
Tetrahedron Letters p. 6395 - 6398 (2004)
Update date:2022-08-16
Topics:
Wakamatsu, Kan
Kouda, Mitsuru
Shimaoka, Kazuyoshi
Yamada, Haruo
The photochemical deprotection of alkyl 2,4-dinitrobenzenesulfenate or alkyl 2-nitrobenzenesulfenate was successfully achieved by addition of triethylamine, while it was unsuccessful without triethylamine. The sulfur-oxygen bond cleavage is thought to occ
View More
Shanghai agrotree chemical co.,ltd.
Contact:+86-21-50117563
Address:Room 8A,liangfeng building,No.8 dongfang RD.pudong,shanghai,China
Shanghai Hanshare Industry Co.,Ltd.
Contact:86 21 20960688
Address:RM902-903,Building E, Wanda Plaza,No.26,Zhoukang Road, Pudong District, Shanghai, China
Contact:86-379-63338609
Address:Jiudian Village,Deting Town,Song County,Luoyang
Puyang Willing Chemicals Co.,Ltd.
Contact:86-393-4840366
Address:Puyang Henan China
Contact:86-379-63338609
Address:Jiudian Village,Deting Town,Song County,Luoyang
Doi:10.1002/aoc.5683
(2020)Doi:10.1021/j100349a011
(1989)Doi:10.1021/acs.joc.5b00142
(2015)Doi:10.3762/bjoc.14.73
(2018)Doi:10.1021/jacs.5b12680
(2016)Doi:10.1021/ac101111m
(2010)