
Tetrahedron Letters p. 6395 - 6398 (2004)
Update date:2022-08-16
Topics:
Wakamatsu, Kan
Kouda, Mitsuru
Shimaoka, Kazuyoshi
Yamada, Haruo
The photochemical deprotection of alkyl 2,4-dinitrobenzenesulfenate or alkyl 2-nitrobenzenesulfenate was successfully achieved by addition of triethylamine, while it was unsuccessful without triethylamine. The sulfur-oxygen bond cleavage is thought to occ
View More
Contact:13357117572
Address:No.149 Shiji dadao Road.
Suzhou HeChuang Chemical Co.,Ltd.
Contact:+86-512-88800520
Address:No.9 Guanchao Rd,Changshu Advanced Materials Industy Park
Jinan Hongfangde Pharmatech Co.LTD
Contact:0531-88870908
Address:F Bldg,750#,Shunhua Rd,New&High-tech Zone,Jinan,Shandong,China 250101
Hefei TNJ chemical industry co.,ltd
website:https://www.tnjchem.com
Contact:+86-551-65418695
Address:B911 Xincheng Business Center, Qianshan Road, Hefei Anhui China
Zhejiang Allied Chemical Co.,Ltd
Contact:18967038207
Address:Area A-30, High-tech Industrial Park, Quzhou, Zhejiang, China.
Doi:10.1002/aoc.5683
(2020)Doi:10.1021/j100349a011
(1989)Doi:10.1021/acs.joc.5b00142
(2015)Doi:10.3762/bjoc.14.73
(2018)Doi:10.1021/jacs.5b12680
(2016)Doi:10.1021/ac101111m
(2010)