Full text of DOI:10.1063/1.97168

Electron beam stimulated chemical vapor deposition of patterned tungsten films on
Si(100)
R. B. Jackman and J. S. Foord
Citation: Applied Physics Letters 49, 196 (1986); doi: 10.1063/1.97168
View online: http://dx.doi.org/10.1063/1.97168
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/49/4?ver=pdfcov
Published by the AIP Publishing
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP: 129.22.67.7
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP: 129.22.67.7
On: Tue, 02 Dec 2014 04:33:04

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP: 129.22.67.7
On: Tue, 02 Dec 2014 04:33:04

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP: 129.22.67.7
On: Tue, 02 Dec 2014 04:33:04