C. von Ha¨nisch, S. Stahl / Journal of Organometallic Chemistry 692 (2007) 2780–2783
2783
Table 1
Crystallographic data of 2–4 [5]
Compound
2
3
4
Formula
Space group
C42H100Ga4O2P4Si4
P21/n
2
C42H100In4O2P4Si4
C26H52Li2N2O3P2Si2
Ibca
8
ꢀ
P1
Formula units
Temperature (K)
Lattice constants
2
180
180
200
˚
a (A)
11.385(2)
17.931(4)
14.905(3)
90
103.55(3)
90
11.740(2)
12.674(3)
22.488(5)
103.06(3)
94.02(3)
107.78(3)
3065.5(11)
1.442
17.233(3)
19.417(4)
21.932(4)
90
90
90
˚
b (A)
˚
c (A)
a (°)
b (°)
c (°)
Volume (A )
Density (g/cm3)
3
˚
2958.3(10)
1.294
7339(3)
1.037
2H Range (°)
4–52
17685
5271 (0.0564)
5016
4–48
17188
8702 (0.0845)
7586
4–48
Reflections measured
11119
2824 (0.0395)
2483
Independent reflections (Rint
Ind. reflections with Fo > 4r(Fo)
)
Parameter
257
2.021
0.0478
0.1349
505
1.679
0.0612
0.1564
161
0.209
0.0664
0.2012
ꢀ0.511/0.945
l (Mo Ka) (mmꢀ1
R1
)
wR2 (all data)
Residual electron density (min/max)
ꢀ0.732/0.489
ꢀ1.454/1.174
1
1H NMR (THF-d8): d = ꢀ1.90 (d, JP,H = 150 Hz, PH,
(b) B. Neumuller, E. Iravani, Coord. Chem. Rev. 248 (2004) 817–834;
¨
3
(c) M. Driess, Adv. Inorg. Chem. 50 (2000) 235–284.
[2] (a) M. Westerhausen, S. Weinrich, B. Schmid, S. Schneiderbauer, M.
Suter, H. No¨th, H. Piotrowski, Z. Anorg. Allg. Chem. 629 (2003) 625–
633;
2H), 0.80 (sep., JH,H = 7.5 Hz, CH(CH3)2, 4H), 1.03 (d,
3JH,H = 7.5 Hz, CH(CH3)2, 12H), 1.06 (d, JH,H = 7.5 Hz,
3
CH(CH3)2, 12H), 2.19 (s, N(CH3)2, 12H), 2.34 (s, C2H4
(NMe2)2, 4H); 7Li{1H} NMR (THF-d8): d = 1.46 (s);
(b) C. von Ha¨nisch, B. Rolli, Z. Anorg. Allg. Chem. 628 (2002) 2255–
2258;
(c) N. Wiberg, A. Wo¨rner, D. Fenske, H. No¨th, J. Knizek, K.
Polborn, Angew. Chem. 112 (2000) 1908–1912. Angew. Chem., Int.
Ed. 39 (2000) 1838–1842;
(d) M. Westerhausen, M. Wieneke, W. Schwarz, J. Organomet. Chem.
572 (1999) 249–257;
(e) M. Westerhausen, R. Lo¨w, W. Schwarz, J. Organomet. Chem. 513
(1996) 213–229.
29Si{1H} NMR (THF-d8): d = 25.0 (d, JPH = 57.9 Hz);
1
1
31P NMR (THF-d8): d = ꢀ314 (d, JP,H = 150 Hz); IR
(KBr): 2944 (vs), 2891 (m), 2866 (vs), 2299 (s), 14634 (s),
1385 (m), 1365 (w), 1260 (w), 1214 (w), 1159 (w), 1082
(s), 1051 (vs), 989 (s), 919 (w), 882 (s), 801 (w), 644 (s),
604 (s), 500 (s), 453 (m).
[3] (a) C. von Ha¨nisch, O. Rubner, Eur. J. Inorg. Chem. (2006) 1657–
1661;
Acknowledgement
(b) C. von Ha¨nisch, E. Matern, Z. Anorg. Allg. Chem. 631 (2005)
1655–1659;
We are grateful to the Deutsche Forschungsgemeins-
chaft (DFG) for financial support.
(c) C. von Ha¨nisch, Eur. J. Inorg. Chem. (2003) 2955–2958.
[4] C. von Ha¨nisch, S. Stahl, Angew. Chem. 118 (2006) 2360–2363.
Angew. Chem., Int. Ed. 45 (2006) 2302–2305.
Appendix A. Supplementary data
˚
[5] STOE-IPDS2 (Mo Ka radiation, k = 0.71073 A). The structures were
solved by direct methods and refined by full-matrix least-squares
techniques against F2 (In, Ga, P, Si, O, N, C, Li refined anisotrop-
ically, H atoms at the organic groups were calculated at idealized
positions).
CCDC 615858, 615859 and 615860 contain the supple-
mentary crystallographic data for this paper. These data
tallographic Data Centre, 12 Union Road, Cambridge
CB2 1EZ, UK; fax: +(44) 1223-336-033; or e-mail: depos-
it@ccdc.cam.ac.uk. Supplementary data associated with
this article can be found, in the online version, at
[6] (a) C. von Ha¨nisch, B. Rolli, Phosphorus Sulfur Silicon 179 (2004)
749–757;
(b) C. von Ha¨nisch, Z. Anorg. Allg. Chem. 627 (2001) 68–72;
(c) A. Schaller, H.-D. Hausen, J. Weidlein, Z. Anorg. Allg. Chem. 626
(2000) 616–618;
(d) W. Uhl, M. Benter, Chem. Commun. (1999) 771–772;
(e) J.F. Janik, R.L. Wells, V.G. Young Jr., A.L. Rheingold, I.A.
Guzei, J. Am. Chem. Soc. 120 (1998) 532–537;
(f) K. Niediek, B. Neumuller, Chem. Ber. 127 (1994) 67–71.
¨
References
[7] G. Becker, H.-M. Hartmann, W. Schwarz, Z. Anorg. Allg. Chem. 577
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(b) B. Neumuller, Chem. Ber. 122 (1989) 2283–2287.
¨