COMMUNICATION
A novel approach to grow ZnO nanowires and nanoholes by combined
colloidal lithography and MOCVD depositionw
Maria Elena Fragala,*a Cristina Satrianob and Graziella Malandrinoa
Received (in Cambridge, UK) 16th September 2008, Accepted 21st November 2008
First published as an Advance Article on the web 24th December 2008
DOI: 10.1039/b816251d
A hybrid approach of colloidal lithography and metalorganic
chemical vapour deposition (MOCVD) has been used to fabri-
cate ZnO nanowire bundles and nanoholes by using a silver
metalorganic precursor as the growth catalyst.
simply obtained by combined use of colloidal lithography.
A silver film is deposited on two-dimensional arrays of colloi-
dal polystyrene nanospheres self-assembled by dewetting.15
The Ag(hfa)tetraglyme precursor has been dissolved in
EtOH–H2O 1 : 1 solution to obtain 0.1 M and 0.05 M
concentrations, respectively.
The synthesis and size control of multidimensional composite
materials is receiving growing attention due to potential
applications in catalysis and gas sensing.1 Metallic nanoring
and nanohole arrays are particularly attractive for their
unique optical properties, persistent currents, and multiple
magnetic states.2–4 ZnO nanostructures, especially nanowires
and nanorods, offer remarkable physical and chemical proper-
ties, with potential applications as nanoscale electronic, photo-
nic, field emission, sensing, and energy conversion devices.5,6
The common vapour transport deposition methods usually
grow ZnO nanowires on silicon, sapphire, or nitride substrates
coated with Au catalytic nanoparticles.7 Nanorods placement
can be predefined via location of metal catalyst islands or
particles.8 Au is the most used catalyst for ZnO nanowires
growth, since the use of Ag as an alternative metal has the
drawback of temperature limitation (up to 500 1C) related to
fast Ag oxidation which results in low-quality nanowires.9
Here we present an original method to grow ZnO nanowires
by using a new Ag catalyst obtained from thermal reduction of
silver(I) hexafluoroacetylacetonate tetraglyme [Ag(hfa)tetra-
glyme] metalorganic complex.10,11 This precursor has been
already successfully applied to deposit silver films, silver
nanoparticles embedded in polymeric and silica thin films or
silver nanorods through a single-step route involving its
thermal reduction to metallic silver.12–14 The main advantage
of this approach is the employment of liquid precursor solu-
tions that can be easily deposited by spin coating on any type
of substrate as films. Moreover, no Ag2O formation is detected
after the ZnO deposition by MOCVD performed at reduced
pressure in an Ar–O2 atmosphere and temperatures up to
700 1C. The fabrication of a nanostructured ZnO layer is
Two types of substrates have been prepared by spin coating
of an Ag precursor solution, respectively on (1) quartz sub-
strates (homogeneous Ag film, h-Ag) and (2) PS monolayers
transferred on quartz substrates (nanostructured Ag film,
ns-Ag). The preparation of a PS monolayer by dewetting
driven self-assembly is described elsewhere.15 After spin
coating, the samples have been thermally treated for 30 min
in a MOCVD hot wall tubular reactor, under an Ar flow
(100 sccm, P = 1 Torr) at T = 150 1C. XRD analysis
performed after thermal treatment (not shown here) confirms
the presence of metallic silver (111 preferentially oriented) on
both substrates. AFM analysis reveals that Ag precursor
solution fully incorporates the PS monolayer array with the
formation of very tiny nanoneedle grains, while the layer
deposited on quartz exhibits a regular distribution of large
grains (height = 60 Æ 40 nm, diameter = 94 Æ 27 nm)
(see Fig. S1 ESIw). Fig. 1 shows the AFM images of ns-Ag
films obtained after the PS colloidal mask removal, for the two
concentrations of investigated precursor solution. The ns-Ag
layer deposited from 0.1 M solution exhibits a dual grain size
distribution, which consists of circular patterns of large grains
(height = 3.8 Æ 1 nm, diameter = 114 Æ 10 nm) and tiny
nanoneedles (height = 1.4 Æ 0.3 nm, diameter = 12.5 Æ
1.3 nm) in the centre, corresponding to the PS sphere masked
area. On the other hand, the ns-Ag layer deposited from
a Department of Chemical Sciences of Catania University and INSTM
UdR Catania, Viale Andrea Doria 6, 95125 Catania, Italy.
E-mail: me.fragala@unict.it; E-mail: gmalandrino@dipchi.unict.it;
Fax: +39 095 580138; Tel: +39 095 7385055
b Laboratory for Molecular Surfaces and Nanotechnology
(LAMSUN) at Department of Chemical Sciences of Catania
University and CSGI, Viale Andrea Doria 6, 95125 Catania, Italy.
E-mail: csatriano@unict.it; Fax: +39 095 580138;
Tel: +39 095 7385136
w Electronic supplementary information (ESI) available: (1) Lengthy
experimental details; (2) AFM images of dense PS monolayer array,
Ag precursor-coated PS monolayer, Ag precursor-coated quartz;
(3) EDX spectra of ZnO nanowires grown on different Ag films;
(4) XRD patterns of ZnO nanowires grown on different Ag films. See
DOI: 10.1039/b816251d
Fig. 1 AFM images and section analysis of Ag nanostructures from
0.1 M (upper panels) and 0.05 M (lower panels) precursor solutions.
(1 Â 1) mm2 scan area.
ꢀc
This journal is The Royal Society of Chemistry 2009
Chem. Commun., 2009, 839–841 | 839