55214-86-3Relevant articles and documents
CONFORMATIONAL CONSEQUENCES OF INTRAMOLECULAR HYDROGEN BONDING BY OH TO THE DIRECTIONAL LONE-PAIR OF SULFUR IN DERIVATIVES OF METHYL PHENYL SULFIDE, DIPHENYL SULFIDE, AND DIPHENYL DISULFIDE
Schaefer, Ted,Salman, Salman R.,Wildman, Timothy A.,Clark, Peter D.
, p. 342 - 348 (1982)
Complete spectral parameters for the 1H nmr spectra of 2-hydroxyphenyl methyl sulfide, 2, 2-hydroxyphenyl phenyl sulfide, 3, bis(2-hydroxy-3-tert-butyl-5-methylphenyl) sulfide, 4, and bis(2-hydroxyphenyl)disulfide, 5, are reported for CCl4 solu
Achieving Nickel Catalyzed C-S Cross-Coupling under Mild Conditions Using Metal-Ligand Cooperativity
Sikari, Rina,Sinha, Suman,Das, Siuli,Saha, Anannya,Chakraborty, Gargi,Mondal, Rakesh,Paul, Nanda D.
, p. 4072 - 4085 (2019/04/01)
A simple and efficient approach of C-S cross-coupling of a wide variety of (hetero)aryl thiols and (hetero)aryl halides under mild conditions, mostly at room temperature, catalyzed by well-defined singlet diradical Ni(II) catalysts bearing redox noninnocent ligands is reported. Taking advantage of ligand centered redox events, the high-energetic Ni(0)/Ni(II) or Ni(I)/Ni(III) redox steps were avoided in the catalytic cycle. The cooperative participation of both nickel and the coordinated ligands during oxidative addition/reductive elimination steps allowed us to perform the catalytic reactions under mild conditions.
SULFONIUM COMPOUND, RESIST COMPOSITION, AND PATTERN FORMING PROCESS
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Paragraph 0172-0173, (2018/04/20)
A sulfonium compound having formula (1) is provided wherein R1, R2 and R3 are a C1-C20 monovalent hydrocarbon group which may contain a heteroatom, p=0-5, q=0-5, and r=0-4. A resist composition comprising the sulfonium compound is processed by lithography to form a resist pattern with improved LWR and pattern collapse.
