4270-70-6

Basic information

• Product Name: Triphenylsulfonium chloride
• Synonyms: ’triphenylsulfoniumchloride’solution;Sulfonium,triphenyl-,chloride;triphenyl-sulfoniuchloride;triphenylsulfurchloride;TRIPHENYLSULFONIUM CHLORIDE;triphenylsulphonium chloride;triphenylsulfonium ion;Triphenylsulfoniumchlorid
• CAS NO: 4270-70-6
• Molecular Formula: C₁₈H₁₅S*Cl
• Molecular Weight: 298.83
• EINECS: 224-259-6
• Mol File: 4270-70-6.mol
• Article Data: 28

Chemical Properties

• Melting Point: 277 °C
• Appearance: /
• Storage Temp.: under inert gas (nitrogen or Argon) at 2-8°C
• Water Solubility: Soluble in water.
• CAS DataBase Reference: Triphenylsulfonium chloride(CAS DataBase Reference)
• NIST Chemistry Reference: Triphenylsulfonium chloride(4270-70-6)
• EPA Substance Registry System: Triphenylsulfonium chloride(4270-70-6)

Safety Data

• Hazard Codes: Xi
• Statements: 36/37/38
• Safety Statements: 26
• WGK Germany: 3
• Hazardous Substances Data: 4270-70-6(Hazardous Substances Data)

Usage

Uses

Triphenylsulfonium chloride is used as a key intermediate that is widely used in the new electronic chemicals such as semiconductor, LCD and TFT. It is also used as a photoacid generator (PAG) in Catalyst activation through in situ photogeneration of ligands.

Preparation

Triphenylsulfonium Chloride Synthesis: Diphenyl sulfoxide, 40 g (0.2 mole), was dissolved in 400 g of dichloroethane, which was stirred under ice cooling. At a temperature below 20° C., 65 g (0.6 mole) of trimethylsilyl chloride was added dropwise to the solution, which was aged for 30 minutes at the temperature. Then, a Grignard reagent which had been prepared from 14.6 g (0.6 mole) of metallic magnesium, 67.5 g (0.6 mole) of chlorobenzene and 168 g of tetrahydrofuran (THF) was added dropwise at a temperature below 20° C. The reaction solution was aged for one hour, after which 50 g of water at a temperature below 20° C. was added to quench the reaction. To this solution, 150 g of water, 10 g of 12N hydrochloric acid, and 200 g of diethyl ether were further added.The water layer was separated and washed with 100 g of diethyl ether, yielding an aqueous solution of triphenylsulfonium chloride. The compound in aqueous solution form was used in the subsequent reaction without further isolation.

InChI:InChI=1/C18H15Cl.H2S/c1-4-10-16(11-5-1)19(17-12-6-2-7-13-17)18-14-8-3-9-15-18;/h1-15H;1H2/p+1

Upstream product

• 945-51-7 1,1'-sulfinylbisbenzene 
• 71-43-2 benzene 
• 100-42-5 styrene 
• 191402-10-5 triphenyl-λ⁶-sulfanenitrile 
• 955-83-9 2,5-diphenylfuran 
• 100-59-4 phenylmagnesium chloride 
• 108-90-7 chlorobenzene 
• 100-58-3 phenylmagnesium bromide 
• 104-15-4 toluene-4-sulfonic acid 
• 98-89-5 Cyclohexanecarboxylic acid 
• 513-81-5 2,3-dimethyl-buta-1,3-diene 
• 766-90-5 cis-1-phenyl-1-propylene 
• 873-66-5 1-propenylbenzene 

Downstream Products

• 3138-53-2 triphenyl sulfonium ; dichloro bromide 
• 942619-42-3 C₂HF₂O₅S^(1-)*C₁₈H₁₅S⁽¹⁺⁾ 
• 1240248-58-1 triphenylsulfonium 2-(adamantane-1-carbonyloxy)-3,3,3-trifluoro-2-trifluoromethylpropane-1-sulfonate 

Relevant articles and documents

Synthesis of silicate zeolite analogues using organic sulfonium compounds as structure-directing agents

A microporous crystalline silica zeolite of the MEL structure type and three other zeolite analogues composed of germanosilicate frameworks were synthesized using tributylsulfonium, triphenylsulfonium, or tri(para-tolyl)sulfonium as the structure-directing agent. The germanosilicates thus obtained had ISV, ITT, or a new zeolite structure depending on the synthesis conditions. The structure of the new germanosilicate was solved using X-ray powder diffraction data with the aid of a charge-flipping method. The solution indicated a crystal structure belonging to the P63/mmc space group with cell parameters of a=16.2003 ? and c=21.8579 ?. After calcination, the new germanosilicate material exhibited two types of accessible micropores with diameters of 0.61 and 0.78 nm. A zeolite with MEL structure and three other germanosilicate zeolites were synthesized using organic sulfonium compounds as structure-directing agents. Depending on the synthesis conditions, the germanosilicates had ISV, ITT, or a new zeolite structure. The new germanosilicate exhibited two types of accessible micropores with diameters of 0.61 and 0.78 nm after calcination.

Photoacid generator for 193 nm immersion lithography and intermediate thereof

The invention discloses a photoacid generator for 193 nm immersed lithography and an intermediate thereof. The photoacid generator of the present invention is shown in Formula I. The photoresist containing the photoacid generator of the present invention has a high resolution. The method has the advantages of high sensitivity and low line width roughness, and has a good application prospect.

NOVEL SULFONATE AND ITS DERIVATIVE, PHOTOSENSITIVE ACID GENERATOR, AND RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME

There is disclosed a sulfonate shown by the following general formula (2). R1—COOC(CF3)2—CH2SO3?M+??(2) (In the formula, R1 represents a linear, a branched, or a cyclic monovalent hydrocarbon group having 1 to 50 carbon atoms optionally containing a hetero atom. M+ represents a cation.) There can be provided: a novel sulfonate which is effective for a chemically amplified resist composition having a sufficiently high solubility (compatibility) in a resist solvent and a resin, a good storage stability, a PED stability, a further wider depth of focus, a good sensitivity, in particular a high resolution and a good pattern profile form; a photosensitive acid generator; a resist composition using this; a photomask blank, and a patterning process.