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PROPERTIES OF LPCVD ALUMINUM FILMS PRODUCED BY DISPROPORTIONATION OF ALUMINUM MONOCHLORIDE.

DOI: 10.1149/1.2113865

Source and publish data:

Journal of the Electrochemical Society p. 457 - 463 (1985)

Update date:2022-08-26

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Authors:

LevyLevy

GallagherGallagher

ContoliniContolini

SchreySchrey

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Article abstract of DOI:10.1149/1.2113865

Aluminum and aluminum-alloy films are widely used in the metallization of integrated circuits. This study describes the properties of LPCVD (low pressure chemical vapor deposition) Al deposited by the disproportionation of AlCl and Si and SiO//2 substrate

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Full text of DOI:10.1149/1.2113865

Downloaded on 2015-05-21 to IP 138.251.14.35 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).  
Downloaded on 2015-05-21 to IP 138.251.14.35 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).  
Downloaded on 2015-05-21 to IP 138.251.14.35 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).  
Downloaded on 2015-05-21 to IP 138.251.14.35 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).  
Downloaded on 2015-05-21 to IP 138.251.14.35 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).  
Downloaded on 2015-05-21 to IP 138.251.14.35 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).  
Downloaded on 2015-05-21 to IP 138.251.14.35 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).  

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Product name:Aluminium

Cas No:7429-90-5

7429-90-5

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