T.E. Jones et al. / Surface Science 523 (2003) 12–20
15
to 875–925 K resulted in the disappearance of the
(3 ꢀ 3) pattern to be replaced by a beam in the (4/
5,0), (0,4/5) and all equivalent positions in the
diffraction pattern indicative of a (5 ꢀ 5) type pat-
tern. A similar (5 ꢀ 5) structure has been reported
for Mo on Ni{1 1 1} by Feinstein and Blanc [11].
The ordered alloy formed by this procedure was
assumed to consist of one Mo atom per unit cell
giving a surface composition of 4% Mo.
probed. Following the 650 K annealing treatment
(Fig. 3a), all Mo is located in a relatively intense
and narrow peak indicating that Mo is present in a
single surface layer. By contrast, annealing to
815 K results in a much broader Mo related fea-
ture indicating the presence of subsurface Mo (Fig.
3b). In the case of the 885 K annealed surface, the
Mo features are much less intense and much
broader. The relative intensities of the Mo peak
and the Ni peak give an indication of the amount
of Mo present in the near-surface region. The
width of the Mo rich layer can be used to infer
the distribution of Mo as a function of depth in the
sample by consideration of the stopping power
and path length. In the sample annealed to 650 K,
ꢃ1 ML of Mo is present and is located predomi-
nantly in the surface layer. Following the anneal to
815 K; Mo is present in significant quantities in the
top five layers with an average composition of 10%
Mo in each layer. By 885 K (Fig. 3c), the width of
the Mo feature corresponds to ꢃ15 layers with an
average composition of 2% Mo in each layer. The
integrated sum of Mo clearly decreases with in-
creasing annealing temperature. This can either be
caused by dissolution into the bulk or desorption.
As no Mo related desorption products were ob-
served, we must conclude that the former process
is responsible for the observed decrease. The sol-
ubility of Mo in Ni at 650 °C is about 12% so this
is certainly conceivable.
3.3. Scanning tunnelling microscopy
Fig. 2a shows an STM image following four
cycles of Mo(CO)6 dosing and annealing to 650 K.
The Mo containing islands are seen to have no
sharp boundaries and gaps are observed between
the relatively amorphous islands. The line profile
presented in Fig. 2a shows that the difference in
height between the islands is ꢁ0.2 nm––a value
typical for the height of a monolayer island. Fig.
2b shows that annealing to 750 K modifies the
adlayer, giving a much flatter appearance. This
sample preparation treatment corresponds to the
formation of the (3 ꢀ 3) LEED structure. In Fig.
2c, an atomically resolved image is shown of the
surface created by annealing the Mo overlayer to
925 K. The image shows features whose spacing
is, within experimental error, exactly that of
Ni{1 1 1}.
3.4. Medium energy ion scattering
We performed a more detailed layer by layer
compositional analysis of the surface for systems
(ii) and (iii) (analysis of the composition of the
surface in system (i) is made difficult by the pos-
sibility that the overlayer has a different struc-
ture to the underlying Ni{1 1 1}). In this case, we
adopted the approach first used by Deckers et al.
[19] in the analysis of Pt50Ni50{1 1 1} and then
modified by Baddeley et al. in the analysis of
Pd50Cu50{1 1 0} [20–22]. Using the incident and
exit beam directions shown in Fig. 4, we selectively
illuminated the top, top two and top three layers of
the surface. For an fcc {1 1 1} surface there is likely
to be a much smaller contribution from ions
scattered from deeper lying layers using these
‘‘double alignment’’ geometries than was observed
for an fcc {1 1 0} surface [20–22]. Using the VEGAS
programme [23] we estimated the contribution
MEIS experiments were carried out to investi-
gate (i) the Mo overlayer; (ii) the (3 ꢀ 3) structure
and (iii) the (5 ꢀ 5) structure. These surfaces were
created by effectively depositing 1.0 ML Mo and
annealing to 650, 815 and 885 K. Fig. 3 show plots
of scattered ion intensity versus ion energy for
each surface preparation. In each experiment the
beam was first aligned along a bulk crystallo-
ꢀꢀ
graphic direction (in this case the [110] incident
geometry) then deliberately rotated by 7° to achieve
a ‘‘random’’ incident geometry. In this case, we
take advantage of the fact that ions scattered from
a given element lose energy as a function of the
depth of the target atom beneath the surface. This
enables depth profiling and hence allows the dis-
tribution of Mo in the near-surface region to be