
Journal of Physical Chemistry p. 2966 - 2972 (1990)
Update date:2022-08-29
Topics:
Lifshitz, Assa
Tamburu, Carmen
Suslensky, Aya
The thermal decomposition of propanal (CH3CH2CHO) highly diluted in argon was studied behind reflected shocks in a pressurized-driver single-pulse shock tube over the temperature range 970-1300 K and overall densities of ca. 2.5 * 1E-5 mol/cm3.Under these conditions the following decomposition products were obtained (in order of decreasing abundance): CO, C2H4, CH4, C2H6, C3H8, C3H6, C4H6, and C2H2.Mixtures containing 0.1percent propanal and 1percent toluene in argon showed a factor of ca. 3 decrease in the production rate of ethylene, indicating the involvement of a free-radical mechanism.Two dissociation reactions initiate the decomposition of propanal: (1) C2H5CHO -> C2H5 radical + CHO radical and (2) C2H5CHO -> CH3 radical + CH2CHO radical.It then proceeds via a free-radical chain mechanism where the most important reactions are C2H5CHO + R radical -> CH3CH2CO radical + RH, CH3CH2CO radical -> C2H5 radical + CO, and CH3CH2CO radical -> CH3 radical + CH2CO.The overall decomposition of propanal was computer modeled with a reaction scheme containing 22 species and 52 elementary reactions.A sensitivity analysis showed that the system is very sensitive to the two initiation reactions and to the two-channel dissociation of the radical CH3CH2CO.The concentration ratio
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