Photolithographically patterned silver nanowire electrodeposition

Article abstract of DOI:10.1016/j.electacta.2010.02.075

We report the fabrication of silver nanowires using lithographically patterned nanowire electrodeposition (LPNE). The LPNE synthesis of silver nanowires proceeds by lithographically patterning, and then etching an evaporated nickel film to produce a nickel nanoband 20-80 nm in height. This nanoband, which traces the perimeter of the exposed region, is recessed by ≈500 nm into the photoresist producing a horizontal trench. A silver nanowire, of controlled height and width, is formed within this trench by electrodepositing silver from either of two aqueous solutions at the nickel nanoband. Silver nanowires with controlled widths ranging from 100 to 400 nm were obtained and the height of silver nanowires was independently controllable over the range from 20 to 80 nm. The LPNE process is wafer-scale and continuous silver nanowires millimeters in length are readily obtained. Data for the characterization of these nanowires using AFM, TEM, and XRD is presented.