Macromolecules
Article
stirred for 3 h, and then carefully quenched by the addition of H2O (4
mL), 15%, NaOH (4 mL), and H2O (10 mL), followed by filtration.
The filtrate was washed with H2O (2 × 20 mL), brine (1 × 20 mL),
and dried over MgSO4. After removing solvent in vacuo, the crude
product 2 in Scheme 1 (4.3 g) was obtained as a yellowish oil (used in
next step without further purification). N-(10-undecenyl) 2-bromo-2-
methylpropanamide (compound 3 in Scheme 1) was prepared as
follows. A solution of the crude amine 2 (4.3 g) and Et3N (4.2 mL,
29.60 mmol) in dichloromethane (80 mL) was cooled down to 0 °C
under atmosphere of argon. 2 bromo-2-methylpropionyl bromide
(2.82 mL, 22.80 mmol) was added drop-wise to this solution.
Resulting reaction mixture was stirred 30 mins at 0 °C. The reaction
was then quenched with water (10 mL), and after separation, the
organic layer was washed with 3% HCl (20 mL), 1:1 H2O and brine
mixture (30 mL), brine (20 mL) and dried over MgSO4. After
removing solvent in vacuo, the crude product was purified by column
chromatography (hexane:Et2O:acetone = 10:1:2) to afford 6.65 g
amide 3 in Scheme 1 as a colorless oil (92 % overall yield after 3
polymerization was run such that the longest period of immersion was
30 min.
PMAA Brush Synthesis from tert-Butyl Methacrylate (tBMA). The
polymerization solution comprised 45 mL of tBMA (purified by
passing through a column containing inhibitor remover), 45 mL of
DMSO, 40 μL of PMDETA, and 0.058 g of CuCl ([tBMA]:[CuCl]:
[PMDETA] = 470:1:0.33). This solution was degassed by bubbling
with N2 gas for 30 min, then charged to a custom-built glass reactor
containing an initiator-modified wafer using a degassed glass syringe.
The SI-ATRP proceeded for 1 h, at which point the reactor was
opened and the wafer removed. The wafer was rinsed thoroughly with
ethanol, then sonicated in ethanol for 20 min, followed by drying with
a stream of N2 gas. The PtBMA brush was then characterized using
ellipsometry, followed by hydrolysis for a total of 40 min by a 50 vol %
solution of TFA in DCM to yield the PMAA brush.
Incubation Experiments. Buffer solutions with strengths of 10
mM were prepared using sodium phosphate salts and adjusted to pH
4, 7.4, and 9 using minute quantities of HCl and KOH. The pH of
each buffer was measured to 0.02 using an Accumet AB15 pH meter
(Fisher Scientific) equipped with a platinum pH electrode. Periodic
measurement of the buffer solutions were done to ensure no pH drift
occurred. The parent polymer brush samples were segmented into 1
cm wide specimens and placed individually into glass vials containing
buffer solution that had been filtered using 0.2 μm syringe filters. The
vials were then sealed and stored in the dark at room temperature for
the duration of the incubation. After a certain incubation time (i.e., 24
or 120 h), the samples were removed, rinsed briefly with DI water and
dried with a stream of N2 gas and stored for further characterization.
Characterization Techniques. Spectroscopic Ellipsometry.
Measurements were performed on a variable angle spectroscopic
ellipsometer (J.A. Woollam Co.) controlled by WVASE32 software
(J.A. Woollam Co.). For brush thicknesses >30 nm, data were
collected at incidence angles of 65, 70, and 75° over wavelengths
ranging from 400 to 1000 nm. These data were fit to a model
comprising a Si substrate, SiOx layer (thickness 1.5 nm), and a Cauchy
layer. The Si and SiOx layers used material files supplied with the
WVASE32 software. The Cauchy layer was fit using thickness, and the
Cauchy parameters An and Bn. For thicknesses <30 nm, the thickness
and Cauchy parameters cannot be independently fit. Thus, data were
collected at 632.8 nm over a range of incidence angles from 60 to 80°
in 1° increments. These data were fit to a model comprising a Si
substrate, SiOx layer (thickness 1.5 nm) and a Cauchy layer. The
Cauchy parameters, An and Bn, were held constant using values
obtained at the thickest part of the brush. Only thickness was used as a
fitting parameter.
Infrared Variable Angle Spectroscopic Ellipsometry (IR-VASE).
Measurements were performed on an IR-VASE (J.A. Woollam Co.)
controlled by WVASE-IR software (J.A. Woollam Co.) at a 50° angle
of incidence with a resolution of 4 cm−1.
Atomic Force Microscopy. Surface topography measurements were
conducted in air using an Asylum MFP-3D system (Asylum Research)
in tapping mode using Si tips (Model AC160TS; Asylum Research)
with a resonance frequency of 300 kHz and spring constant of
42 N/m. Scans were collected over an area of 4 μm × 4 μm at a scan
rate of 1.0 Hz and resolution 512 lines/scan. Data were analyzed in the
Gwyddion software package.33
Contact Angle Goniometry. Contact angles of DI water were
measured using a Rame−Hart goniometer. A water droplet of volume
́
6−8 μL was dispensed on the surface, and the contact angle of the
droplet determined using automated computer software. Measure-
ments were collected at various points along the Si substrate, and the
location of these measurements were determined using a rule placed
adjacent to the substrate during measurements.
1
steps). H NMR (400 MHz, CDCl3) δ 6.70 (bs, 1H), 5.78 (ddt, J =
16.9, 10.2, 6.7 Hz, 1H), 4.97 (ddt, J = 17.1, 3.7, 1.6 Hz, 1H), 4.90 (ddt,
J = 10.2, 2.3, 1.2 Hz, 1H), 3.23 (td, J = 7.1, 5.8 Hz, 2H), 2.05 − 1.97
(m, 2H), 1.93 (s, 6H), 1.51 (p, J = 7.3 Hz, 2H), 1.41 − 1.20 (m, 12H).
13C NMR (101 MHz, CDCl3) δ 172.0, 139.4, 114.3, 63.9, 40.7, 34.0,
32.9, 29.7, 29.6, 29.5, 29.4, 29.3, 29.1, 27.0. HR HR-MS (ESI) m/z
calculated for C15H28ONBrNa: 340.1247, found 340.1246. Finally,
[11-(2-bromo-2-methyl)propanamide] undecyltrichlorosilane (aBM-
PUS) was obtained by hydrosilylation of compound 3 in Scheme 1. To
a solution of 0.5 g of 3 in 10 mL trichlorosilane was added 1 or 2 drops
of Karstedt catalyst (platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisi-
loxane complex, 3 wt% solution in xylenes). The solution was heated
to reflux for 5 hours. The excess silane was then removed by
distillation. Anhydrous dichloromethane (distilled over activated
molecular sieves) was added, and the product solution was filtered
through a plug of anhydrous sodium sulfate under nitrogen.
Dichloromethane was removed by vacuum, and the product was
dried under vacuum and weighed. Anhydrous toluene (stood over
activated molecular sieves) was added to make a 5 wt% solution. The
solution was transferred to vials and stored in a freezer until use.
Initiator Deposition. Silicon wafers were cut into 4.5 cm × 5 cm
rectangles and were sonicated in methanol, dried with a stream of N2
gas, and treated in a UV−ozone apparatus for 20 min. For initiator
gradient samples, wafers were then placed horizontally next to a well
containing a mixture of OTS in mineral oil (1:4) for 7 min. After OTS
deposition, the wafer was immediately placed into a solution of 30 μL
of 5 vol % eBMPUS in anhydrous toluene and 30 mL of anhydrous
toluene and incubated at −20 °C overnight. An identical approach was
used for aBMPUS. Our experience suggests it is important to use
ethanol for the sonication of aBMPUS-modified wafers (as opposed to
methanol or toluene, for example) to remove properly physisorbed
material. For homogeneous initiator substrates used to form molecular
weight gradients, no OTS deposition step was performed. The wafer
was then removed from solution, rinsed with ethanol, dried with a
stream of N2 gas, then sonicated in ethanol for 20 min and dried with a
stream of N2 gas. The wafer was then immediately analyzed by contact
angle using deionized (DI) water as a probing liquid, then dried with a
stream of N2 gas before polymerization.
PMAA Brush Synthesis from Sodium Methacrylate (NaMA).
Silicon wafer samples functionalized with either eBMPUS or aBMPUS
were inserted in solutions containing CuBr (80 mM), CuBr2 (16
mM), bipyridine (200 mM), and 6 M sodium methacrylate in DI
water, which had been titrated to pH 9 using HCl and degassed by
bubbling with N2 gas for 30 min. For grafting density gradient samples,
the samples were removed after 24 h, rinsed copiously with DI water,
and dried under a stream of dry N2 gas. To produce molecular weight
gradient samples, substrates were immersed into the polymerization
solution at a controlled speed using a dipping apparatus described
previously.32 The polymerization followed the surface-initiated (SI)
ATRP reaction scheme. The polymerization time at a given point on
the wafer depends on the speed of the immersion process. The
RESULTS AND DISCUSSION
■
The data in Figure 2 plot the ex situ dry thickness of two
gradient polymer assemblies, determined by spectroscopic
ellipsometry, against either polymerization time for the
molecular weight (MW) gradient sample (panel a) or against
C
Macromolecules XXXX, XXX, XXX−XXX