cyclic or exocyclic olefins, such as norbornene and meth-
ylenecycloalkanes, affords the corresponding acetone-olefin
adducts (methyl ketones). This photochemical CsC coupling
reaction proceeds at ambient temperature with acetone, which
is cheap, clean, and safe and, hence, has a potential as a
new methyl ketone production process; however, the reaction
suffers from low selectivity and low yield.
Scheme 1
.
Reaction of Photoactivated Acetone in the Presence
of Cyclohexene (1)
Here, we present highly efficient and selective methyl
ketone production, achieved by photoirradiation of an
acetone/water mixture containing olefins (see the Table of
Contents graphic). This extremely simple photoprocess,
efficiently promoted just by water addition, is driven by
hydration of acetone-derived radicals, which leads to an
enhancement of methyl ketone formation and a suppression
of byproduct formation.
The efficacy of adding water to acetone is evident from
the reaction with cyclohexene (1) as a substrate. Table 1
Table 1. Results of Photoreaction of Cyclohexene (1) in
Acetone Solutions Containing Various Cosolvents (40 vol %)a
(Scheme 1): the excited-state acetone undergoes [2 +
2]cycloaddition to 1 to form 6 (oxetane).8 The excited-state
acetone also undergoes hydrogen abstraction from ground-
state acetone to produce acetonyl (I) and 2-hydroxy-2-propyl
(II) radical pairs.11 These radical pairs undergo fast recom-
bination (deactivation to ground-state acetones) or dimer-
ization (formation of 7-9).11,12 The methyl ketone (2) is
formed by a radical addition of I to alkene 1 followed by
hydrogen abstraction from ground-state acetone.9 In contrast,
radical II abstracts an allylic hydrogen of 1 to produce
2-propanol (3) and cyclohexenyl radical (III). The radical
III reacts with radical II or itself and produces cyclohexene-
derived byproducts (4 and 5).13
The water-induced enhancement of the methyl ketone (2)
formation is probably due to the suppression of the radical
pair recombination (I and II) by hydration of each radical.
Figure 1 (black bar) shows the effect of water amount on
the product distribution of 1. Formation of 2, 3, and 6 is
enhanced with an increase in the water amount up to 40%.
The increased 6 formation is due to the stabilization of
intermediate by high polarity of water.8c Compounds 2 and
3 form via the reaction of 1 with respective radicals I and
II. These radical pairs are rapidly deactivated by recombina-
tion.12 The enhanced formation of 2 and 3 indicates that
water addition suppresses the radical pair recombination. It
is well-known that, in aqueous solution, carbonyl14 and
hydroxyl15 compounds are hydrated via a hydrogen-bonding
interaction. The suppression of the radical pair recombination
is probably due to the hydration of each radical. As shown
in Figure 1, the amount of acetone dimers (7-9) decreases
a Reaction conditions: acetone solution (10 mL), 1 (0.2 mmol), λ >300
nm (Xe lamp), photoirradiation time (6 h), temperature (40 °C).10
b Determined by GC.
shows the yield of 1-cyclohexylpropan-2-one (2) obtained
by photoirradiation at >300 nm.10 In pure acetone (entry
1), the yield of 2 is only 15%. In contrast, addition of 40
vol % water (entry 2) leads to drastic yield enhancement for
2 (43%). A similar enhancement (38%) is observed with D2O
(entry 3), but other solvents are ineffective (entries 4-7).
As described,8,9,11–13 reaction of photoexcited acetone in
the presence of 1 proceeds via the following mechanism
(9) (a) Reusch, W J. Org. Chem. 1962, 27, 1882–1883. (b) Majerski,
ˇ
K. M.; Pavlovic´, D.; Kulyk, M. S J. Org. Chem. 1993, 58, 252–254. (c)
Chung, W.-S.; Ho, C.-C. Chem. Commun. 1997, 317–318.
(10) Photoreaction procedures are as follows: each olefin was dissolved
in an acetone solution (10 mL) within a Pyrex glass tube (i.d. 10 mm;
capacity, 20 cm3), where the solvents were used without purification. The
tube was sealed using a rubber septum cap and purged with nitrogen. The
tube was photoirradiated with magnetic stirring by a Xe lamp (2 kW; Ushio
Inc; light intensity, 32.1 mW m-2 at 300-340 nm) or a high-pressure Hg
lamp (300 W; Eikohsha Co. Ltd.; light intensity, 38.2 mW m-2 at 300-340
nm). Substrate and product concentrations were determined by GC-FID
(Shimadzu GC-1700), where the product identifications were made by
GC-MS (Shimadzu GCMS-QP 5050A). The detailes are described in: (a)
Shiraishi, Y.; Saito, N.; Hirai, T. J. Am. Chem. Soc. 2005, 127, 8304–
8306. (b) Shiraishi, Y.; Saito, N.; Hirai, T. J. Am. Chem. Soc. 2005, 127,
12820–12822.
(11) Nakashima, M.; Hayon, E J. Phys. Chem. 1971, 75, 1910–1914
(12) (a) Shimizu, N.; Miyahara, T.; Mishima, M.; Tsuno, Y Bull. Chem.
Soc. Jpn. 1989, 62, 2032–2039. (b) Przybytek, J. T.; Singh, S. P.; Kagan,
.
(14) (a) Takebayashi, Y.; Yoda, S.; Sugeta, T.; Otake, K.; Nakahara,
M. J. Phys. Chem. B 2003, 107, 9847–9852. (b) Idrissi, A.; Longelin, S.;
Sokolic´, F. J. Phys. Chem. B 2001, 105, 6004–6009.
J. J. Chem. Soc., Chem. Commun. 1969, 1224–1225
.
(13) (a) de Mayo, P.; Stothers, J. B.; Templetone, W Can. J. Chem.
1961, 39, 488–497. (b) Borrell, P.; Sedler, J. Trans. Faraday Soc. 1970,
(15) (a) Filder, J.; Rodger, P. M. J. Phys. Chem. B 1999, 103, 7695–
7703. (b) Ruckenstein, E.; Shulgin, I. L.; Tilson, J. L. J. Phys. Chem. A
2005, 109, 807–815.
66, 1670–1679
.
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Org. Lett., Vol. 10, No. 14, 2008