Chemistry of Materials
Article
AUTHOR INFORMATION
Corresponding Authors
2859-2153.
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Notes
The authors declare no competing financial interest.
ACKNOWLEDGMENTS
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V.W.W.Y. acknowledges support from The University of Hong
Kong under the URC Strategic Research Theme on New
Materials. This work was fully supported by a grant from the
Theme-Based Research Scheme of the Research Grants Council
of the Hong Kong Special Administrative Region, China (Project
T23-713/11). C.Y.C. and Y.C.W. acknowledge the receipt of
postgraduate studentships from The University of Hong Kong.
Figure 8. Dark current of the OPV devices doped with TAPC, 3, and 4.
REFERENCES
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treated in an ultraviolet-ozone chamber. A 2 nm anodic buffer layer of
MoO3, a 60 nm blend of active layer containing spirothioxanthene
donor and C70 acceptor, a 8 nm exciton blocking layer of BPhen, and a
100 nm top cathode of aluminum, were sequentially thermally
evaporated onto the substrates in vacuum chamber. All organic and
metal layers were successively deposited at a rate of 0.1−0.2 nm s−1 in a
Trovato Mfg. Inc. high vacuum evaporator under a base pressure of <5 ×
10−6 Torr without vacuum break. Film thicknesses were determined in
situ by calibrated oscillating quartz-crystal sensors. Shadow masks were
used to define the patterns of organic and cathode layers to make four
0.1 cm2 identical devices on each substrate. Current−voltage character-
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model 2400 power source. The photocurrent was measured under
illumination from an Oriel 300 W solar simulator equipped with AM 1.5
G (AM: air mass; G: global) filter, and the light intensity was measured
using an Oriel silicon reference cell equipped with KG-5 filter. For the
external quantum efficiency measurements, devices were irradiated with
monochromatic light of variable wavelength by using an Oriel Quantum
Efficiency/IPCE Measurement Kit equipped with Oriel Cornerstone
260 1/4 m monochromator with a 300 W xenon arc lamp. The intensity
of the source at each wavelength was determined using a calibrated
silicon detector. The photocurrent under short-circuit conditions was
recorded by using a dual channel radiometer at 10 nm intervals for each
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OTFT Device Fabrication and Characterization. OTFT devices
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acetone, followed by UV-ozone treatment. After treatment, a 30 nm
thick polystyrene (PS) dielectric layer was spin-coated onto the SiO2
layer at 2000 rpm from 0.45 wt % 1,1,2,trichloroethane solution. The
samples were then baked inside a vacuum oven overnight at 60 °C and
were transferred into a vacuum chamber. An active layer was formed by
evaporating spirothioxanthene onto the PS layer. The source and drain
electrodes composed of a 20 nm thick MoO3 layer and a 100 nm Au
layer were prepared by thermal evaporation at a base pressure of 1 ×
10−6 Torr. The presence of the MoO3 interlayer was used as surface
modification layer to facilitate hole injection into the active layer. The
channel width (W) and length (L) were 6 mm and 50 μm. After
fabrication, the samples were transferred immediately to a temperature
controlled cryostat for electrical measurements. All TFT measurements
were performed in vacuum. The TFT mobilities in the linear (μlinear) and
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dx.doi.org/10.1021/cm5033699 | Chem. Mater. XXXX, XXX, XXX−XXX