D. Pradhan et al. / Electrochimica Acta 54 (2009) 6661–6667
6667
The ꢁcrt is calculated by substituting ˛c ≈ 0.2, i0 = 57 A/m2,
iL = 518 A/m2 and T = 363 K in Eq. (8). The calculated value of ꢁcrt
is −0.536 V which is in good agreement with the value obtained
from the polarization curve (∼ −0.55 V).
Hence, it can be concluded that the surface modification of
electrodes helps in obtaining non-dendritic deposits. The cathode
overpotential of −0.55 V or lower is recommended for electrorefin-
ing of aluminum.
4. Conclusions
The electrorefining experiments were carried out using alu-
minum alloy anode and copper/aluminum cathode materials from
AlCl3–EMIC (molar ratio 1.65:1) mixture at 1.5 V, 90 3 ◦C, 60 rpm
for 5 h. Pure aluminum deposits were obtained. The electrorefin-
ing process has high current efficiency (94.10–99.27%). The surface
modification of electrodes eliminates the dendritic deposition of
aluminum. It was observed that cathode overpotentials obtained
from experiments using modified electrodes are significantly lower
than those obtained using unmodified electrodes. Thus, cathode
overpotential is the key in preventing dendrite formation of alu-
minum deposits on cathode. The critical overpotential (ꢁcrt) at
which dendritic growth begins is about −0.55 V and is very close
to the calculated value of −0.536 V. Hence, cathode overpotentials
lowerthan−0.55 Varerecommendedforthepreventionofdendrite
formation of aluminum deposits on copper/aluminum cathodes.
Fig. 11. Polarization curve for electrodeposited aluminum on modified aluminum
cathode deposit at different cathode overpotential (−0.25 V to −0.625 V) at 90
3
◦C.
tionship in electrodeposition is given by Eq. (4) [21]
i0(fc − fa)
i =
(4)
1 + (i0fc/iL)
where iL is the limiting current density (A/m2), i0 is the exchange
current density (A/m2). Considering cathodic current density and
overpotential as positive, fa and fc are expressed as follows:
Acknowledgements
ꢀ
ꢁ
ꢀ
ꢁ
˛aFꢁ
RT
˛cFꢁ
RT
The authors gratefully acknowledge the financial support from
NSF, ACIPCO and The University of Alabama.
fa = exp
−
(5)
Suffix “a” and “c” refers to anode and cathode, respectively. For
flat electrode, the condition for initiation of dendritic growth is
given by Eq. (6)
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ꢂ
ꢃ
RT
iL
ı
ꢁcrt
=
ln
(7)
˛cF
i0
h
The minimum overpotential for which the dendritic growth will
be initiated (when h = ı) is given by Eq. (8)
ꢀ
ꢁ
RT
iL
ꢁcrt
=
ln
(8)
˛cF
i0
The iL was calculated from Eq. (9)
nFDC0
=
ı
iL
(9)
the diffusion coefficient of Al2Cl7 ion, C0 is bulk concentration of
Al2Cl7− ion and ı is the diffusion boundary layer thickness (m). Sub-
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(mol/m3) and ı = 17.5 × 10−6 m [23] in Eq. (9) yield the limiting cur-
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