2
H. Zhou et al. / Journal of Alloys and Compounds 597 (2014) 1–7
Fig. 1. Schematic illustration for the fabrication process of three-dimensional (3D) nanoporous H-TiO2 network film.
hydrogen atmosphere [34–36]. Although the above investigations
have been conducted, the controllable fabrication of 3D nanopor-
ous TiO2 films with prominent electrochemical capacitance proper-
ties still remains a great challenge.
In this investigation, we report a novel strategy for the fabrica-
tion of a 3D nanoporous hydrogenated TiO2 network film on tita-
nium substrate, as illustrated in Fig. 1. Attractively, it is found
that the 3D nanoporous network consists of thin TiO2 nanotubes.
The fabrication mainly includes dealloying, alkali reflux and
annealing in hydrogen-containing atmosphere (hydrogenation). It
is demonstrated that the as-prepared 3D nanoporous TiO2 network
film exhibits large specific capacitance, excellent rate capability
and high electrochemical-cycling stability. The reasons that the
3D nanoporous TiO2 network film shows prominent electrochemi-
cal capacitance performance are discussed in detail.
2. Experimental
Fig. 2. XRD patterns of the annealed alloy film (a), dealloying film (b) and final
product films annealed in air (c) and the hydrogen-containing argon (d). Symbols A
and R represent anatase and rutile phases (JCPDS card no. 71-1166 and 89-6975),
respectively.
2.1. Electrode preparation
The porous Ti film was first fabricated by a dealloying method. A zinc film was
prepared by a cathodic electrodeposition in the electrolyte solution containing
0.6 M ZnSO4, 0.1 M (NH4)2SO4 and 10 mM sodium dodecyl sulfate (SDS) at room
temperature. A titanium foil (99.5%, 1.0 cm ꢁ 2.0 cm ꢁ 0.25 mm, Alfa Aesar) was
assembled as the working electrode. Prior to deposition, the titanium foil was pol-
ished with 2000# grit waterproof abrasive paper, and ultrasonically cleaned in ace-
tone and deionized water for 10 min, respectively. The deposition was conducted in
a two-electrode cell with a platinum counter electrode at a constant current density
of 10 mA cmꢀ2 for 30 min. After rinsed extensively with deionized water and dried
in a nitrogen stream, the titanium foil with the electrodeposited zinc layer was an-
nealed at 150 °C for 2 h in an Ar-filled tube furnace. The selective dissolution of zinc
from the annealed film was carried out in 1 M KOH solution at 60 °C for 10 h. The
obtained porous Ti film was refluxed in a three-necked flask with 6 M KOH solution
at 110 °C for 12 h. After the refluxing, the sample was washed in deionized water
and immersed in 0.5 M hydrochloric acid for 12 h. After rinsed with deionized
I ꢂ
Dt
V ꢂ S
C0 ¼
ð2Þ
D
where S (cm2) is the geometric area of the working electrode,
tential scan rate,
current on CV curves, I (A) is the applied current, and
v
(mV sꢀ1) is the po-
V (V) is the sweep potential window, I(V) (A) is the voltammetric
D
Dt (s) is the discharge time.
3. Results and discussion
Fig. 2 illustrates the XRD patterns of various films. As shown in
Fig. 2a, the annealed alloy film consists of a mass of zinc (JCPDS
card no. 65-3358) and a small quantity of titanium (JCPDS card
no. 44-1294). The mutual diffusion of Zn and Ti during the heat
treatment results in the formation of Zn–Ti alloy surface film,
which is similar to the formation process of Zn–Ni alloy film
[37]. The XRD pattern of the dealloying film in Fig. 2b shows that
the XRD peaks of zinc disappear and the XRD peaks of Ti appear,
indicating that the porous Ti film is obtained through the selective
etching of zinc from the annealed film in the alkaline solution [37].
The EDX result in Fig. 3 reveals that a large amount of Ti and a
small quantity of oxygen exist in the dealloying film, suggesting
that titanium is covered with a thin oxide layer. As shown in
water and dried in
a nitrogen stream, the resulting sample was annealed at
630 °C in air and the 20% hydrogen-containing argon for 2 h, respectively. In the fol-
lowing discussions, the samples annealed in air and the 20% hydrogen-containing
argon were designated as air-TiO2 and H-TiO2, respectively.
2.2. Physical characterization
The X-ray diffraction (XRD) patterns of film electrodes were recorded using a
Rigaku D/Max 2550 X-ray diffractometer with Cu
Ka radiation at 40 kV and
300 mA. The X-ray photoelectron spectroscopy (XPS) analysis of film electrodes
was performed by a PHI 5000C X-ray physical electronics photoelectron spectrom-
eter with Mg Ka radiation at 15 kV and 500 W. The morphologies and microstruc-
tures of various film electrodes were observed with scanning electron microscopy
(SEM, SIRION-100, FEI Co. Ltd.) and transmission electron microscopy (TEM/HRTEM,
JEM-2010, JEOL), respectively. The surface composition of the Ti film was analyzed
by energy dispersive X-ray (EDX) spectroscopy (GENE IS 4000).
2.3. Electrochemical measurements
Electrochemical measurements were performed at room temperature in a typ-
ical three-electrode glass cell with a platinum counter electrode and a Ag/AgCl ref-
erence electrode. Various film electrodes were used as the working electrode. 0.5 M
Na2SO4 aqueous solution was employed as electrolyte. Cyclic voltammetry (CV) was
measured at various scan rates using a potentiostat (CHI 660C). Electrochemical
impedance spectroscopy (EIS) measurements were carried out by an electrochem-
ical analyzer (Parstat 2273), with the frequency range of 100 kHz to 0.01 Hz and a.c.
signal amplitude of 5 mV. Galvanostatic charge/discharge tests were performed at
various current densities by a potentiostat (Arbin BT-2000, USA).
The average specific capacitance (C, F cmꢀ2) from the CV curves is calculated
according to the following integral equation (1). The average specific capacitance
(C0, F cmꢀ2) from the charge/discharge curves can be calculated in terms of Eq.
(2) [28].
Z
1
C ¼
I
dV
ð1Þ
ðVÞ
v
ꢂ DV ꢂ S
Fig. 3. EDX analysis of the dealloying film.