PHOTOLITHOGRAPHIC PATTERNING OF PARTICULATE FILMS.

Article abstract of DOI:10.1111/j.1151-2916.1987.tb05644.x

A method has been developed to produce an arbitrary pattern in a thin particle film on a substrate. In this method, a layer of photoresist is spun onto a continuous, uniform ceramic film which is then exposed to ultraviolet light under a mask with the desired pattern. After development of the photoresist the regions of the film no longer covered with photoresist are removed by immersion in an ultrasonic bath.