Supercritical water oxidation of a PCB of 3-chlorobiphenyl using hydrogen peroxide

Article abstract of DOI:10.1246/cl.1997.245

The supercritical water oxidation (SCWO) of a PCB of 3-chlorobiphenyl (1) was carried out at a temperature of 673 K and a pressure of 30 MPa with a flow reactor. The initial concentrations of (1) and hydrogen peroxide ranged from 1.84 X 10 ^-3 to 8.74 X 10 ^-2 M (1 M=1 mol dm ^-3), and 0.181 to 2.67 M, respectively. The decomposition of (1) was higher than 99.9% so long as hydrogen peroxide was stoichiometrically added.