; slowly heating (2 °C/min) of B5H8CHCH2 from 25 to 350 °C under a flow of NH3 (100 mL/min), heating (10 °C/min) to 1000 °C, temp. maintained at 1000 ° C for 2 h;; elem. anal., the largely amorphous product changes at 1450 °C to crystalline BN;;72.2%
ammonium chloride

ammonium chloride

boric acid
11113-50-1

boric acid

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
In melt 300-1000°C, 1 mole dicyandiamide, 2 mole NH4Cl, 2-4 mole H3BO3;65%
diborane
19287-45-7

diborane

A

boron nitride
10043-11-5

boron nitride

B

boron imide

boron imide

Conditions
ConditionsYield
With NH3 byproducts: H2; at 400°C, NH3:B2H6=9:1;A 30%
B 65%
sodium tetrahydroborate
16940-66-2

sodium tetrahydroborate

urea
57-13-6

urea

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
In neat (no solvent) byproducts: NaCN, CO2, NH3; High Pressure; mixing of NaBH4 and CO(NH2)2, placing into stainless steel autoclave, sealing and heating at rate of 20°C/min in furnace to 550°C,heating at this temp. for 10 h, natural cooling to ambient temp.; washing with EtOH, dilute HCl and H2O several times, drying at 60°C for 10 h;65%
B10H12(NH2CH2CH2NH2)2

B10H12(NH2CH2CH2NH2)2

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
With NH3 In neat (no solvent) pyrolysis under NH3 to 1000 °C; detn. by elem. anal.;62.4%
borazine
6569-51-3

borazine

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
In neat (no solvent) pyrolysis under pressure (100 MPa) at temperatures between 250°C and 700°C (N2), elem.anal.;60%
In neat (no solvent) High Pressure; borazine sealed under N2 in a gold capsule, pyrolyzed at 250-700°C, 25-100MPa, heating rate 10°C/min;
In neat (no solvent) preparation of BN layers by induction heating of borazol;
In neat (no solvent, gas phase) byproducts: H2; deposition on varius substrates;
N2-carrying gas, chemical vapor deposition (graphite substrate, 1300-1800°C, 100-10000 Pa); detd. by IR spectroscopy;
B-triamino N-triphenyl borazine
42728-35-8

B-triamino N-triphenyl borazine

A

boron nitride
10043-11-5

boron nitride

B

aniline
62-53-3

aniline

Conditions
ConditionsYield
at 400°C for 2 h;A 50%
B n/a
at 260-300°C in high vac. for 18 h;
boron tribromide
10294-33-4

boron tribromide

A

boron

boron

B

boron trioxide

boron trioxide

C

boron nitride
10043-11-5

boron nitride

boron

boron

E

boric acid
11113-50-1

boric acid

Conditions
ConditionsYield
With H2; N2 In neat (no solvent) Electric Arc; pulse heating (plasma, puls repitition rate 5-12,5 Hz, N2 flow 0.2 - 1.65 l/min, H2 flow 1.13 - 3.5 l/min9; further products; X-ray diffraction;A n/a
B n/a
C 50%
D n/a
E n/a
boron

boron

ammonia
7664-41-7

ammonia

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
With MgO In neat (no solvent) 1:1 mixt. of B and MgO heated to 1300 °C using RF inducting furnace, vapour argon-transported in to reaction chamber with temp. ca. 1100 °C, NH3 flow introduced; detd. by XRD;40%
With magnesium oxide In neat (no solvent) byproducts: Mg; 1:1 molar mixt. of B and MgO reacted at 1300 °C to form B2O2 and Mg vapor, Ar-transported into react. chamber kept at 1100 °C, NH3added, at 1100 °C BN produced; Mn and Cr impurities from MgO trapped during BN growth;
nickel boride In solid B and NiB/Al2O3 mixed by ball-milling 8 h, placed in alumina tube, heated in flowing argon at 1000-1500 °C, NH3 introduced at rate of 80 sccm 2 h, cooled to room temp.;
boron trifluoride
7637-07-2

boron trifluoride

boron trichloride
10294-34-5

boron trichloride

A

boron

boron

B

boron nitride
10043-11-5

boron nitride

C

magnesium chloride
7786-30-3

magnesium chloride

Conditions
ConditionsYield
700-1000°C; diluterd with N2; washing with HCl at 1000°C;A n/a
B 34%
C n/a
boron trioxide

boron trioxide

sodium amide

sodium amide

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
byproducts: NH3, NaOH; mol ratio of B2O3:NaNH2 = 1:3; heating; reactn. starts at 210°C;;29.9%
byproducts: NH3, NaOH; mol ratio of B2O3:NaNH2 = 1:3; heating; reactn. starts at 210°C;;29.9%
byproducts: NH3, NaOH; mol ratio of B2O3:NaNH2 = 1:3; at 165°C in the presence of large amts. of NaOH;
byproducts: NH3, NaOH; mol ratio of B2O3:NaNH2 = 1:3; at 165°C in the presence of large amts. of NaOH;
2,4,6-triazidoborazine
21093-86-7

2,4,6-triazidoborazine

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
In neat (no solvent) heating in Pt-crucible inside quartz tube (N2-stream, 1200.°C, 8 h); elem. anal.;15%
aluminum oxide
1333-84-2, 1344-28-1

aluminum oxide

aluminium diboride

aluminium diboride

nitrogen
7727-37-9

nitrogen

aluminium
7429-90-5

aluminium

A

boron nitride
10043-11-5

boron nitride

B

aluminium nitride

aluminium nitride

C

FeB49

FeB49

D

2Al2O3*AlN

2Al2O3*AlN

Conditions
ConditionsYield
With Fe impurity In neat (no solvent) AlB2 (contg. Al, Fe and Al2O3 impurities) powder pressed uniaxially at 60 MPa; nitrided with N2 (8 atm) at 1900°C for 1 h; detd. by X-ray diffraction; composite contg. AlN, BN, FeB49 (trace) and Al5O6N (trace) obtained;A n/a
B n/a
C 1%
D 1%
With Fe impurity In neat (no solvent) AlB2 (contg. Al, Fe and Al2O3 impurities) powder pressed uniaxially at 60 MPa; nitrided with N2 (8 atm) at 1600°C for 1 h; detd. by X-ray diffraction; composite contg. AlN, BN, FeB49 and Al5O6N (trace) obtained;A n/a
B n/a
C n/a
D 1%
aluminum oxide
1333-84-2, 1344-28-1

aluminum oxide

aluminium diboride

aluminium diboride

nitrogen
7727-37-9

nitrogen

aluminium
7429-90-5

aluminium

A

boron nitride
10043-11-5

boron nitride

B

aluminium nitride

aluminium nitride

C

2Al2O3*AlN

2Al2O3*AlN

D

Al1.67B22

Al1.67B22

Conditions
ConditionsYield
In neat (no solvent) AlB2 (contg. Al and Al2O3 impurities) powder pressed uniaxially at 60 MPa; nitrided with N2 (8 atm) at 2000°C for 1 h or at 1600°Cfor 5 h and then at 2000°C for 1 h; detd. by X-ray diffraction; composite contg. AlN, BN, Al1.67B22 (trace) and Al5O6N (trace) obtained;A n/a
B n/a
C 1%
D 1%
aluminum oxide
1333-84-2, 1344-28-1

aluminum oxide

aluminium diboride

aluminium diboride

nitrogen
7727-37-9

nitrogen

aluminium
7429-90-5

aluminium

A

boron nitride
10043-11-5

boron nitride

B

aluminium nitride

aluminium nitride

C

2Al2O3*AlN

2Al2O3*AlN

Conditions
ConditionsYield
In neat (no solvent) AlB2 (contg. Al and Al2O3 impurities) powder pressed uniaxially at 60 MPa; nitrided with N2 (8 atm) at 1600°C for 5 h and at 1900°C for 1 h; detd. by X-ray diffraction; composite contg. AlN, BN and Al5O6N (trace) obtained;A n/a
B n/a
C 1%
borax

borax

magnesium
7439-95-4

magnesium

A

boron

boron

B

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
In solid Reaction at higher temperatures and with glowing effects. Formation of various Mg compounds.;
In neat (no solvent, solid phase) Reaction at higher temperatures and with glowing effects. Formation of various Mg compounds.;
boron trioxide

boron trioxide

A

boron

boron

B

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
With sodium byproducts: O2;
With Na byproducts: O2;
boron trioxide

boron trioxide

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
With ammonia byproducts: H2O; formatin of BN on the surface by heating;
With potassium cyanide by glowing;
With ammonia In neat (no solvent) reaction at 600°C;;
boron trioxide

boron trioxide

nitrogen
7727-37-9

nitrogen

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
With pyrographite In gaseous matrix byproducts: B4C; heating (1573-1773 K, 8 h, N2 or N2/H2), phase composition nad microstructure depending on temperature, time, starting B/C ratio, and gas composition;
With pyrographite In gas laser ablation of B2O3 in the presence of graphite in atmosphere of N2 (He carrier gas) in a pulsed supersonic jet; MS;
chemically vapor deposition on carbon nanotubes under flow of N2 at 1500°C; detn. by HRTEM;
boron trioxide

boron trioxide

potassium
7440-09-7

potassium

A

boron

boron

B

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
byproducts: O2;
byproducts: O2;
boron trioxide

boron trioxide

calcium cyanamide
156-62-7

calcium cyanamide

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
by glowing;
boron trioxide

boron trioxide

sodium amide

sodium amide

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
byproducts: sodium borate; small amounts of BN are obtained;;
boron trioxide

boron trioxide

pyrographite
7440-44-0

pyrographite

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
In neat (no solvent) reaction of mixture in N2 atmosphere;;
byproducts: CO; in N2 under pressure;
With ammonia by heating;
boron nitride
10043-11-5

boron nitride

strontium

strontium

strontium chloride

strontium chloride

A

Sr4 oxy-chloride

Sr4 oxy-chloride

B

Sr2BN2Cl

Sr2BN2Cl

Conditions
ConditionsYield
In neat (no solvent) heating (1200°C, 4 d, 1000°C, 4 d), cooling to room temp. (10 h);A n/a
B 80%
boron nitride
10043-11-5

boron nitride

graphite

graphite

calcium
7440-70-2

calcium

calcium bromide
7789-41-5

calcium bromide

3Ca(2+)*2Br(1-)*CBN(4-)=Ca3Br2CBN

3Ca(2+)*2Br(1-)*CBN(4-)=Ca3Br2CBN

Conditions
ConditionsYield
metal, halogenide, boron nitride and graphite are placed in niobium ampoules, heated at 950°C for 12 h, tempered at 800°C for 3 d;70%
boron nitride
10043-11-5

boron nitride

graphite

graphite

strontium

strontium

strontium chloride

strontium chloride

3Sr(2+)*2Cl(1-)*CBN(4-)=Sr3Cl2CBN

3Sr(2+)*2Cl(1-)*CBN(4-)=Sr3Cl2CBN

Conditions
ConditionsYield
metal, halogenide, boron nitride and graphite are placed in niobium ampoules, heated at 950°C for 12 h, tempered at 800°C for 3 d;70%
boron nitride
10043-11-5

boron nitride

calcium
7440-70-2

calcium

calcium chloride

calcium chloride

Ca2BN2Cl

Ca2BN2Cl

Conditions
ConditionsYield
In neat (no solvent) heating (1200°C, 4 d, 1000°C, 4 d), cooling to room temp. (10 h);60%
boron nitride
10043-11-5

boron nitride

barium
7440-39-3

barium

barium carbonate

barium carbonate

barium borate cyanide

barium borate cyanide

Conditions
ConditionsYield
With W In neat (no solvent) BN, Ba, W and BaCO3 were filled into a W-crucible under Ar, high-frequency furnace, heating under N2 up to 750 °C in 45 min, keeping at this temp. for 30 min, heating up to 1450 °C in 1 h, keeping at this temp. for 30 min; cooling to 200 °C in 39 h;50%
boron nitride
10043-11-5

boron nitride

iodine
7553-56-2

iodine

fluorine
7782-41-4

fluorine

nitrogen triiodide
13444-85-4

nitrogen triiodide

Conditions
ConditionsYield
In trichlorofluoromethane byproducts: BF3; Sonication; condensing of a mixture of I2, BN and CCl3F into a quartz apparature (passivated with F2), addn. of F2 at -196°C, warming to -30°C for 2 h under shaking, exposur to ultrasonic waves for 5 min at -18°C (explosion danger); warming to -10°C, pumping of CCl3F at -50°C, sublimation at -20°C;30%
boron nitride
10043-11-5

boron nitride

boric acid
11113-50-1

boric acid

Conditions
ConditionsYield
With water after 1 hour reaction with boiling water;1.2%
With H2O after 1 hour reaction with boiling water;1.2%
With hydrogenchloride byproducts: NH4Cl; at 160-200°C in sealed tube;
boron nitride
10043-11-5

boron nitride

potassium carbonate
584-08-7

potassium carbonate

pyrographite
7440-44-0

pyrographite

A

potassium cyanide

potassium cyanide

B

potassium tetraborate

potassium tetraborate

Conditions
ConditionsYield
low red heat; extraction of KCN with alcohol or H2O;
low red heat; extraction of KCN with alcohol or H2O;

10043-11-5Relevant articles and documents

A room-temperature approach to boron nitride hollow spheres

Chen, Luyang,Gu, Yunle,Shi, Liang,Yang, Zeheng,Ma, Jianhua,Qian, Yitai

, p. 537 - 540 (2004)

Boron nitride hollow spheres were synthesized by the reaction of BBr 3 and NaNH2 at room temperature; X-ray powder diffraction pattern could be indexed as hexagonal BN with the lattice constants of a=2.482 and c=6.701?; high-resolution transmission electron microscopy image showed the hollow spheres consisted of BN nanoparticles, with diameter between 80 and 300 nm; a possible formation mechanism of BN hollow spheres was discussed.

One pot synthesis of ultrathin boron nitride nanosheet-supported nanoscale zerovalent iron for rapid debromination of polybrominated diphenyl ethers

Wang, Liancheng,Ni, Shou-Qing,Guo, Chunli,Qian, Yitai

, p. 6379 - 6387 (2013)

To minimize the aggregation and size effects of nanoscale zerovalent iron (nZVI), nZVI/boron nitride nanosheets (BNNSs) composites were fabricated via a one pot autoclave route on a gram-scale. BNNSs (1-6 nm) supported nZVI (4-40 nm) was prepared by heating NaBH4, FeCl3 and NaN3 at 400 °C. The BNNSs matrixes benefit the retention of the activity for nZVI. The high specific surface area (182 m2 g -1) and density of structural defects allows enrichment of the pollutants, leading to a relatively high conversion by the nearby supported nZVI. Meanwhile, the gram-scale bifunctional nZVI/BNNSs have both reductive and magnetic properties, which make them highly reactive towards the test polybromodiphenyl ethers (PBDEs) and also easy to separate. The reaction rate of nZVI/BNNSs is almost twice that of the nZVI made in our lab. This study indicates that gram-scale nZVI/BNNSs are highly efficient and effective materials that can be utilized to treat PBDEs-contaminated sites, followed by the sequential magnetic separation. The Royal Society of Chemistry 2013.

New Phase of sp3-Bonded BN: The 5H Polytype

Komatsu, Shojiro,Okada, Katsuyuki,Shimizu, Yoshiki,Moriyoshi, Yusuke

, p. 3289 - 3291 (1999)

A new phase of sp3-bonded BN, that is, 5H polytype, has been found. The representative lattice parameters a and c were determined to be 2.528 and 10.407 Angstroem, respectively. The new BN phase was prepared by chemical vapor deposition assisted with 193 nm laser irradiation of the surface. Source gases were diborane and ammonia diluted in argon and hydrogen. The substrate temperature was 850 degC.

Characterization of boron nitride films deposited from BCl3-NH3-H2 mixtures in chemical vapour infiltration conditions

Cholet, V.,Vandenbulcke, L.,Rouan, J. P.,Baillif, P.,Erre, R.

, (1994)

Boron nitride (BN) thin films deposited by isopressure and isothermal chemical vapour infiltration (ICVI) from BCl3-NH3-N2 mixtures have been characterized from a physicochemical point of view as functions of both the deposition conditions and the destabilizing action of moisture. As-deposited (deposited at 773 K and post-treated at 1273 K), the BN films are turbostractic (d002 = 0.36 nm, Lc = 1.5 nm), have a low density (1.4 g cm-3) and contain oxygen (about 20 at%). A first oxygen content (191.5 eV by XPS) is inserted in the films during the CVI step in relation to the hygroscopy of intermediate solid products and the quasi-equilibrium between the formation of BN and B2O3. A second oxygen content (192.5 eV) is due to the hydrolysis of BN by moisture which induces a very drastic transformation of BN. This destabilization affects both boron and nitrogen atoms and leads to the formation of ammonium borate hydrates. Different post-treatments have been investigated to stabilize the BN films and it appears that nitriding under ammonia is the most efficient.

A low-temperature coreduction route to boron nitride flakes and hollow spheres

Chen, Luyang,Gu, Yunle,Shi, Liang,Yang, Zeheng,Ma, Jianhua,Qian, Yitai

, p. 144 - 145 (2004)

Boron nitride flakes and hollow spheres were synthesized by coreduction of NH4Cl and BBr3 using sodium as reductant. X-ray powder diffraction (XRD) pattern could be indexed as hexagonal BN. The X-ray photoelectron spectra (XPS) were used to determine the composition ratio, which is B:N = 1:1.05. The transmission electron microscopy (TEM) images showed flake-like and hollow spherical morphology.

Large-scale fabrication of boron nitride nanohorn

Zhi, Chunyi,Bando, Yoshio,Tang, Chengchun,Golberg, Dmitri,Xie, Rongguo,Sekiguchi, Takashi

, (2005)

Boron nitride nanohorns (BNNHs) are synthesized in large scale. Their morphology and structure were investigated by scanning electron microscopy and transmission electron microscopy. The hollow conical structure and particular aggregation behavior are rev

Boron nitride microfibers grown by plasma-assisted laser chemical vapor deposition without a metal catalyst

Komatsu, Shojiro,Kazami, Daisuke,Tanaka, Hironori,Shimizu, Yoshiki,Moriyoshi, Yusuke,Shiratani, Masaharu,Okada, Katsuyuki

, (2006)

Boron nitride fibers were found to grow on polycrystalline nickel and Si(100) substrates by plasma-assisted laser chemical vapor deposition from B2 H6 + NH3 using an excimer laser at 193 nm. Their diameter was typically a few hundreds of nanometers, while the length was a few tens of micrometers. They were stoichiometric or boron-rich BN in chemical composition. When the substrate was rotated during deposition, spiral fibers were found to grow. We conclude that they grew with the help of laser light by other than the vapor - liquid - solid mechanism.

Band gap and chemically ordered domain structure of a graphene analogue BxCyNz

Venu,Kanuri,Raidongia,Hembram,Waghmare,Datta

, p. 2262 - 2265 (2010)

Chemically synthesized few layer graphene analogues of BxC yNz are characterized by aberration corrected transmission electron microscopy and high resolution electron energy loss spectroscopy (HREELS) to determine the local phase, electronic structure and band gap. HREELS band gap studies of a BxCyNz composition reveal absorption edges at 2.08, 3.43 and 6.01 eV, indicating that the B xCyNz structure may consist of domains of different compositions. The K-absorption edge energy position of the individual elements in BxCyNz is determined and compared with h-BN and graphite. An understanding of these experimental findings is developed with complementary first-principles based calculations of the various ordered configurations of BxCyNz.

Catalytic synthesis of bamboo-like multiwall BN nanotubes via SHS-annealing process

Zhang,Gu,Wang,Zhao,Qian,Li,Pan,Zhang

, p. 633 - 636 (2011)

Bamboo-like multiwall boron nitride (BN) nanotubes were synthesized via annealing porous precursor prepared by self-propagation high temperature synthesis (SHS) method. The as-synthesized BN nanotubes were characterized by the field emission scanning elec

Electronic and optical properties of boron nitride nanotubes

Oku, Takeo,Koi, Naruhiro,Suganuma, Katsuaki

, p. 1228 - 1231 (2008)

Boron nitride (BN) nanotubes were fabricated, and their electronic and optical properties were investigated by scanning tunneling microscopy (STM) and optical absorption at room temperature. STM images showed atomic arrangements of BN nanotubes, and its chirality was directly observed. The current-voltage characteristics of the BN nanotubes showed onset voltage at 5.0 V, and the optical absorption spectrum of BN nanotubes showed a peak at 4.8 eV.

Formation, structure, and structural properties of a new filamentary tubular form: Hollow conical-helix of graphitic boron nitride

Xu, Fang-Fang,Bando, Yoshio,Ma, Renzhi,Golberg, Dmitri,Li, Yubao,Mitome, Masanori

, p. 8032 - 8038 (2003)

A novel tubular form of graphitic boron nitride (BN) displaying a hollow conical-helix was discovered. It was generated via wrapping a single beltlike filament according to the geometry of an Archimedes spiral. Cone apex angles of helical-conical nanotubes (HCNTs) were found to exhibit specific values, each of which refers to a certain coincidence site lattice. A unique structural property of HCNTs was observed, displaying the transformation of apex angles during the annealing process. The observed apex angles were reduced with decreasing annealing temperature, which is in accordance with an estimated HCNT strain energy decrease for a given tubular radius. It is suggested that the curvature and apex angle of a HCNT are determined by a sole dynamic element, that is, enthalpy (ΔH), whereas the HCNT disclination configuration changes through helical sliding of the filament.

Synthesis of nitrogen-rich B-C-N materials from melamine and boron trichloride

Popov, Cyril,Saito, Kimitsugu,Yamamoto, Kazuhiro,Ouchi, Akihiko,Nakamura, Takako,Ohana, Yoritsugu,Koga, Yoshinori

, p. 1281 - 1286 (1998)

Nitrogen-rich B C N materials have been prepared by the reaction between melamine and boron trichloride at different temperatures. The composition of the materials was dependent on the synthesis and annealing temperatures: C6N10.8-11H9.4B1.5-1.7 (for products synthesized and annealed at 673 K), C6N9.3-9.4H3.8-3.9B2.2-2.5 (for those synthesized at 673 K and annealed at 873 K) and C6N9.2H3.6B1.2-1.3 (for those synthesized and annealed at 873 K). Fourier transform infrared spectroscopy and 13C nuclear magnetic resonance showed that the s-triazine rings from the melamine molecules were preserved in materials synthesized and annealed at 673 and 873 K. The sample obtained at 873 K had a graphite-like structure as suggested by X-ray and electron diffraction studies. The s-triazine rings were decomposed in the materials synthesized or annealed at 1223 K and the main product obtained was turbostratic boron nitride.

Over 1.0 mm-long boron nitride nanotubes

Chen, Hua,Chen, Ying,Liu, Yun,Fu, Lan,Huang, Cheng,Llewellyn, David

, p. 130 - 133 (2008)

Over 1.0 mm boron nitride nanotubes (BNNTs) were successfully synthesized by an optimized ball milling and annealing method. The annealing temperature of 1100 °C is crucial for the growth of the long BNNTs because at this temperature there is a fast nitrogen dissolution rate in Fe and the B/N ratio in Fe is 1. Such long BNNTs enable a reliable single tube configuration for electrical property characterization and consequently the average resistivity of the long BNNTs is determined to be 7.1 ± 0.9 × 104 Ω cm. Therefore, these BNNTs are promising insulators for three dimensional microelectromechanical system.

Turbostratic boron nitride coated on high-surface area metal oxide templates

Klitgaard, Soren K.,Egeblad, Kresten,Brorson, Michael,Herbst, Konrad,Christensen, Claus H.

, p. 4873 - 4876 (2007)

Boron nitride coatings on high-surface area MgAl2O4 and Al2O3 have been synthesized and characterized by transmission electron microscopy and by X-ray powder diffraction. The metal oxide templates were coated with boron nitride using a simple nitridation in a flow of ammonia starting from ammonium borate adsorbed on MgAl2O 4 or γ-Al2O3. This procedure resulted in the formation of a turbostratic boron nitride film with a thickness of a few individual BN layers. Wiley-VCH Verlag GmbH & Co. KGaA, 2007.

Attempts of boron nitride deposition on different substrates under the influence of the electric field present in the reaction zone

Pawlas-Foryst, Ewa,Przybylo, Witold,Kopyto, Marek,Fitzner, Krzysztof

, p. 915 - 923 (2001)

Attempts were undertaken to obtain deposits of hexagonal boron nitride under the influence of either the electric field or current of various frequency flowing through the substrate. It was demonstrated that magnetic field as well as electrical potential difference created in the reaction zone both influence the way BN layers are formed. The layers grow with the formation of fine crystallites in the center of the substrate with their size increasing while moving from the center of the substrate to its edges. Distinct correlation between the electric fields line density and the sizes of the crystallites was observed. The distribution of the crystallites depends on current frequency used. It was found that there is an optimal current frequency for which the substrate is covered with the homogeneous layer of BN. The adhesion of this deposit depends strongly on the kind of the substrate used.

Phase identification of boron nitride thin films by polarized infrared reflection spectroscopy

Plass,Fukarek,Maendl,Moeller

, p. 46 - 48 (1996)

Six different types of boron nitride films were investigated by polarized infrared reflection spectroscopy. Films with a highly cubic, mixed cubic and noncubic, and exclusively noncubic phase composition were synthesized using ion beam assisted deposition. Additionally, postdeposition argon ion irradiated cubic and noncubic boron nitride films as well as a nitrogen implanted boron sample were analyzed. Using this technique, besides the cubic phase, two different noncubic modifications, layered anisotropic and amorphous, could be distinguished. A preferential orientation of the normal axis of the sp2-bonded basal planes parallel to the substrate surface was observed.

Influence of Diborane Flow Rate on the Structure and Stability of CVD Boron Nitride Films

Gomez-Aleixandre, C.,Essafti, A.,Fernandez, M.,Fierro, J. L. G.,Albella, J. M.

, p. 2148 - 2153 (1996)

CVD boron nitride films have been deposited at 800 deg C from diborane, ammonia, and hydrogen gas mixtures, using different B2H6 flow rates.The effect of the / ratio in the gas mixture on the structure, composition, and the stability of the lay

Structure of boron nitride nanoscale cones: Ordered stacking of 240° and 300° disclinations

Bourgeois,Bando,Han,Sato

, p. 7686 - 7691 (2000)

Recently discovered boron nitride (BN) nanoscale cone particles are shown to consist of an ordered stacking of seamless conical shells. High-resolution transmission electron microscopy and nanobeam electron diffraction allowed the orientation of the BN hexagonal rings to be determined. In all but one case, the results conformed with a model of orderly stacked 240° disclinations, which is the smallest cone geometry ensuring the presence of B-N bonds only. One case of a nanoscale cone constituted of 300° disclinations was found, implying that structures containing line defects of non-B-N bonds may form. 2000 The American Physical Society.

Syntheses of metal nitrides, metal carbides and rare-earth metal dioxymonocarbodiimides from metal oxides and dicyandiamide

Lei,Zhao,Yang,Song,Cao,Li,Tang

, p. 130 - 137 (2008)

We design a facile and efficient solid-state reaction method by selecting an organic reagent dicyandiamide and metal oxides as precursors to prepare metal nitrides, carbides and rare-earth metal dioxymonocarbodiimides in sealed ampoules. Some fine divided nitride and carbide nanoparticles with small and uniform size can be easily obtained at the relatively low temperatures. It is interesting to find that dicyandiamide is not only a highly efficient nitridation reagent but also a highly efficient carburization reagent, and can be used as a precursor to directly synthesize rare-earth metal dioxymonocarbodiimides. A possible mechanism is proposed to explain the results of the reactions between the organic reagent and metal oxides.

DENSITY AND DEPOSITION RATE OF CHEMICAL-VAPOUR-DEPOSITED BORON NITRIDE.

Matsuda, Toshitsugu,Nakae, Hiroyuki,Hirai, Toshio

, (1988)

A study was made on the density and deposition rate characteristics of chemical vapour deposited boron nitride (CVD-BN) plates synthesized by use of the BCl//3-NH//3-H//2 system at a deposition temperature (T//d//e//p) of 1200 to 2000 degree C and a total gas pressure (P//t//o//t) of 5 to 60 torr. At a P//t//o//t of 5 torr, all the CVD-BN plates synthesized at each T//d//e//p above 1300 degree C had a density greater than 2. 0 g cm** minus **3 and showed no noticeable dependence on T//d//e//p. Over the P//t//o//t range from 10 to 60 torr, the density reached a maximum of 2. 08 g cm** minus **3 at a T//d//e//p of 2000 degree C. As T//d//e//p was lowered, density decreased to a minimum of 1. 40 g cm** minus **3. The deposition rate varied with both T//d//e//p and P//t//o//t and showed a maximum value under a certain P//t//o//t at a given T//d//e//p. The value of P//t//o//t where the deposition rate becomes maximum changed depending on the T//d//e//p. The maximum deposition rate was 0. 6 mm h** minus **1 for the CVD-BN plates when the density was less than 2. 0 g cm** minus **3 and 0. 4 mm h** minus **1 when the density was above 2. 0 g cm** minus **3. The effects of deposition conditions on the characteristics of density and deposition rate are discussed in terms of the structure and deposition mechanism.

Influence of isothermal chemical vapor deposition and chemical vapor infiltration conditions on the deposition kinetics and structure of boron nitride

Leparoux, Marc,Vandenbulcke, Lionel,Clinard, Christian

, p. 1187 - 1195 (1999)

An experimental study has been performed to gain some insight into the correlations between the deposition conditions and the structure of boron nitride (BN) coatings that are used in ceramic-matrix composites. BN has been deposited at 700°C from BCl3-NH3-H2 mixtures on various substrates, by using chemical vapor deposition (CVD) and isothermal-isobaric chemical vapor infiltration (ICVI) processes, simultaneously in the same reactor. A kinetic study has shown that the CVD process is governed either by a combination of mass transfer with chemical kinetics at low flow rates or by the heterogeneous kinetics only at high flow velocities. In contrast, the limiting contribution of mass transfer always is observed for the ICVI process. The influence of diffusion cages that are positioned around the fibrous preforms is reported. The structure of BN deposits has been studied as a function of the various deposition conditions via transmission electron microscopy. The chosen CVD conditions lead to a poor organization of the BN deposits. Fairly well-organized BN coatings are deposited on all fibers of a fibrous preform via ICVI. The results are discussed in terms of supersaturation and deposition yields. The use of diffusion cages and the adjustment of the inlet composition and mass flow rate seem to be very important to obtain the best BN organization and thickness uniformity.

Formation and atomic structure of boron nitride nanotubes with a cup-stacked structure

Oku, Takeo,Koi, Naruhiro,Suganuma, Katsuaki,Belosludov, Rodion V.,Kawazoe, Yoshiyuki

, p. 331 - 336 (2007)

Boron nitride (BN) nanotubes were synthesized by annealing Fe4N/B powder at 1000?{ring operator}C for 1 h in a nitrogen gas atmosphere, and large amounts of BN nanotubes with a cup-stacked structure were obtained after a purification process. The atomic structures of the cup-stacked BN nanotubes were investigated by high-resolution electron microscopy as well as molecular mechanics calculations, and compared with double walled BN nanotubes. The present results indicate that the cup-stacked structure with a cone angle of 20{ring operator} is more stable than the structure with an angle of 38{ring operator} and ordinary nanotube structures.

Conversion of dihydridodiammineboron(III) borohydride to ammonia-borane without hydrogen evolution

Mayer, Erwin

, p. 1954 - 1955 (1973)

-

Purification of boron nitride nanotubes

Chen, Hua,Chen, Ying,Yu, Jun,Williams, James S.

, p. 315 - 319 (2006)

A purification process was developed for the first time for boron nitride (BN) nanotubes. BN nanotubes, prepared using a ball milling and annealing method, contain a high yield of nanotubes and a small amount of BN and metal catalyst particles. The metal particles can be dissolved in an HCl solution. Fine BN nanoparticles and thin layers were first converted to water soluble B2O3 via a partial oxidation treatment at 800 °C. The oxide particles and layers can then be dissolved in hot water. Thermogravimetric analysis has been used to determine an adequate oxidation temperature at which fine BN particles were oxidized.

Synthesis and structure of BN coatings on SiC nanofibers

Silenko,Shlapak,Pilipchuk,D'Yachkov,Solonin

, p. 1330 - 1333 (2011)

The Gibbs potential has been calculated as a function of temperature for a number of BN synthesis reactions. Detailed studies of BN chemical vapor deposition on SiC nanofibers were used to develop a technique for BN coating production from nontoxic precur

Cu-Catalyzed Chemoselective Reduction of N-Heteroaromatics with NH3·BH3 in Aqueous Solution

Gao, Chao,Xuan, Qingqing,Song, Qiuling

supporting information, p. 2504 - 2508 (2021/07/31)

An efficient catalytic system was successfully developed on reduction of N-heteroaromatics with H3N?BH3 as hydrogen source in CuSO4 solution, featuring excellent chemoselectivity as well as very broad functional group tolerance. Various challenging substrates, such as OH-, NH2-, Cl-, Br-, etc., contained quinolines, quinoxalines, 1,5-naphthyridines and quinazolines were all reduced smoothly. Mechanistic studies suggested that [Cu-H] intermediate might be generated from NH3?BH3, which was believed to form with H3N?BH3 in CuSO4 solution.

Boron-hyperdoped silicon for the selective oxidative dehydrogenation of propane to propylene

Chen, Junjie,Karakalos, Stavros G.,Kyriakidou, Eleni A.,Lance, Michael J.,Rohani, Parham,Swihart, Mark T.,Toops, Todd J.

supporting information, p. 9882 - 9885 (2020/09/09)

Boron containing catalysts have great potential in the oxidative dehydrogenation of propane. Herein, a series of 15, 25 and 42 atpercent boron-hyperdoped silicon catalysts synthesized by laser pyrolysis was studied. Boron-hyperdoped silicon samples showed >6 times higher propylene productivity than commercial h-BN at 450 °C.

OPEN-FLASK HYDROBORATION AND THE USE THEREOF

-

Paragraph 0042, (2018/03/25)

The present disclosure generally relates to a process for hydroboration of an alkene or alkyne using ammonia borane (AB). In particular, the present invention relates to hydroboration of an alkene or alkyne in the presence of air or moisture, and a clean process for facile preparation of an alcohol by oxidizing the organoborane so formed with hydrogen peroxide. The products, including aminodialkylboranes, ammonia trialkylborane complexes, as well as various alcohols so prepared, are within the scope of this disclosure.

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