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TRIPHENYLSULFONIUM TRIFLUOROMETHANESULFONATE, also known as TPS-tf, is a chemical compound that possesses unique properties and potential applications in various fields. It is characterized by its ability to act as a photoacid generator, which allows it to facilitate the formation of nanoporous structures and contribute to the development of advanced materials and devices.

66003-78-9

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66003-78-9 Usage

Uses

Used in Sensor Applications:
TRIPHENYLSULFONIUM TRIFLUOROMETHANESULFONATE is used as a photoacid generator for the preparation of a bilayer system-based nanoporous template. This template can be potentially utilized in sensor applications, where the nanoporous structure can enhance the sensitivity and selectivity of the sensors.
Used in Organic Light Emitting Diodes (OLEDs) Industry:
TRIPHENYLSULFONIUM TRIFLUOROMETHANESULFONATE is used as a component in the fabrication of organic light-emitting diodes (OLEDs). It is blended with polyfluorene-co-benzothiadiazole to create a material that exhibits improved performance characteristics, such as enhanced brightness, efficiency, and stability. This blend can be employed in the development of next-generation OLEDs for various applications, including displays, lighting, and communication devices.

Check Digit Verification of cas no

The CAS Registry Mumber 66003-78-9 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 6,6,0,0 and 3 respectively; the second part has 2 digits, 7 and 8 respectively.
Calculate Digit Verification of CAS Registry Number 66003-78:
(7*6)+(6*6)+(5*0)+(4*0)+(3*3)+(2*7)+(1*8)=109
109 % 10 = 9
So 66003-78-9 is a valid CAS Registry Number.
InChI:InChI=1/C18H15S.CHF3O3S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;2-1(3,4)8(5,6)7/h1-15H;(H,5,6,7)/q+1;/p-1

66003-78-9 Well-known Company Product Price

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  • Aldrich

  • (526940)  Triphenylsulfoniumtriflate  

  • 66003-78-9

  • 526940-1G

  • 1,239.03CNY

  • Detail
  • Aldrich

  • (526940)  Triphenylsulfoniumtriflate  

  • 66003-78-9

  • 526940-5G

  • 3,804.84CNY

  • Detail

66003-78-9SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 14, 2017

Revision Date: Aug 14, 2017

1.Identification

1.1 GHS Product identifier

Product name trifluoromethanesulfonate,triphenylsulfanium

1.2 Other means of identification

Product number -
Other names triphenylsulfonium triflate

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:66003-78-9 SDS

66003-78-9Relevant academic research and scientific papers

Oxidative C-H Homocoupling of Push-Pull Benzothiazoles: An Atom-Economical Route to Highly Emissive Quadrupolar Arylamine-Functionalized 2,2′-Bibenzothiazoles with Enhanced Two-Photon Absorption

Fakis, Mihalis,Georgiou, Dimitris,Gyepes, Róbert,Hrobárik, Peter,Nociarová, Jela,Osusky, Patrik,Polyzos, Ioannis,Smolí?ek, Maro?

supporting information, p. 5512 - 5517 (2021/07/31)

Copper(II)-catalyzed C-H/C-H coupling of dipolar 2-H-benzothiazoles end-capped with triphenylamine moieties affords highly fluorescent 2,2′-bibenzothiazoles with quadrupolar (D-π-A-π-D) architecture displaying large two-photon absorption (TPA) cross sections (543-1252 GM) in the near-infrared region. The notably higher TPA performance as compared to quadrupolar π-systems with a widely used 2,2′-bipyridine core, along with the ease of the synthesis and chelating N^N ability, makes the title biheteroaryl platform an attractive building block for a large scope of functional dyes exploiting nonlinear optical phenomena.

Photoacid generator for 193 nm immersion lithography and intermediate thereof

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Paragraph 0101; 0109; 0112-0113; 0132-0134, (2021/11/27)

The invention discloses a photoacid generator for 193 nm immersed lithography and an intermediate thereof. The photoacid generator of the present invention is shown in Formula I. The photoresist containing the photoacid generator of the present invention has a high resolution. The method has the advantages of high sensitivity and low line width roughness, and has a good application prospect.

Switchable Synthesis of Aryl Sulfones and Sulfoxides through Solvent-Promoted Oxidation of Sulfides with O2/Air

Cheng, Zhen,Sun, Pengchao,Tang, Ailing,Jin, Weiwei,Liu, Chenjiang

, p. 8925 - 8929 (2019/11/14)

A practical and switchable method for the synthesis of aryl sulfones and sulfoxides via sulfide oxidation was developed. The chemoselectivities of products were simply controlled by reaction temperature using O2/air as the terminal oxidant and oxygen source. The broad substrate scope, easy realization of gram-scale production, and the simplification of a sulfide oxidation system render the strategy attractive and valuable.

Method for preparing triaryl onium sulfate through arylation of diaryl thioether

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Paragraph 0025-0050, (2019/01/23)

The invention discloses a method for preparing triaryl onium sulfate through arylation of diaryl thioether. The method specifically comprises the step that in the presence of a fluorine-containing accelerant, diaryl thioether reacts with an aryne precursor in a solvent to synthesize triaryl onium sulfate. Raw materials adopted by the method are cheap and easy to obtain, and the defects of a traditional method that alkalinity is too high, the requirement for the reaction condition is strict, and reaction substrates are limited are overcome. The method has the advantages that the reaction condition is mild, the applicable range of the substrates is wide, the selectivity is good, the yield is high, the product is easy to separate, and the operation is convenient.

Salt, the composition and production of resist pattern

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Paragraph 0198, (2018/03/23)

PROBLEM TO BE SOLVED: To provide a salt to be used for a resist composition that allows production of a resist pattern with good line edge roughness.SOLUTION: The salt is expressed by the formula (I). In the formula, Qand Qrepresent a fluorine atom or a perfluoroalkyl group having 1 to 6 carbon atoms; Lrepresents a divalent saturated hydrocarbon group having 1 to 20 carbon atoms; Yrepresents a group expressed by the formula (Iy); R' represents a hydrogen atom, an alkyl group having 1 to 6 carbon atoms which may have a fluorine atom, or a hydroxyl group; X' represents a single bond, -O-, *-CO-O-, or the like; Ar represents a phenylene group; Rand Rrepresent an aliphatic hydrocarbon group having 1 to 10 carbon atoms which may have a substituent, an alicyclic hydrocarbon group having 4 to 36 carbon atoms which may have a substituent, an aromatic hydrocarbon group having 6 to 36 carbon atoms which may have a substituent, or a heterocyclic group having 6 to 36 carbon atoms which may have a substituent; and Lrepresents a divalent hydrocarbon group having 1 to 36 carbon atoms which may have a substituent.

Mild synthesis of triarylsulfonium salts with arynes

Zhang, Lei,Li, Xiaojin,Sun, Yan,Zhao, Weizhao,Luo, Fan,Huang, Xin,Lin, Lihui,Yang, Ying,Peng, Bo

supporting information, p. 7181 - 7189 (2017/09/07)

Reactions between arynes and alkyl sulfides have been extensively studied over the past few decades. These reactions commonly end with a dealkylation process and thus deliver thioethers as final products. In contrast, the transformation described furnishes valuable triarylsulfonium salts, in lieu of thioethers, from arynes and diarylsulfides. The reaction features mild conditions and a broad substrate scope. A suite of functional groups such as ketones, esters, nitriles, aryl ethers and aryl halides is tolerated, which can be issues faced by traditional synthetic methods. The practicality of the reaction and its extension to the synthesis of triphenyl selenonium salt are also exhibited herein.

Sonogashira reaction using arylsulfonium salts as cross-coupling partners

Tian, Ze-Yu,Wang, Shi-Meng,Jia, Su-Jiao,Song, Hai-Xia,Zhang, Cheng-Pan

supporting information, p. 5454 - 5457 (2017/11/06)

Triarylsulfonium, alkyl- and fluoroalkyl(diaryl)-sulfonium, and aryl(dialkyl)sulfonium triflates are successfully used as a new family of cross-coupling participants in the Sonogashira reaction as aryldiazonium, diaryliodonium, and tetraphenylphosphonium salts. It was found that terminal alkynes reacted mildly with triarylsulfonium or (2,2,2-trifluoroethyl)diphenylsulfonium triflate at room temperature under Pdand Cu-cocatalysis to give the corresponding arylalkynes in up to >99% yield. This protocol represents the first use of arylsulfonium salts as cross-coupling partners in the Pd/Cu-catalyzed Sonogashira reaction.

Arylation of diorganochalcogen compounds with diaryliodonium triflates: Metal catalysts are unnecessary

Racicot, Lanne,Kasahara, Takahito,Ciufolini, Marco A.

supporting information, p. 6382 - 6385 (2015/02/19)

Diaryliodonium triflates transfer an aryl group to the chalcogen atom of organic sulfides, selenides, and tellurides (but not ethers), in the absence of transition-metal catalyst, simply upon heating in chloroform or dichloroethane solution.

Radiation-sensitive resin composition and radiation-sensitive acid generating agent

-

, (2015/01/16)

A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. A represents —CO— or —CH2—. R1 represents a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms, or a combination of a first group and a second group. The first group is —CO—, —COO—, —OCO—, —O—CO—O—, —NHCO—, —CONH—, —NH—CO—O—, —O—CO—NH—, —NH—, —S—, —SO—, —SO2—, —SO2—O— or a combination thereof, and the second group is a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms or a combination thereof. A part or all of hydrogen atoms included in the hydrocarbon group and the heterocyclic group are not substituted or substituted. M+ represents a monovalent cation.

A photo Lewis acid generator (PhLAG): Controlled photorelease of B(C 6F5)3

Khalimon, Andrey Y.,Piers, Warren E.,Blackwell, James M.,Michalak, David J.,Parvez, Masood

, p. 9601 - 9604 (2012/07/14)

A molecule that releases the strong organometallic Lewis acid B(C 6F5)3 upon irradiation with 254 nm light has been developed. This photo Lewis acid generator (PhLAG) now enables the photocontrolled initiation of several reactions catalyzed by this important Lewis acid. Herein is described the synthesis of the triphenylsulfonium salt of a carbamato borate based on a carbazole function, its establishment as a PhLAG, and the application of the photorelease of B(C6F5) 3 to the fabrication of thin films of a polysiloxane material.

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