
Journal of Organometallic Chemistry p. 335 - 340 (1987)
Update date:2022-08-11
Topics:
Hawari, J. A.
Griller, D.
Weber, W. P.
Gaspar, P. P.
The self-reaction of the pentamethyldisilyl radical was investigated, in solution, at 298 deg K.Products due to the disproportionation and combination of these radicals were detected in a ratio =0.48.However, there was no evidence for silylene formation.These results suggest that silylenes, which are formed during polysilane photolysis, are not produced from the self-reaction of polysilyl radicals but must be photo-extruded from the polysilane itself.
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