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et al. [16] have proposed a conductive undercoating con-
sisting of Ti–Ta oxides prepared by several applications of
decomposable compounds of Ti and Ta [16] followed by
heat-treatment. Its conductivity is enhanced by several appli-
cations of a solution containing a thermally decomposable
compound of platinum followed by subsequent heat treat-
ments.
Electrochemical deposition of PbO2 often occurs in acidic
medium. In that conditions, tetragonal -PbO2 is preferably
formed, so that the term “PbO2” used in applied electro-
chemistry usually refers to the -form [16]. However, the
coating prepared in acidic medium is not sufficiently adher-
ent to the Ti substrate, except if additives such as sodium
lauryl sulphate are added to the electrolyte [21]. The second
can be deposited from an alkaline solution (for example,
sodium acetate, lead acetate and KOH). Too alkaline solu-
tions give rise to the formation of red Pb3O4 crystals on the
electrodes [22]. ␣-PbO2 has a more compact structure com-
pared to the more porous -PbO2 [23], resulting in a better
contact between the particles.
In this paper, we report a simplified procedure for prepar-
ing a Ti/Pt/PbO2 electrode, in which the underlayer in
contact with Ti and PbO2 is a compact film of platinum,
deposited by metal organic chemical vapor deposition
(MOCVD). The prepared anodes were used for oxidation
of Cr(III) in sulphuric acid. The results were compared with
those obtained with Pb/PbO2 and Ebonex®/PbO2 electrodes.
These experiments were realised in a two-compartment cell
containing an anionic membrane as a separator the current
yield was determined for the three electrode substrates with
different pH conditions.
2. Experimental
2.1. Preparation of the working electrodes
All chemicals were Prolabo Normapur grade, except
when specified hereafter. Titanium foils (Goodfellow; pu-
rity: 99.6%; area: 4 cm2) were carefully polished on abra-
sive papers Buehler-Met 600, 800 and 1200, and rinsed
with methanol in an ultrasonic cleaner.
When the procedure gives rise to a mixture of the two
each phase is not easy but one can compare, in the X-ray
diffractograms obtained with different samples, the ratio of
the peak areas ␣/(␣+) and /(␣+) [23]. Other authors
[10,24] use the procedure of Dodson [25], based on calibra-
tion spectra obtained with pure ␣ and  varieties. However,
the results cannot be very accurate since electrodeposited
PbO2 is always textured and the preferred crystallographic
ters: temperature, potential, current density. Nevertheless,
in Pb(NO3)2–HNO3 electroplating solutions, the amount of
␣-phase decreases with temperature and, at 65 ◦C, only the
-phase was detected on a Pt substrate [10], with a preferen-
tial orientation of the planes: (1 1 1). An increase of tempera-
ture is reported to favour the formation of larger crystals [10].
towards various anodic reactions, incorporation of some ions
into the oxide layer film during its formation was examined
in the literature [23,26].
Ueda et al. [16] have proposed a galvanostatic procedure
in which a stress-free intermediate ␣-PbO2 coating is pro-
duced by electrodeposition from an alkaline lead bath. It
plays the role of binder on the top of which -PbO2 can be
electrodeposited from an acid lead bath containing a suspen-
into the -PbO2 layer in order to result in a coating with
low internal stress. That procedure led to an anode material
which is reported to be superior to Pb/PbO2 or Ti/Pt with
respect to oxygen overvoltage [16]. However, the prepara-
tion mode is long, especially the formation of the undercoat-
ing; in addition, its conductivity is enhanced by a platinum
deposit but its compactness is probably not sufficient for
avoiding completely the corrosion of the Ti substrate that
may occur in acidic media.
First, a thin and compact platinum film was deposited on
one face of the foil by MOCVD. This method is based on
the oxidative decomposition of (methylcyclopentadienyl)
trimethyl platinum(IV) (Strem; purity 99%) as a precursor,
diluted in cyclohexane solvent [27]. A Trijet liquid delivery
system has been used to supply and vaporize the precursor
solution (C = 0.02 M) into the reactor. Helium carrier gas
and oxygen reactant gas were used at a pressure of 1330 Pa.
The other experimental conditions for the deposition of
platinum films were: temperature of the evaporator: 48 ◦C;
platinum deposition temperature Θ = 350 ◦C; deposition
time: τ = 4000 s. With such conditions, the thickness of
the film is about 16 nm and platinum oxide is not formed:
ESCA experiments have proved that the atomic percentage
of oxygen is less than 0.1% with those experimental condi-
tions of deposition [27]. That platinum layer was prepared
for avoiding passivation or corrosion of the Ti substrate
during all the subsequent experiments. Thus, the back
resin.
Second, an undercoating of ␣-PbO2 was electrodeposited
from an alkaline lead bath (called S1 hereafter), as reported
by other authors [16]: 3.5 M NaOH saturated with litharge
PbO (pure; Touzart & Matignon) at Θ = 40 ◦C. The pH of
S1 is >14 and the soluble Pb(II) species are HPbO2− anions.
The cyclic voltammogram performed at v = 50 mV s−1 is
presented in Fig. 1a. It shows that the PbO2 deposition be-
gins at potentials higher than 0.25 V/ECS. Thus, for our po-
tentiostatic experiments, a constant potential (0.35 V versus
SCE) was applied for 2 h. Those potentiostatic conditions
led to homogeneous lead dioxide deposits.
Thus, the top coating (-PbO2) was electrodeposited from
an acid lead bath [5], called S2, and containing 30 wt.%
Pb(NO3)2 (pH 2). That bath, kept at Θ = 65 ◦C, was