Photosensitive characteristics of poly(methacrylates) containing benzylidenephthalimidine moieties on the side chain

Article abstract of DOI:10.1080/10587259608040316

Photosensitive polymethacrylates having benzylidenephthalimidine(BPI) moiety on the side chains were synthesized. Upon photoirradiation of the polymer film, there occurred two kinds of photoreactions; the E/Z photoisomerization and [2+2] cycloaddition. Th

Full text of DOI:10.1080/10587259608040316

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Molecular Crystals and Liquid Crystals
Science and Technology. Section A.
Molecular Crystals and Liquid Crystals
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Photosensitive Characteristics of
Poly(Methacrylates) Containing
Benzylidenephthalimidine Moieties on
the Side Chain
a
a
a
Suh Dong Hae , Yuko Hayashi , Kazuaki Kudo & Kunihiro
a
Ichimura
a
Research Laboratory of Resources Utilization , Tokyo Institute
of Technology , 4259 Nagatsuta, Midori-ku, Yokohama, 226,
Japan
Published online: 04 Oct 2006.
To cite this article: Suh Dong Hae , Yuko Hayashi , Kazuaki Kudo & Kunihiro Ichimura (1996)
Photosensitive Characteristics of Poly(Methacrylates) Containing Benzylidenephthalimidine
Moieties on the Side Chain, Molecular Crystals and Liquid Crystals Science and Technology. Section
A. Molecular Crystals and Liquid Crystals, 280:1, 97-102, DOI: 10.1080/10587259608040316
To link to this article: http://dx.doi.org/10.1080/10587259608040316
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