COMMUNICATION
pubs.acs.org/JACS
Large-Area Graphene Single Crystals Grown by Low-Pressure
Chemical Vapor Deposition of Methane on Copper
Xuesong Li,† Carl W. Magnuson,† Archana Venugopal,‡ Rudolf M. Tromp,§ James B. Hannon,§
Eric M. Vogel,‡ Luigi Colombo,*,|| and Rodney S. Ruoff*,†
†Department of Mechanical Engineering and the Texas Materials Institute, The University of Texas at Austin,
1 University Station C2200, Austin, Texas 78712-0292, United States
‡Department of Electrical Engineering, The University of Texas at Dallas, Richardson, Texas 75080, United States
§IBM T. J. Watson Research Center, Yorktown Heights, New York 10598, United States
Texas Instruments, 13121 TI Boulevard, Dallas, Texas 75243, United States
25 μm thick copper foil and then crimping the three remaining
ABSTRACT: Graphene single crystals with dimensions of
up to 0.5 mm on a side were grown by low-pressure chemical
vapor deposition in copper-foil enclosures using methane as
a precursor. Low-energy electron microscopy analysis
showed that the large graphene domains had a single
crystallographic orientation, with an occasional domain
having two orientations. Raman spectroscopy revealed the
graphene single crystals to be uniform monolayers with a
low D-band intensity. The electron mobility of graphene
films extracted from field-effect transistor measurements
was found to be higher than 4000 cm2 V-1 s-1 at room
temperature.
sides. The basic growth conditions were similar to those pre-
viously reported2,3 but employed slightly lower methane flow
rates and partial pressures (less than 1 sccm and 50 mTorr,
respectively). Graphene grew on both the inside and outside of
the Cu enclosure. The graphene growth on the outside showed
behavior similar to the graphene growth reported by Li et al.,3 but
there was one difference: at the lower partial pressure and flow
rate and at much longer growth times, a higher density of bilayers
and trilayers was observed. This will be reported in future work.
In contrast, the growth on the inside showed a much lower
density of nuclei followed by very large domain growth after
extended periods of time (>1 h) and a much lower density of
adlayers. At this time, the precise growth conditions inside the
enclosure are not well understood. However, we believe that the
low density of nuclei is due to the much lower partial pressure of
methane and an “improved” environment during growth; that is,
the Cu vapor is in static equilibrium, and there is potentially a
much lower pressure of unwanted species in our non-ultrahigh
vacuum system. Figure 2 shows the average domain branch
length (about half the domain size from the center of the
domain) as a function of growth time for two methane flow
rates, 0.5 and 1.3 sccm, which correspond to methane partial
pressure of 8 and 21 mTorr, respectively. During the growth
process, the hydrogen flow rate was kept constant at 2 sccm with
a partial pressure of 27 mTorr, and the chamber background
pressure was 17 mTorr. The graphene domains were very large,
as shown by scanning electron microscope (SEM) images
(Figure 3a). The domains also tended to have high “edge
roughness”. The shape of the graphene nuclei in the initial stages
of growth showed a hexagonal symmetry (Figure 3b). At first, the
graphene domains grew as six-sided polygons, and these even-
tually grew into very large graphene domains with growing edges
resembling dendrites (Figure 3c).
raphene growth by chemical vapor deposition (CVD) has
G
been receiving significant attention recently because of the
ease with which large-area films can be grown, but the growth of
large-domain or large-grain-size single crystals has not been
reported to date.1 In our earlier work, we found that growth of
graphene on Cu by CVD occurs predominantly by surface
nucleation followed by a two-dimensional growth process, but
the domain size was limited to a few tens of micrometers.2,3 The
presence of domain boundaries has been found to be detrimental
to the transport properties; the precise mechanism of the degrada-
tion still remains elusive, but what is known is that structural
defects promote surface reactions with adsorbates from the
ambient or with deposited dielectrics.3 The presence of heptagons
and pentagons in the network of hexagons has been observed
experimentally, and first-principles quantum-transport calculations
have predicted that the periodicity-breaking disorder can adversely
affect transport properties.4,5 Any of these defects can give rise to
higher surface chemical activity that would further disrupt the sp2-
bonding nature of graphene and thus impact graphene’s funda-
mental properties. Therefore, it is imperative that large single
crystals of graphene be grown to minimize the presence of defects
arising from boundaries between misoriented domains. In this
communication, we report a very low pressure CVD process that
yields graphene with domains of up to 0.5 mm in size, which is a
factor of ∼30 times larger than previously reported.3
We also employed the carbon isotope-labeling technique to
delineate the graphene growth front in order to establish the
boundaries between the growing “lobes”, the time dependence,
and the spatial dependence.2 In these experiments, the graphene
films were grown by alternating the flow of 12CH4 and 13CH4
every 10 min for a total of 90 min at a flow rate of 0.5 sccm and a
corresponding partial pressure of 8 mTorr at 1035 °C. An
The large-domain graphene growth was observed on the inside
of a copper-foil enclosure at high temperature (∼1035 °C). The
copper-foil enclosure (Figure 1a) was formed by bending a
Received: November 1, 2010
Published: February 10, 2011
r
2011 American Chemical Society
2816
dx.doi.org/10.1021/ja109793s J. Am. Chem. Soc. 2011, 133, 2816–2819
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