Electrochemical deposition of Pd, Ti, and Ge for applications in GaAs technology

DOI: 10.1149/1.1836604

Source and publish data:

Journal of the Electrochemical Society p. L73-L75 (1996)

Update date:2022-08-28

Topics:

Authors:

Schuessler

Statzner

Lin Lin

Krozer Krozer

Horn Horn

Hartnagel

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Article abstract of DOI:10.1149/1.1836604

The electrolytic deposition of Pd, Ti, and Ge is demonstrated. A process for depositing smooth surfaces of layers from 10 to 100 nm and thicker is described. Applications of this technology for Schottky and ohmic contacts are shown and the advantages to similar evaporated metallization schemes are listed.

Full text of DOI:10.1149/1.1836604

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