Appl. Phys. Lett., Vol. 73, No. 18, 2 November 1998
Klimov et al.
2605
tum confined systems, which should lead to a slowing down
in the energy relaxation.12 However, our recent studies13 in-
dicate the absence of a ‘‘phonon bottleneck’’ in NCs, likely
due to an enhancement of Auger-type energy transfer pro-
cesses.
riers are trapped at the surface. This shows that even in small
Si NCs (ϳ2.5 nm diameter͒, the interband transition remains
indirect, in agreement with data of absorption studies.5 The
nonlinear optical response in indirect-gap semiconductors is
dominated by free-carrier absorption due to intraband tran-
sitions. Relaxation in the wave-vector conservation leads to
the enhancement of this process in NCs, which is likely re-
sponsible for the intense PA1 signal in our samples.
In conclusion, we have performed fs TA studies of ion-
implanted Si NCs in correlation with studies of their micro-
structural and photoluminescence properties. Post-
implantation annealing leads to suppression of the defect-
related emission at ϳ1.9 eV and the development of a red
emission at ϳ1.65 eV, which is correlated with formation of
a large number of NCs. The TA spectra of annealed samples
reveal the presence of two ps PA bands attributed to carriers
in NC quantized (PA1) and NC interface (PA2) states. The
sub-10-ps NC-size-dependent decay of PA1 is indicative of
the fast depopulation of quantized states due to efficient sur-
face trapping. This observation strongly suggests that the red
emission in our samples is not due to carriers in quantized
states, but rather due to deactivation of surface traps.
The TA data indicate that PA2 is due to population of
secondary states which are optically-coupled to NC quan-
tized states. These secondary states are likely located at the
Si/SiO2 NC interface, since this would provide a nonvanish-
ing overlap with the wavefunctions of quantized states. The
fast 1.5 ps decay of PA2 can be attributed to the internal
energy relaxation of the interface states, which should be
NC-size independent, in agreement with our data. The oscil-
lations in the PA2 spectrum ͑Fig. 1͒ indicate a spacing of
800–900 cmϪ1, consistent with vibrational coupling to
Raman-active modes of Si–O with a range of terminating
atoms. A near-IR fast-relaxing PA band with molecular-like
properties was previously observed by us in nanoporous Si.14
The fast relaxation of PA1 indicates that populations of
quantized states are short-lived and decay on the ps time
scale. Since this decay does not show pump-intensity depen-
dence, it cannot be explained in terms of nonlinear recombi-
nation processes ͑such as the Auger recombination͒, and is
most likely due to efficient surface trapping, analogous to
that in II–VI NCs with incomplete surface passivation.10,13
The increase in the surface-to-volume ratio in NCs of smaller
sizes, leading to enhanced surface trapping,13 can explain the
shortening of the PA1 relaxation time in sample 1. The broad
TA spectrum, observed after the decay of PA1 and PA2
(⌬tϾ10 ps) ͑Fig. 1͒, can be attributed to surface-trapped
carriers. The observation of a fast depopulation of quantized
states strongly indicates that the red emission in our samples
is not due to recombination of carriers in quantized states,
but is rather due to surface-trapped carriers as was suggested
previously for Si NCs6 and nanoporous Si.15,16
In II–VI NCs, the dominant channel for carrier decay at
high pump densities is non-radiative Auger recombination.10
However, in our samples we did not observe any signatures
of nonlinear decay even at carrier densities of Ͼ10 e-h pairs
per NC. At the same pump fluences, in bulk-Si samples, we
observed Auger-process dominated recombination with
sub100 ps time constants. These observations provide addi-
tional evidence for the extremely fast depopulation of NC
quantized states with a rate exceeding that for the Auger
process.
In direct gap NCs, resonant optical nonlinearities are
dominated by state-filling-induced bleaching of optical
transitions.10 Si is an indirect-gap material in the bulk form.
However, confinement-induced mixing of states can lead to
an indirect-to-direct gap transformation in Si NCs.17 For NCs
studied in this work, the lowest interband transition is lo-
cated between 1.3 and 1.9 eV.17,18 Our TA data indicate that
in the range from 1.2 to 2.6 eV no bleaching is observed in
our samples even at short times after excitation, before car-
This research was supported by Los Alamos Directed
Research and Development funds, under the auspices of the
U.S. Department of Energy. Oak Ridge National Laboratory
is managed by Lockheed Martin Energy Corp. for the U.S.
Department of Energy under Contract No. DE-AC05-
96OR22464.
1 L. Canham, Appl. Phys. Lett. 57, 1046 ͑1990͒.
2 T. Shimizu-Iwayama, M. Ohshima, T. Niimi, S. Nakao, K. Saitoh, T.
Fujita, and N. Itoh, J. Phys.: Condens. Matter 5, L375 ͑1993͒.
3 D. Zhang, R. Kolbas, P. Milewski, D. Lichtenwalner, A. Kingon, and J.
Zavada, Appl. Phys. Lett. 65, 2684 ͑1994͒.
4 X. Zhao, O. Schoenfeld, J. Kusano, Y. Aoyagi, and T. Sugano, Jpn. J.
Appl. Phys., Part 2 33, L649 ͑1994͒.
5 L. Brus, P. Szajowski, W. Wilson, T. Harris, S. Schuppler, and P. Citrin,
J. Am. Chem. Soc. 117, 2915 ͑1995͒.
6 H. Song and X. Bao, Phys. Rev. B 55, 6988 ͑1997͒.
7 C. White, J. Budai, S. Withrow, J. Zhu, S. Pennycook, R. Zuhr, D. Hem-
bre, D. Henderson, R. Magruder, M. Yacaman, G. Mongragon, and S.
Prawer, Nucl. Instrum. Methods Phys. Res. B 127, 545 ͑1997͒.
8 P. Mutti, G. Ghislotti, S. Bertoni, L. Bonoldi, G. F. Cerofolini, L. Meda,
E. Grilli, and M. Guzzi, Appl. Phys. Lett. 66, 851 ͑1995͒.
9 Y. Kanemitsu and S. Okamoto, Phys. Rev. B 55, R7375 ͑1997͒.
10 V. Klimov ͑unpublished͒.
11 V. Klimov and D. McBranch, Opt. Lett. 23, 277 ͑1998͒.
12 H. Benisty, C. Sotomayor-Torres, and C. Weisbuch, Phys. Rev. B 44,
10945 ͑1991͒.
13 V. Klimov and D. McBranch, Phys. Rev. Lett. 80, 4028 ͑1998͒.
14 V. Klimov, D. McBranch, and V. Karavanskii, Phys. Rev. B 52, R16989
͑1995͒.
15 F. Koch, V. Petrova-Koch, and T. Muschik, J. Lumin. 57, 271 ͑1993͒.
16 D. Cooke, B. Bennett, E. Farnum, W. Hults, K. Sickafus, J. F. Smith, J. L.
Smith, T. Taylor, P. Tiwari, and A. Portis, Appl. Phys. Lett. 68, 1663
͑1996͒.
17 N. Hill and K. Whaley, J. Electron. Mater. 25, 269 ͑1996͒.
18 C. Delerue, G. Allan, and M. Lannoo, Phys. Rev. B 48, 11024 ͑1993͒.
128.235.251.160 On: Fri, 19 Dec 2014 12:24:16