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Boron nitride is an inorganic compound with a flat, hexagonal crystal structure similar to graphite, but with the carbon atoms replaced by boron and nitrogen atoms. The alternate boron and nitrogen atoms are linked to form interlocking hexagonal rings with three boron atoms and three nitrogen atoms, and the layers are held together by van der Waals forces. Boron nitride can also be in cubic form, where alternately linked boron and nitrogen atoms form a tetrahedral bond network, similar to carbon atoms in diamond.

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  • 10043-11-5 Structure
  • Basic information

    1. Product Name: Boron nitride
    2. Synonyms: BN B50;BN C;BN F15;BN A01;BORON NITRIDE;BORON NITRIDE NANOTUBE;BORON NITRIDE ROD;LUBRIFORM BN 10
    3. CAS NO:10043-11-5
    4. Molecular Formula: BN
    5. Molecular Weight: 24.82
    6. EINECS: 233-136-6
    7. Product Categories: Inorganics;Ceramics;Metal and Ceramic Science;Nitrides;metal nitride
    8. Mol File: 10043-11-5.mol
  • Chemical Properties

    1. Melting Point: 2700℃
    2. Boiling Point: sublimes sl below 3000℃ [MER06]
    3. Flash Point: N/A
    4. Appearance: White/Powder
    5. Density: 2.29
    6. Refractive Index: N/A
    7. Storage Temp.: -20°C
    8. Solubility: N/A
    9. Water Solubility: Soluble in water (slightly soluble) at 20°C, and water (soluble) at 95°C.
    10. Sensitive: Hygroscopic
    11. Stability: Stable. Incompatible with oxidizing agents, water.
    12. Merck: 14,1346
    13. CAS DataBase Reference: Boron nitride(CAS DataBase Reference)
    14. NIST Chemistry Reference: Boron nitride(10043-11-5)
    15. EPA Substance Registry System: Boron nitride(10043-11-5)
  • Safety Data

    1. Hazard Codes: Xi
    2. Statements: 36/37
    3. Safety Statements: 26-36
    4. RIDADR: UN1950
    5. WGK Germany: 3
    6. RTECS: ED7800000
    7. TSCA: Yes
    8. HazardClass: 2.1
    9. PackingGroup: N/A
    10. Hazardous Substances Data: 10043-11-5(Hazardous Substances Data)

10043-11-5 Usage

Uses

Used in High-Temperature Technology:
Boron nitride is used as a material for high-temperature equipment parts due to its excellent thermal and chemical stability. It is also used as a lubricant and an additive to cosmetics, paints, dental cements, and pencil leads.
Used in Electrical Industry:
Boron nitride is used in the electrical industry for its high thermal conductivity and high resistance. It is used as an electrical insulator, thermocouple protection sheaths, crucibles, and linings for reaction vessels. It can also be incorporated into ceramics, alloys, resins, plastics, and rubber to give them self-lubricating properties.
Used in Cosmetics:
Boron nitride is used as a synthetically manufactured white, talc-like powder that can reflect light, giving a product a sparkle effect. It is primarily used in color cosmetics to provide subtle shimmer and can also be found in skin care formulations for enhancing product smoothness and slip.
Used in Abrasives:
Cubic boron nitride is used as an abrasive material due to its hardness and structure, which is similar to diamond.
Used in Coatings and Paints:
Hexagonal boron nitride is used in the formulation of coatings and paints for high-temperature applications.
Used in Semiconductors and Optoelectronics:
Hexagonal boron nitride has applications in catalysts, optoelectronics, and semiconductor devices due to its high thermal conductivity.
Used in Mold Release Agents and Thermal Insulation:
Boron nitride powders can be used as mold-release agents, high-temperature lubricants, and additives in oils, rubbers, and epoxies to improve thermal conductance of dielectric compounds. It is also useful as thermal insulation in induction heating.
Used in Ceramic-Matrix Composites (CMC) and Metal-Matrix Composites (MMC):
Boron nitride powders are used to improve thermal shock and modify wetting characteristics in CMC and MMC.
Used as a Substrate for Semiconductors, Lens Coatings, and Transparent Windows:
Hexagonal boron nitride is used as a substrate for various applications, including semiconductors, lens coatings, and transparent windows.

Substance

Hardness VHN (Vickers)

diamond

8600

c-BN

5000

alumina

2300

tungsten carbide

1800

silicon carbide

800

titanium nitride

2100

titanium carbide

3000

Preparation

Boron nitride is prepared by heating boric oxide with ammonia: B2O3 + 2NH3 → 2BN + 3H2O Alternatively, the compound can be prepared by heating boric oxide or boric acid with ammonium chloride or an alkali metal cyanide. Purified product can be obtained by high temperature reaction of boron halide with ammonia: BCl3 + NH3 → BN + 3HCl Boron nitride can also be made from the elements by heating boron and nitrogen at red heat.

Production Methods

In tonnage production, acetaldehyde may be manufactured by: 1. The direct oxidation of ethylene, requiring a catalytic solution of copper chloride plus small quantities of palladium chloride Cl2Pd. 2. The oxidation of ethyl alcohol C2H6O with sodium dichromate Cr2Na2O7, and 3. The dry distillation of calcium acetate C4H6CaO4 with calcium formate C2H2CaO4.

Check Digit Verification of cas no

The CAS Registry Mumber 10043-11-5 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,0,0,4 and 3 respectively; the second part has 2 digits, 1 and 1 respectively.
Calculate Digit Verification of CAS Registry Number 10043-11:
(7*1)+(6*0)+(5*0)+(4*4)+(3*3)+(2*1)+(1*1)=35
35 % 10 = 5
So 10043-11-5 is a valid CAS Registry Number.
InChI:InChI=1/BN/c1-2

10043-11-5 Well-known Company Product Price

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  • Alfa Aesar

  • (45912)  Boron Nitride Rod;Diameter (mm), 12.7;Length (mm), 300   

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  • (45912)  Boron Nitride Rod;Diameter (mm), 12.7;Length (mm), 300   

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  • (45850)  Boron Nitride Rod;Diameter (mm), 6.4;Length (mm), 300   

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  • (45850)  Boron Nitride Rod;Diameter (mm), 6.4;Length (mm), 300   

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  • (45721)  Boron Nitride Bar;Length (mm), 300;Width (mm), 12.7;Height (mm), 12.7   

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  • (40608)  Boron nitride   

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  • (40608)  Boron nitride   

  • 10043-11-5

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  • Alfa Aesar

  • (40607)  Boron nitride   

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  • (40607)  Boron nitride   

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  • Alfa Aesar

  • (11078)  Boron nitride, 99.5% (metals basis)   

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  • 50g

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  • (11078)  Boron nitride, 99.5% (metals basis)   

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  • Alfa Aesar

  • (44839)  Boron nitride, 99.5% (metals basis)   

  • 10043-11-5

  • 1pc

  • 3258.0CNY

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10043-11-5SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 12, 2017

Revision Date: Aug 12, 2017

1.Identification

1.1 GHS Product identifier

Product name boron nitride

1.2 Other means of identification

Product number -
Other names wurzin

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only. Fillers,Processing aids, not otherwise listed
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:10043-11-5 SDS

10043-11-5Synthetic route

ammonia
7664-41-7

ammonia

boric acid
11113-50-1

boric acid

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
With multi-walled carbon nanotubes In solid byproducts: CO, H2, H2O; mixt. of multi-walled carbon nanotubes and H3BO3 taken in quartz tube, NH3 gas passed through with 10 sccm flow rate at 200 °C 2 h, temp.slowly raised to 1000 °C for 3 h;99%
With pyrographite; iron In neat (no solvent) byproducts: CO, H2, H2O; mixt. of activated carbon, H3BO3 and ferric nitrate (mole ratio of 3:1:0.1) taken in quartz tube, dried in oven at 60 °C 6 h, NH3 gas passed through with 10 sccm flow rate, heating at 1300 °C for 4 h;
byproducts: H2O; synthesis of BN coating on the surfaces of carbon nanotubes and nanofibers around 1150°C using infiltration of nanotubes with boric acid and nitridation in ammonia;
2,4,6-triamino-s-triazine
108-78-1

2,4,6-triamino-s-triazine

boric acid
11113-50-1

boric acid

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
over 600°C in N2 atmosphere;90%
Ca3N2, hexagonal High Pressure; over 100kg/cm2, in N2 stream, 1700-2000°C, 5-9 min; washing with water;80%
magnesium nitride High Pressure; over 100kg/cm2, in N2 stream, 1700-2000°C, 5-9 min; washing with water;80%
calcium hexaboride

calcium hexaboride

ammonia
7664-41-7

ammonia

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
With Fe2O3 In neat (no solvent, solid phase) mixt. CaB6 and Fe2O3 was heated to 750°C for 10 min under Ar atm., heated to 1150°C at 6°C/min keeping for 6 h in NH3 atm.; react. mixt. was cooled to room temp., product was washe with HCl, filtered, washed with water and dried in vacuo at 80°C for 12 h;81.4%
diborane
19287-45-7

diborane

A

boron nitride
10043-11-5

boron nitride

B

ammonia borane

ammonia borane

C

boron imide

boron imide

Conditions
ConditionsYield
With NH3 byproducts: H2; at 190°C, NH3:B2H6=9:1;A 9%
B n/a
C 80%
boric acid
11113-50-1

boric acid

urea
57-13-6

urea

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
Ca3N2, hexagonal High Pressure; over 100kg/cm2, in N2 stream, 1700-2000°C, 5-9 min; washing with water;80%
magnesium nitride High Pressure; over 100kg/cm2, in N2 stream, 1700-2000°C, 5-9 min; washing with water;80%
With ammonia heating at 900°C for 2-6 h under NH3 flow;
boric acid
11113-50-1

boric acid

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
Ca3N2, hexagonal High Pressure; over 100kg/cm2, in N2 stream, 1700-2000°C, 5-9 min; washing with water;80%
magnesium nitride High Pressure; over 100kg/cm2, in N2 stream, 1700-2000°C, 5-9 min; washing with water;80%
500-900°C in NH3 stream, at 1650°C in N2 or NH3 stream;
ammonia
7664-41-7

ammonia

boron trichloride
10294-34-5

boron trichloride

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
excess of NH3 at ambient temp. in N2 or H2 atmosphere; heating in H2 at 1200°C; 1000°C in H2 stream or in vac.; or at 2000°C in N2;80%
With hydrogen In gaseous matrix r. f. thermal plasma chemical vapour deposition (Ar carrier gas, Mo or Si substrate, substrate temp. 430-1100°C, deposition time 5 -10 min); secondary electron microscopy, X-ray diffraction;
BCl3 + NH3 flow (P(BCl3)/P(NH3) = 0.5) passed on support heated at 1323 K (3.5-4.5 min); BCl3 flow stopped; kept in Ar + 7% H2 atm (NH3 flow reduced by 1/2) for 30 min; total flow rate reduced; cooled to room temp.; XRD;
poly(2-vinylpentaborane)
78837-91-9

poly(2-vinylpentaborane)

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
With ammonia In not given byproducts: CH4, H2; slowly heating (2 °C/min) of B5H8CHCH2 from 25 to 350 °C under a flow of NH3 (100 mL/min), heating (10 °C/min) to 1000 °C, temp. maintained at 1000 ° C for 2 h;; elem. anal., the largely amorphous product changes at 1450 °C to crystalline BN;;72.2%
ammonium chloride

ammonium chloride

boric acid
11113-50-1

boric acid

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
In melt 300-1000°C, 1 mole dicyandiamide, 2 mole NH4Cl, 2-4 mole H3BO3;65%
diborane
19287-45-7

diborane

A

boron nitride
10043-11-5

boron nitride

B

boron imide

boron imide

Conditions
ConditionsYield
With NH3 byproducts: H2; at 400°C, NH3:B2H6=9:1;A 30%
B 65%
sodium tetrahydroborate
16940-66-2

sodium tetrahydroborate

urea
57-13-6

urea

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
In neat (no solvent) byproducts: NaCN, CO2, NH3; High Pressure; mixing of NaBH4 and CO(NH2)2, placing into stainless steel autoclave, sealing and heating at rate of 20°C/min in furnace to 550°C,heating at this temp. for 10 h, natural cooling to ambient temp.; washing with EtOH, dilute HCl and H2O several times, drying at 60°C for 10 h;65%
B10H12(NH2CH2CH2NH2)2

B10H12(NH2CH2CH2NH2)2

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
With NH3 In neat (no solvent) pyrolysis under NH3 to 1000 °C; detn. by elem. anal.;62.4%
borazine
6569-51-3

borazine

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
In neat (no solvent) pyrolysis under pressure (100 MPa) at temperatures between 250°C and 700°C (N2), elem.anal.;60%
In neat (no solvent) High Pressure; borazine sealed under N2 in a gold capsule, pyrolyzed at 250-700°C, 25-100MPa, heating rate 10°C/min;
In neat (no solvent) preparation of BN layers by induction heating of borazol;
In neat (no solvent, gas phase) byproducts: H2; deposition on varius substrates;
N2-carrying gas, chemical vapor deposition (graphite substrate, 1300-1800°C, 100-10000 Pa); detd. by IR spectroscopy;
B-triamino N-triphenyl borazine
42728-35-8

B-triamino N-triphenyl borazine

A

boron nitride
10043-11-5

boron nitride

B

aniline
62-53-3

aniline

Conditions
ConditionsYield
at 400°C for 2 h;A 50%
B n/a
at 260-300°C in high vac. for 18 h;
boron tribromide
10294-33-4

boron tribromide

A

boron

boron

B

boron trioxide

boron trioxide

C

boron nitride
10043-11-5

boron nitride

boron

boron

E

boric acid
11113-50-1

boric acid

Conditions
ConditionsYield
With H2; N2 In neat (no solvent) Electric Arc; pulse heating (plasma, puls repitition rate 5-12,5 Hz, N2 flow 0.2 - 1.65 l/min, H2 flow 1.13 - 3.5 l/min9; further products; X-ray diffraction;A n/a
B n/a
C 50%
D n/a
E n/a
boron

boron

ammonia
7664-41-7

ammonia

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
With MgO In neat (no solvent) 1:1 mixt. of B and MgO heated to 1300 °C using RF inducting furnace, vapour argon-transported in to reaction chamber with temp. ca. 1100 °C, NH3 flow introduced; detd. by XRD;40%
With magnesium oxide In neat (no solvent) byproducts: Mg; 1:1 molar mixt. of B and MgO reacted at 1300 °C to form B2O2 and Mg vapor, Ar-transported into react. chamber kept at 1100 °C, NH3added, at 1100 °C BN produced; Mn and Cr impurities from MgO trapped during BN growth;
nickel boride In solid B and NiB/Al2O3 mixed by ball-milling 8 h, placed in alumina tube, heated in flowing argon at 1000-1500 °C, NH3 introduced at rate of 80 sccm 2 h, cooled to room temp.;
boron trifluoride
7637-07-2

boron trifluoride

boron trichloride
10294-34-5

boron trichloride

A

boron

boron

B

boron nitride
10043-11-5

boron nitride

C

magnesium chloride
7786-30-3

magnesium chloride

Conditions
ConditionsYield
700-1000°C; diluterd with N2; washing with HCl at 1000°C;A n/a
B 34%
C n/a
boron trioxide

boron trioxide

sodium amide

sodium amide

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
byproducts: NH3, NaOH; mol ratio of B2O3:NaNH2 = 1:3; heating; reactn. starts at 210°C;;29.9%
byproducts: NH3, NaOH; mol ratio of B2O3:NaNH2 = 1:3; heating; reactn. starts at 210°C;;29.9%
byproducts: NH3, NaOH; mol ratio of B2O3:NaNH2 = 1:3; at 165°C in the presence of large amts. of NaOH;
byproducts: NH3, NaOH; mol ratio of B2O3:NaNH2 = 1:3; at 165°C in the presence of large amts. of NaOH;
2,4,6-triazidoborazine
21093-86-7

2,4,6-triazidoborazine

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
In neat (no solvent) heating in Pt-crucible inside quartz tube (N2-stream, 1200.°C, 8 h); elem. anal.;15%
aluminum oxide
1333-84-2, 1344-28-1

aluminum oxide

aluminium diboride

aluminium diboride

nitrogen
7727-37-9

nitrogen

aluminium
7429-90-5

aluminium

A

boron nitride
10043-11-5

boron nitride

B

aluminium nitride

aluminium nitride

C

FeB49

FeB49

D

2Al2O3*AlN

2Al2O3*AlN

Conditions
ConditionsYield
With Fe impurity In neat (no solvent) AlB2 (contg. Al, Fe and Al2O3 impurities) powder pressed uniaxially at 60 MPa; nitrided with N2 (8 atm) at 1900°C for 1 h; detd. by X-ray diffraction; composite contg. AlN, BN, FeB49 (trace) and Al5O6N (trace) obtained;A n/a
B n/a
C 1%
D 1%
With Fe impurity In neat (no solvent) AlB2 (contg. Al, Fe and Al2O3 impurities) powder pressed uniaxially at 60 MPa; nitrided with N2 (8 atm) at 1600°C for 1 h; detd. by X-ray diffraction; composite contg. AlN, BN, FeB49 and Al5O6N (trace) obtained;A n/a
B n/a
C n/a
D 1%
aluminum oxide
1333-84-2, 1344-28-1

aluminum oxide

aluminium diboride

aluminium diboride

nitrogen
7727-37-9

nitrogen

aluminium
7429-90-5

aluminium

A

boron nitride
10043-11-5

boron nitride

B

aluminium nitride

aluminium nitride

C

2Al2O3*AlN

2Al2O3*AlN

D

Al1.67B22

Al1.67B22

Conditions
ConditionsYield
In neat (no solvent) AlB2 (contg. Al and Al2O3 impurities) powder pressed uniaxially at 60 MPa; nitrided with N2 (8 atm) at 2000°C for 1 h or at 1600°Cfor 5 h and then at 2000°C for 1 h; detd. by X-ray diffraction; composite contg. AlN, BN, Al1.67B22 (trace) and Al5O6N (trace) obtained;A n/a
B n/a
C 1%
D 1%
aluminum oxide
1333-84-2, 1344-28-1

aluminum oxide

aluminium diboride

aluminium diboride

nitrogen
7727-37-9

nitrogen

aluminium
7429-90-5

aluminium

A

boron nitride
10043-11-5

boron nitride

B

aluminium nitride

aluminium nitride

C

2Al2O3*AlN

2Al2O3*AlN

Conditions
ConditionsYield
In neat (no solvent) AlB2 (contg. Al and Al2O3 impurities) powder pressed uniaxially at 60 MPa; nitrided with N2 (8 atm) at 1600°C for 5 h and at 1900°C for 1 h; detd. by X-ray diffraction; composite contg. AlN, BN and Al5O6N (trace) obtained;A n/a
B n/a
C 1%
borax

borax

magnesium
7439-95-4

magnesium

A

boron

boron

B

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
In solid Reaction at higher temperatures and with glowing effects. Formation of various Mg compounds.;
In neat (no solvent, solid phase) Reaction at higher temperatures and with glowing effects. Formation of various Mg compounds.;
boron trioxide

boron trioxide

A

boron

boron

B

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
With sodium byproducts: O2;
With Na byproducts: O2;
boron trioxide

boron trioxide

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
With ammonia byproducts: H2O; formatin of BN on the surface by heating;
With potassium cyanide by glowing;
With ammonia In neat (no solvent) reaction at 600°C;;
boron trioxide

boron trioxide

nitrogen
7727-37-9

nitrogen

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
With pyrographite In gaseous matrix byproducts: B4C; heating (1573-1773 K, 8 h, N2 or N2/H2), phase composition nad microstructure depending on temperature, time, starting B/C ratio, and gas composition;
With pyrographite In gas laser ablation of B2O3 in the presence of graphite in atmosphere of N2 (He carrier gas) in a pulsed supersonic jet; MS;
chemically vapor deposition on carbon nanotubes under flow of N2 at 1500°C; detn. by HRTEM;
boron trioxide

boron trioxide

potassium
7440-09-7

potassium

A

boron

boron

B

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
byproducts: O2;
byproducts: O2;
boron trioxide

boron trioxide

calcium cyanamide
156-62-7

calcium cyanamide

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
by glowing;
boron trioxide

boron trioxide

sodium amide

sodium amide

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
byproducts: sodium borate; small amounts of BN are obtained;;
boron trioxide

boron trioxide

pyrographite
7440-44-0

pyrographite

boron nitride
10043-11-5

boron nitride

Conditions
ConditionsYield
In neat (no solvent) reaction of mixture in N2 atmosphere;;
byproducts: CO; in N2 under pressure;
With ammonia by heating;
boron nitride
10043-11-5

boron nitride

strontium

strontium

strontium chloride

strontium chloride

A

Sr4 oxy-chloride

Sr4 oxy-chloride

B

Sr2BN2Cl

Sr2BN2Cl

Conditions
ConditionsYield
In neat (no solvent) heating (1200°C, 4 d, 1000°C, 4 d), cooling to room temp. (10 h);A n/a
B 80%
boron nitride
10043-11-5

boron nitride

graphite

graphite

calcium
7440-70-2

calcium

calcium bromide
7789-41-5

calcium bromide

3Ca(2+)*2Br(1-)*CBN(4-)=Ca3Br2CBN

3Ca(2+)*2Br(1-)*CBN(4-)=Ca3Br2CBN

Conditions
ConditionsYield
metal, halogenide, boron nitride and graphite are placed in niobium ampoules, heated at 950°C for 12 h, tempered at 800°C for 3 d;70%
boron nitride
10043-11-5

boron nitride

graphite

graphite

strontium

strontium

strontium chloride

strontium chloride

3Sr(2+)*2Cl(1-)*CBN(4-)=Sr3Cl2CBN

3Sr(2+)*2Cl(1-)*CBN(4-)=Sr3Cl2CBN

Conditions
ConditionsYield
metal, halogenide, boron nitride and graphite are placed in niobium ampoules, heated at 950°C for 12 h, tempered at 800°C for 3 d;70%
boron nitride
10043-11-5

boron nitride

calcium
7440-70-2

calcium

calcium chloride

calcium chloride

Ca2BN2Cl

Ca2BN2Cl

Conditions
ConditionsYield
In neat (no solvent) heating (1200°C, 4 d, 1000°C, 4 d), cooling to room temp. (10 h);60%
boron nitride
10043-11-5

boron nitride

barium
7440-39-3

barium

barium carbonate

barium carbonate

barium borate cyanide

barium borate cyanide

Conditions
ConditionsYield
With W In neat (no solvent) BN, Ba, W and BaCO3 were filled into a W-crucible under Ar, high-frequency furnace, heating under N2 up to 750 °C in 45 min, keeping at this temp. for 30 min, heating up to 1450 °C in 1 h, keeping at this temp. for 30 min; cooling to 200 °C in 39 h;50%
boron nitride
10043-11-5

boron nitride

iodine
7553-56-2

iodine

fluorine
7782-41-4

fluorine

nitrogen triiodide
13444-85-4

nitrogen triiodide

Conditions
ConditionsYield
In trichlorofluoromethane byproducts: BF3; Sonication; condensing of a mixture of I2, BN and CCl3F into a quartz apparature (passivated with F2), addn. of F2 at -196°C, warming to -30°C for 2 h under shaking, exposur to ultrasonic waves for 5 min at -18°C (explosion danger); warming to -10°C, pumping of CCl3F at -50°C, sublimation at -20°C;30%
boron nitride
10043-11-5

boron nitride

boric acid
11113-50-1

boric acid

Conditions
ConditionsYield
With water after 1 hour reaction with boiling water;1.2%
With H2O after 1 hour reaction with boiling water;1.2%
With hydrogenchloride byproducts: NH4Cl; at 160-200°C in sealed tube;
boron nitride
10043-11-5

boron nitride

potassium carbonate
584-08-7

potassium carbonate

pyrographite
7440-44-0

pyrographite

A

potassium cyanide

potassium cyanide

B

potassium tetraborate

potassium tetraborate

Conditions
ConditionsYield
low red heat; extraction of KCN with alcohol or H2O;
low red heat; extraction of KCN with alcohol or H2O;

10043-11-5Relevant articles and documents

A room-temperature approach to boron nitride hollow spheres

Chen, Luyang,Gu, Yunle,Shi, Liang,Yang, Zeheng,Ma, Jianhua,Qian, Yitai

, p. 537 - 540 (2004)

Boron nitride hollow spheres were synthesized by the reaction of BBr 3 and NaNH2 at room temperature; X-ray powder diffraction pattern could be indexed as hexagonal BN with the lattice constants of a=2.482 and c=6.701?; high-resolution transmission electron microscopy image showed the hollow spheres consisted of BN nanoparticles, with diameter between 80 and 300 nm; a possible formation mechanism of BN hollow spheres was discussed.

A novel precursor for synthesis of pure boron nitride nanotubes

Tang, Chengchun,Bando, Yoshio,Sato, Tadao,Kurashima, Keiji

, p. 1290 - 1291 (2002)

A novel precursor, a mixture of B2O2 and Mg which is generated in situ by reacting B and MgO at 1300°C, can be used to effectively synthesize bulk amounts of pure BN nanotubes with Mg evaporated from the final product; transmission electron microscope observation for the synthesized BN nanotubes indicates that defects present strongly depend on the tube diameter.

One pot synthesis of ultrathin boron nitride nanosheet-supported nanoscale zerovalent iron for rapid debromination of polybrominated diphenyl ethers

Wang, Liancheng,Ni, Shou-Qing,Guo, Chunli,Qian, Yitai

, p. 6379 - 6387 (2013)

To minimize the aggregation and size effects of nanoscale zerovalent iron (nZVI), nZVI/boron nitride nanosheets (BNNSs) composites were fabricated via a one pot autoclave route on a gram-scale. BNNSs (1-6 nm) supported nZVI (4-40 nm) was prepared by heating NaBH4, FeCl3 and NaN3 at 400 °C. The BNNSs matrixes benefit the retention of the activity for nZVI. The high specific surface area (182 m2 g -1) and density of structural defects allows enrichment of the pollutants, leading to a relatively high conversion by the nearby supported nZVI. Meanwhile, the gram-scale bifunctional nZVI/BNNSs have both reductive and magnetic properties, which make them highly reactive towards the test polybromodiphenyl ethers (PBDEs) and also easy to separate. The reaction rate of nZVI/BNNSs is almost twice that of the nZVI made in our lab. This study indicates that gram-scale nZVI/BNNSs are highly efficient and effective materials that can be utilized to treat PBDEs-contaminated sites, followed by the sequential magnetic separation. The Royal Society of Chemistry 2013.

Insight into carbon nanotubes-template reaction at high temperature

Hu, Long,Li,Ding,Tang,Qi

, p. 271 - 276 (2004)

Different types of carbon nanotubes (CNTs), including multi-walled CNTs, single-walled CNTs bundles, isolated single- or double-walled CNTs and nano-bamboo structured CNTs, were used as the templates to synthesize SiC and BN one-dimensional nanostructures

New Phase of sp3-Bonded BN: The 5H Polytype

Komatsu, Shojiro,Okada, Katsuyuki,Shimizu, Yoshiki,Moriyoshi, Yusuke

, p. 3289 - 3291 (1999)

A new phase of sp3-bonded BN, that is, 5H polytype, has been found. The representative lattice parameters a and c were determined to be 2.528 and 10.407 Angstroem, respectively. The new BN phase was prepared by chemical vapor deposition assisted with 193 nm laser irradiation of the surface. Source gases were diborane and ammonia diluted in argon and hydrogen. The substrate temperature was 850 degC.

X-ray absorption near edge structure study of BN nanotubes and nanothorns

Choi, Hyun Chul,Bae, Seung Yong,Jang, Woo Sung,Park, Jeunghee,Song, Ha Jin,Shin, Hyun-Joon

, p. 7007 - 7011 (2005)

Two boron nitride (BN) nanostructures, the bamboo-like nanotubes and nanothoms where the nanosize h-BN layers are randomly stacked looking like thorns, were synthesized selectively via thermal chemical vapor deposition of B/B2O3 under the NH3 flow at 1200?°C. Electron energy-loss spectroscopy reveals the N-rich h-BN layers with a ratio of B/N = 0.75-0.85. Angle-resolved X-ray absorption near edge structure of these two N-rich nanostructures has been compared with that of h-BN microcrystals. The ??* transition in the N K-edge shifts to the lower energy by 0.8-1.0 eV from that of h-BN microcrystals, and the second-order signals of N ls electrons become significant. We suggest that the N enrichment would decrease the band gap of nanostructures from that of h-BN microcrystals. The Raman spectrum shows the peak broadening due to the defects of N-rich h-BN layers. ? 2005 American Chemical Society.

Characterization of boron nitride films deposited from BCl3-NH3-H2 mixtures in chemical vapour infiltration conditions

Cholet, V.,Vandenbulcke, L.,Rouan, J. P.,Baillif, P.,Erre, R.

, (1994)

Boron nitride (BN) thin films deposited by isopressure and isothermal chemical vapour infiltration (ICVI) from BCl3-NH3-N2 mixtures have been characterized from a physicochemical point of view as functions of both the deposition conditions and the destabilizing action of moisture. As-deposited (deposited at 773 K and post-treated at 1273 K), the BN films are turbostractic (d002 = 0.36 nm, Lc = 1.5 nm), have a low density (1.4 g cm-3) and contain oxygen (about 20 at%). A first oxygen content (191.5 eV by XPS) is inserted in the films during the CVI step in relation to the hygroscopy of intermediate solid products and the quasi-equilibrium between the formation of BN and B2O3. A second oxygen content (192.5 eV) is due to the hydrolysis of BN by moisture which induces a very drastic transformation of BN. This destabilization affects both boron and nitrogen atoms and leads to the formation of ammonium borate hydrates. Different post-treatments have been investigated to stabilize the BN films and it appears that nitriding under ammonia is the most efficient.

Formation of B, Al, Ga, and Si nitrides from their oxides: A reactive laser ablation study

Raina,Kulkarni,Rao

, p. 1271 - 1277 (2004)

Nitrides such as Si3N4 and GaN are made by the reaction of the respective oxide with N2 or NH3. In order to understand the mechanism of formation of nitrides, reactive laser ablation of B2O3, Al2O3, Ga2O 3, and SiO2 in pure form, as well as in mixture with carbon, has been carried out in an atmosphere of nitrogen or ammonia in a pulsed supersonic jet. The reaction of N2 with SiO2 gives nitridic species such as Si2Ny (y≤5) in the vapor phase. On reaction with N2 in the presence of carbon, B 2O3 and Ga2O3 yield species of the type BxNy and GaNy, respectively. Nitridic species are preponderant in the reaction with ammonia only in the case of SiO2. Al2O3 predominantly gives oxynitridic species under the reaction conditions examined.

A low-temperature coreduction route to boron nitride flakes and hollow spheres

Chen, Luyang,Gu, Yunle,Shi, Liang,Yang, Zeheng,Ma, Jianhua,Qian, Yitai

, p. 144 - 145 (2004)

Boron nitride flakes and hollow spheres were synthesized by coreduction of NH4Cl and BBr3 using sodium as reductant. X-ray powder diffraction (XRD) pattern could be indexed as hexagonal BN. The X-ray photoelectron spectra (XPS) were used to determine the composition ratio, which is B:N = 1:1.05. The transmission electron microscopy (TEM) images showed flake-like and hollow spherical morphology.

Composition and microstructure of chemically vapor-deposited boron nitride, aluminum nitride, and boron nitride + aluminum nitride composites

Hanigofsky,More,Lackey,Lee,Freeman

, p. 301 - 305 (1991)

The composition and microstructure of dispersed-phase ceramic composites containing BN and AlN as well as BN and AlN single-phase ceramics prepared by chemical vapor deposition have been characterized using X-ray diffraction, scanning electron microscopy, electron microprobe, and transmission electron microscopy techniques. Under certain processing conditions, the codeposited coating microstructure consists of small single-crystal AlN fibers (whiskers) surrounded by a turbostatic BN matrix. Other processing conditions resulted in single-phase films of AlN with a fibrous structure. The compositions of the codeposits range from 2 to 50 mol% BN, 50 to 80 mol% AlN with 7% to 25% oxygen impurity as determined by electron microprobe analysis.

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