Full text of DOI:10.1063/1.94502

Electron beam assisted chemical vapor deposition of SiO2
L. R. Thompson, J. J. Rocca, K. Emery, P. K. Boyer, and G. J. Collins
Citation: Applied Physics Letters 43, 777 (1983); doi: 10.1063/1.94502
View online: http://dx.doi.org/10.1063/1.94502
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/43/8?ver=pdfcov
Published by the AIP Publishing
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
132.174.255.116 On: Fri, 19 Dec 2014 00:25:14

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
132.174.255.116 On: Fri, 19 Dec 2014 00:25:14

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
132.174.255.116 On: Fri, 19 Dec 2014 00:25:14