Bulletin of the Chemical Society of Japan p. 469 - 472 (1996)
Update date:2022-08-10
Topics:
Bhat, Yajnavalkya Subray
Das, Jagannath
Halgeri, Anand Bhimrao
The chemical vapor deposition of silica on Ga-MFI zeolite was carried out using tetraethyl orthosilicate. The enhancement in para selectivity during toluene alkylation with the extent of silica deposition was closely monitored. The effect of reaction temperature on the behavior of silica deposited Ga-MFI zeolite was established. A deactivation trend in toluene conversion was observed when the zeolite was employed for alkylation for longer periods. The reasons for catalytic deactivation and stability enhancement by in situ coking are discussed.
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