PHOSPHORUS, SULFUR, AND SILICON AND THE RELATED ELEMENTS
899
surface investigation by AFM characterization of our thin
films revealed nanoparticles grown on a glass substrate cov-
ering the whole area with overall uniform density, roughness
of the surface. The characteristic bands of ZnO, NiO, and
the combination ZnO/NiO are revealed with Raman investi-
gation. The add of NiO to ZnO led the Eg of ZnO to
improve and increase.
Acknowledgments
Authors gratefully acknowledge the financial support of the Directorate
General for Scientific Research and Technological Development
(DGRSDT), authors also would like to thank Nechadi Meriem of
Energetic and Solid-State Electrochemistry Laboratory (Setif-1
University), and Yacine BOUACHIBA of Thin Film and Interfaces
Laboratory (Constantine-1) for the characterization equipment
and help.
Figure 6. Optical gap Eg determination of ZnO/NiO nanocomposites thin films.
Table 1. Values of Eg of ZnO/NiO nanocomposites thin films.
References
NiO/ZnO
75%–25%
NiO/ZnO
50%–50%
NiO/ZnO
25%–75%
Material
Eg(eV)
NiO
ZnO
3.4
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3.64
3.58
3.60
3.66
uniform and stoichiometric are in the vicinity of 500 ꢀC. We
can calculate the band gap energy Eg from the transmittance
spectra using the following relation:
T ¼ exp ½ꢂaðkÞdꢄ
which gives
ꢀ ꢁ
1
a ¼ Ln
d
1
T
where d and T are the thickness of the thin films and
optical transmittance, respectively.
We use the equation below to calculate the Eg of our
thin films[19]
:
n
ð
Þ
ahꢀ ¼ A hꢀ ꢂ Eg
ð
Þ
1
2
n ¼ for allowed direct transition, and equal to 2 for indir-
ect allowed transition.
The optical band gap was obtained by plotting the follow-
ing expression:
The extrapolation of the plot to zero absorption give the
values of the direct energy gap Eg (see Figure 6):
From the Figure 6, we can see that the Eg of pure ZnO
(3.4 eV) increases with the percentage of NiO by 3.58 eV for
NiO/ZnO (75%–25%) and 3.60. For ZnO/NiO (50%–50%)
and final value is about 3.66 for NiO/ZnO (25%–75%).
The values of Eg are given in Table 1.
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Transparent Conductive ZnO: Al Thin Films Prepared by
Direct Current Magnetron Sputtering with Highly Conductive
ZnO (ZnAl2O4) Ceramic Target. J. Cryst. Growth 2003, 247,
Conclusions
The obtained results led us to the following observations:
Spray pyrolysis technique of aqueous Zink and Nickel
chloride solutions is a simple and effective method for pre-
paring ZnO/NiO nanocomposites thin films at moderate
temperatures. X-ray diffraction analysis revealed the pres-
ence of all phases for the used solutions with a variation of
intensities during the combination. The morphology of the
ꢀ
ꢀ
[11] Perusin, S. Consequences de l’oxydation haute temperature sur
ꢀ
ꢀ
l’injection de defauts et le comportement mecanique des
ꢀ
ꢀ
materiaux metalliques. Diss. Institut National Polytechnique de
Toulouse, 2004.
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Andoptical Properties of Sol–Gel Derived ZnO Thin Films on
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