Journal of the Electrochemical Society p. 635 - 639 (1989)
Update date:2022-08-10
Topics:
Stafford
The electrodeposition of binary aluminum-manganese alloys from chloroaluminate molten salts is reported. The manganese content of the electrodeposit varies from 7 to 30 w/o and is dependent upon deposition potential and the relative concentrations of Al2Cl7- and Mn++ in the melt. At small cathodic overpotentials the deposition process, with respect to alloy composition, is kinetically controlled. At larger cathodic overpotentials, it becomes mass transport limited in Mn++ and then Al2Cl7-. The most uniform and brightest deposits are obtained at a constant potential of -0.3v with respect to an aluminum wire in the same electrolyte. The potential dependence of alloy composition allows one to create homogeneous, graded and modulated structures from a single electrolyte. The structure of the as-deposited alloy appears to be that of a metallic glass above 27 w/o manganese and a mixture of glass and supersaturated aluminum below 27 w/o. Heating to 400°C converts the deposit containing less than 26 w/o Mn to a mixture of the orthorhombic Al6Mn intermetallic and aluminum. The ability to electrodeposit intermetallic compounds on a near atomic scale presents interesting possibilities for high temperature alloys.
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