Photosimulated Reactions at the Surface of ZrO2 and TiO2
J. Phys. Chem. B, Vol. 102, No. 52, 1998 10915
Conclusions
latter case, S+ can be treated as any localized hole surface state
provided that it can recombine with free electrons (see below).
The distinguishing feature of oxygen photoadsorption kinetics,
dp/dt ≈ pnFm, on ZrO2 resides in the dependence of the order
of the reaction on photon flow Fm and in the dependence of the
order of reaction on oxygen pressure pn. Consideration of the
photon-flow-dependent pathways of the decay of photoinduced
surface centers, e.g., their recombination with photoholes,
affords a description of the kinetics of oxygen photoadsorption
on ZrO2. The photoadsorption mechanism proposed can also
be expanded to photocatalyzed oxidative reactions of phenol
in irradiated aqueous TiO2 dispersions.
•
Instead of trapped S+ or free holes, surface-adsorbed OH
radicals have also been taken as the oxidants in the version of
photocatalytic oxidation of organic substrates over irradiated
TiO2 particulates.18,24,47,51 These •OH radicals are generated by
hole capture by surface OH- species (or by adsorbed water):
s
OH-s + h f •OHs
(24)
The PhA mechanism treated earlier (see above) can easily
be adopted to these heterogeneous photocatalytic oxidations.
Indeed, stages 1 and 2 retain their validity. Stages 3a and 3b
are retained for common occurrence. (In addition, from a kinetic
point of view, stage 3a can represent the scavenging of electrons
by oxygen.) Stage 4 may be replaced by reaction 25:
Acknowledgment. Our research in Montreal was generously
supported by the Natural Sciences and Engineering Research
Council of Canada (NSERC,Ottawa). A.V.E. thanks NSERC
for a NATO Science Fellowship (1997, 1998). We also thank
Prof. D. Ollis of North Carolina State University for a preprint
of ref 20.
S + h f S+
(25)
References and Notes
where S is any surface hole trap including OH-s and S+ is either
a hole center (e.g., of the O-•s -type) or an •OHs radical. Stage
6 in the PhA mechanism is replaced by reactions 22, 23, or 24.
It is clear that expressions similar to eq 13 and others can be
obtained for the rate of oxidation of RH substrates over an
irradiated photocatalyst if the recombination decay of active
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•
centers (S+) or of OHs radicals is considered
S+ + e f S
(26)
(27)
•OHs + e f OH-
s
Note that the expressions for the photocatalytic reaction rate
r(F,C) will coincide with the corresponding r(F,p) if the
subscripts for electrons and holes in eq 13 are interchanged. In
reactions 26 and 27 e denotes free photoelectrons whose
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Results of preliminary studies on the rate of photooxidation
of phenol r(F,C) over TiO2 in aqueous solutions accord with
the reaction mechanism outlined above. It is clear that the r(F)
dependencies for phenol photooxidation over TiO2 are similar
to those for initial rates r(F) of the PhA of O2 on ZrO2 (compare,
e.g., curves 1 and 2 in Figure 9 and curves 1 and 5 in Figure
4). The mechanism proposed will be clarified during further
detailed studies of the photooxidation of phenol in solutions
over titania. In a preliminary and complementary study of
hydrogen photoadsorption on Degussa P-25 TiO2 particulates,
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F ) 0.1Fo the dependence is significantly sublinear (compare,
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of these studies shall be reported elsewhere.
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