Gas-Phase Photolysis of 2,2-Dimethylbutane, 2,2,3-Trimethylbutane, 2,2,3-Trimethyl-2-silabutane, and 2,2,3,3-Tetramethyl-2-silabutane at 147 nm.

Article abstract of DOI:10.1021/j100215a026

The 147-nm photolyses of 2,2-dimethylbutane, 2,2,3-trimethylbutane, 2,2,3-trimethyl-2-silabutane (isopropyltrimethylsilane), and 2,2,3,3-tetramethyl-2-silabutane (tert-butyltrimethylsilane) are reported.In addition, the mercury-sensitized photolyses of i-C4H10, trimethylsilane, and mixtures of i-C4H10 and trimethylsilane are reported which give disproportionation to combination (D/C) ratios of 2.1+- 0.2 and 0.28+-0.05 for (CH3)3C + (CH3)3C and (CH3)3Si + (CH3)3Si, respectively, and D/C ratios of 1.86+- 0.15and 0.55+- 0.08 for (CH3)C + (CH3)3Si to form 2-methyl-2-silapropene and i-C4H8, respectively.With the completion of this work, several trends and generalizations can be drawn concerning the importance of various processes in linear vs. branched alkanes and alkylsilanes.These conclusions are summarized in this report.