Characterization of electron cyclotron resonance plasma deposited silicon nitride and silicon oxide films

DOI: 10.1149/1.2096295

Source and publish data:

Journal of the Electrochemical Society p. 2835 - 2840 (1989)

Update date:2022-08-28

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Authors:

Nguyen Nguyen

Albaugh Albaugh

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Article abstract of DOI:10.1149/1.2096295

The physical and bonding properties of electron cyclotron resonance (ECR) plasma-deposited silicon nitride and oxide films deposited in many commercial ECR deposition systems were analyzed using various analytical techniques. ECR films deposited at room t

Full text of DOI:10.1149/1.2096295

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